Inventor · disambiguated record
Amnon Manassen
Also filed as: MANASSEN AMNON
113 granted patents·9 pending applications·670 citations·filing 1998–2023
99Inventor score
Top patents by PatentIndex Score
122 records- 0198US11526086B2Multi-field scanning overlay metrologyKLA CORP·Filed 2021·Granted Dec 13, 2022·10 cites·36 claims
- 0298US11428642B2Scanning scatterometry overlay measurementKLA CORP·Filed 2021·Granted Aug 30, 2022·12 cites·29 claims
- 0398US11300405B2Grey-mode scanning scatterometry overlay metrologyKLA CORP·Filed 2021·Granted Apr 12, 2022·7 cites·24 claims
- 0497US11346657B2Measurement modes for overlayKLA CORP·Filed 2020·Granted May 31, 2022·7 cites·35 claims
- 0597US10197389B2Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fieldsKLA TENCOR CORP·Filed 2016·Granted Feb 5, 2019·19 cites·23 claims
- 0697US9182219B1Overlay measurement based on moire effect between structured illumination and overlay targetKLA TENCOR CORP·Filed 2014·Granted Nov 10, 2015·23 cites·20 claims
- 0797US8441639B2Metrology systems and methodsKANDEL DANIEL·Filed 2010·Granted May 14, 2013·35 cites·22 claims
- 0896US11573497B2System and method for measuring misregistration of semiconductor device wafers utilizing induced topographyKLA CORP·Filed 2020·Granted Feb 7, 2023·5 cites·20 claims
- 0996US11531275B1Parallel scatterometry overlay metrologyKLA CORP·Filed 2021·Granted Dec 20, 2022·9 cites·31 claims
- 1096US11300524B1Pupil-plane beam scanning for metrologyKLA CORP·Filed 2021·Granted Apr 12, 2022·12 cites·27 claims
- 1196US11073768B2Metrology target for scanning metrologyKLA CORP·Filed 2019·Granted Jul 27, 2021·19 cites·21 claims
- 1296US10401738B2Overlay metrology using multiple parameter configurationsKLA TENCOR CORP·Filed 2017·Granted Sep 3, 2019·14 cites·49 claims
- 1396US10190979B2Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structuresKLA TENCOR CORP·Filed 2015·Granted Jan 29, 2019·12 cites·21 claims
- 1496US10048132B2Simultaneous capturing of overlay signals from multiple targetsKLA TENCOR CORP·Filed 2016·Granted Aug 14, 2018·10 cites·17 claims
- 1596US9123649B1Fit-to-pitch overlay measurement targetsKLA TENCOR CORP·Filed 2014·Granted Sep 1, 2015·14 cites·20 claims
- 1696US9080971B2Metrology systems and methodsKLA TENCOR CORP·Filed 2014·Granted Jul 14, 2015·21 cites·12 claims
- 1795US11119417B2Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s)KLA TENCOR CORP·Filed 2019·Granted Sep 14, 2021·5 cites·13 claims
- 1895US10824079B2Diffraction based overlay scatterometryKLA TENCOR CORP·Filed 2018·Granted Nov 3, 2020·12 cites·16 claims
- 1995US10401228B2Simultaneous capturing of overlay signals from multiple targetsKLA TENCOR CORP·Filed 2018·Granted Sep 3, 2019·6 cites·23 claims
- 2094US12032300B2Imaging overlay with mutually coherent oblique illuminationKLA CORP·Filed 2022·Granted Jul 9, 2024·2 cites·23 claims
- 2194US11841621B2Moiré scatterometry overlayKLA CORP·Filed 2021·Granted Dec 12, 2023·2 cites·39 claims
- 2294US8873054B2Metrology systems and methodsKLA TENCOR CORP·Filed 2013·Granted Oct 28, 2014·14 cites·26 claims
- 2394US8508748B1Inspection system with fiber coupled OCT focusingMANASSEN AMNON·Filed 2010·Granted Aug 13, 2013·17 cites·16 claims
- 2494US8214771B2Scatterometry metrology target design optimizationADEL MICHAEL·Filed 2009·Granted Jul 3, 2012·32 cites·25 claims
- 2593US11899375B2Massive overlay metrology sampling with multiple measurement columnsKLA CORP·Filed 2021·Granted Feb 13, 2024·2 cites·56 claims
- 2693US11800212B1Multi-directional overlay metrology using multiple illumination parameters and isolated imagingKLA CORP·Filed 2022·Granted Oct 24, 2023·5 cites·31 claims
- 2793US10422508B2System and method for spectral tuning of broadband light sourcesKLA TENCOR CORP·Filed 2016·Granted Sep 24, 2019·8 cites·56 claims
- 2893US8896832B2Discrete polarization scatterometryHILL ANDREW V·Filed 2011·Granted Nov 25, 2014·25 cites·35 claims
- 2993US8681413B2Illumination controlMANASSEN AMNON·Filed 2011·Granted Mar 25, 2014·18 cites·42 claims
- 3092US12253805B2Scatterometry overlay metrology with orthogonal fine-pitch segmentationKLA CORP·Filed 2022·Granted Mar 18, 2025·2 cites·45 claims
- 3192US12001148B2Enhancing performance of overlay metrologyKLA CORP·Filed 2023·Granted Jun 4, 2024·2 cites·26 claims
- 3292US11353799B1System and method for error reduction for metrology measurementsKLA CORP·Filed 2020·Granted Jun 7, 2022·5 cites·25 claims
- 3392US10371626B2System and method for generating multi-channel tunable illumination from a broadband sourceKLA TENCOR CORP·Filed 2016·Granted Aug 6, 2019·5 cites·50 claims
- 3492US9958385B2Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrologyKLA TENCOR CORP·Filed 2014·Granted May 1, 2018·9 cites·36 claims
- 3592US9851300B1Decreasing inaccuracy due to non-periodic effects on scatterometric signalsKLA TENCOR CORP·Filed 2015·Granted Dec 26, 2017·12 cites·20 claims
- 3691US12066322B2Single grab overlay measurement of tall targetsKLA CORP·Filed 2022·Granted Aug 20, 2024·2 cites·40 claims
- 3791US10203247B2Systems for providing illumination in optical metrologyKLA TENCOR CORP·Filed 2016·Granted Feb 12, 2019·10 cites·21 claims
- 3891US9329033B2Method for estimating and correcting misregistration target inaccuracyKLA TENCOR CORP·Filed 2013·Granted May 3, 2016·8 cites·17 claims
- 3991US8209767B1Near field detection for optical metrologyMANASSEN AMNON·Filed 2010·Granted Jun 26, 2012·15 cites·25 claims
- 4090US10551749B2Metrology targets with supplementary structures in an intermediate layerKLA TENCOR CORP·Filed 2017·Granted Feb 4, 2020·3 cites·29 claims
- 4190US9581430B2Phase characterization of targetsKLA TENCOR CORP·Filed 2013·Granted Feb 28, 2017·15 cites·12 claims
- 4289US12235588B2Scanning overlay metrology with high signal to noise ratioKLA CORP·Filed 2023·Granted Feb 25, 2025·1 cites·21 claims
- 4389US11726410B2Multi-resolution overlay metrology targetsKLA CORP·Filed 2021·Granted Aug 15, 2023·2 cites·22 claims
- 4489US10943838B2Measurement of overlay error using device inspection systemKLA TENCOR CORP·Filed 2018·Granted Mar 9, 2021·6 cites·20 claims
- 4589US10533940B2Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrologyKLA TENCOR CORP·Filed 2018·Granted Jan 14, 2020·2 cites·20 claims
- 4689US9784987B2Apodization for pupil imaging scatterometryKLA TENCOR CORP·Filed 2015·Granted Oct 10, 2017·5 cites·26 claims
- 4789US8582114B2Overlay metrology by pupil phase analysisMANASSEN AMNON·Filed 2011·Granted Nov 12, 2013·7 cites·23 claims
- 4889US6331911B1Large aperture optical image shutter3DV SYSTEMS LTD·Filed 1998·Granted Dec 18, 2001·103 cites·34 claims
- 4988US11281112B2Method of measuring misregistration in the manufacture of topographic semiconductor device wafersKLA CORP·Filed 2020·Granted Mar 22, 2022·2 cites·22 claims
- 5087US12111580B2Optical metrology utilizing short-wave infrared wavelengthsKLA CORP·Filed 2021·Granted Oct 8, 2024·2 cites·38 claims
Showing the top 50 of 122 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →