Inventor · disambiguated record
Amitabh Sabharwal
Also filed as: SABHARWAL AMITABH
10 granted patents·7 pending applications·51 citations·filing 2006–2018
85Inventor score
Top patents by PatentIndex Score
17 records- 0192US7909961B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted Mar 22, 2011·21 cites·4 claims
- 0290US9978632B2Direct lift process apparatusAPPLIED MATERIALS INC·Filed 2015·Granted May 22, 2018·8 cites·17 claims
- 0390US7943005B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted May 17, 2011·15 cites·19 claims
- 0480US10170277B2Apparatus and methods for dry etch with edge, side and back protectionSINGH SARAVJEET·Filed 2012·Granted Jan 1, 2019·4 cites·17 claims
- 0572US7964818B2Method and apparatus for photomask etchingAPPLIED MATERIALS INC·Filed 2006·Granted Jun 21, 2011·3 cites·11 claims
- 0658US2019096634A1Apparatus and methods for dry etch with edge, side and back protectionAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 0753US9754765B2Electrodes for etchAPPLIED MATERIALS INC·Filed 2013·Granted Sep 5, 2017·0 cites·12 claims
- 0853US9425062B2Method for improving CD micro-loading in photomask plasma etchingAPPLIED MATERIALS INC·Filed 2014·Granted Aug 23, 2016·0 cites·8 claims
- 0950US10199224B2Method for improving CD micro-loading in photomask plasma etchingAPPLIED MATERIALS INC·Filed 2016·Granted Feb 5, 2019·0 cites·7 claims
- 1048US8568553B2Method and apparatus for photomask plasma etchingKUMAR AJAY·Filed 2011·Granted Oct 29, 2013·0 cites·20 claims
- 1146US2010028813A1Backside cleaning of substrateWU BANQIU·Filed 2008·Application pending·0 cites
- 1243US2014356768A1Charged beam plasma apparatus for photomask manufacture applicationsWU BANQIU·Filed 2013·Application pending·0 cites
- 1343US2008179282A1Mask etch processCHANDRACHOOD MADHAVI R·Filed 2007·Application pending·0 cites
- 1441US8778574B2Method for etching EUV material layers utilized to form a photomaskYU KEVEN·Filed 2013·Granted Jul 15, 2014·0 cites·21 claims
- 1536US2013048606A1Methods for in-situ chamber dry clean in photomask plasma etching processing chamberMAO ZHIGANG·Filed 2011·Application pending·0 cites
- 1635US2010276391A1Inductively coupled plasma reactor having rf phase control and methods of use thereofAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 1733US2013092655A1Method for etching an euv reflective multi-material layers utilized to form a photomaskYU KEVEN·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →