Inventor · disambiguated record
Alexander Svizher
Also filed as: SVIZHER ALEXANDER
18 granted patents·226 citations·filing 2009–2020
94Inventor score
Top patents by PatentIndex Score
18 records- 0198US11164307B1Misregistration metrology by using fringe Moiré and optical Moiré effectsKLA CORP·Filed 2020·Granted Nov 2, 2021·18 cites·35 claims
- 0297US8441639B2Metrology systems and methodsKANDEL DANIEL·Filed 2010·Granted May 14, 2013·35 cites·22 claims
- 0396US9080971B2Metrology systems and methodsKLA TENCOR CORP·Filed 2014·Granted Jul 14, 2015·21 cites·12 claims
- 0495US9739702B2Symmetric target design in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 22, 2017·31 cites·46 claims
- 0594US8873054B2Metrology systems and methodsKLA TENCOR CORP·Filed 2013·Granted Oct 28, 2014·14 cites·26 claims
- 0693US8896832B2Discrete polarization scatterometryHILL ANDREW V·Filed 2011·Granted Nov 25, 2014·25 cites·35 claims
- 0792US10591406B2Symmetric target design in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2016·Granted Mar 17, 2020·6 cites·20 claims
- 0892US9851300B1Decreasing inaccuracy due to non-periodic effects on scatterometric signalsKLA TENCOR CORP·Filed 2015·Granted Dec 26, 2017·12 cites·20 claims
- 0991US10203247B2Systems for providing illumination in optical metrologyKLA TENCOR CORP·Filed 2016·Granted Feb 12, 2019·10 cites·21 claims
- 1090US10527952B2Fault discrimination and calibration of scatterometry overlay targetsKLA TENCOR CORP·Filed 2017·Granted Jan 7, 2020·13 cites·26 claims
- 1190US9581430B2Phase characterization of targetsKLA TENCOR CORP·Filed 2013·Granted Feb 28, 2017·15 cites·12 claims
- 1287US11137692B2Metrology targets and methods with oblique periodic structuresKLA TENCOR CORP·Filed 2018·Granted Oct 5, 2021·3 cites·22 claims
- 1387US8243273B2Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methodsLEVINSKI VLADIMIR·Filed 2009·Granted Aug 14, 2012·11 cites·21 claims
- 1486US9164397B2Optics symmetrization for metrologyMANASSEN AMNON·Filed 2011·Granted Oct 20, 2015·7 cites·15 claims
- 1571US8390808B1Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methodsLEVINSKI VLADIMIR·Filed 2012·Granted Mar 5, 2013·2 cites·20 claims
- 1669US9512985B2Systems for providing illumination in optical metrologyKLA TENCOR CORP·Filed 2013·Granted Dec 6, 2016·2 cites·50 claims
- 1766US10699969B2Quick adjustment of metrology measurement parameters according to process variationKLA TENCOR CORP·Filed 2018·Granted Jun 30, 2020·1 cites·14 claims
- 1843US10761022B2Rotated boundaries of stops and targetsKLA TENCOR CORP·Filed 2016·Granted Sep 1, 2020·0 cites·21 claims
Join the waitlist — get patent alerts
Get an alert when Alexander Svizher files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →