Inventor · disambiguated record
Anwar Husain
Also filed as: HUSAIN ANWAR
32 granted patents·10 pending applications·646 citations·filing 1983–2022
97Inventor score
Files withAPPLIED MATERIALS INC21LAM RES CORP8KHOLODENKO ARNOLD5ADVANCED ION BEAM TECH INC2BROWN BRIAN J2
Top patents by PatentIndex Score
42 records- 0196US6575177B1Semiconductor substrate cleaning systemAPPLIED MATERIALS INC·Filed 2000·Granted Jun 10, 2003·83 cites·17 claims
- 0295US12020977B2Lift pin assemblyAPPLIED MATERIALS INC·Filed 2022·Granted Jun 25, 2024·4 cites·20 claims
- 0395US7743730B2Apparatus for an optimized plasma chamber grounded electrode assemblyLAM RES CORP·Filed 2005·Granted Jun 29, 2010·32 cites·23 claims
- 0494US10847347B2Edge ring assembly for a substrate support in a plasma processing chamberAPPLIED MATERIALS INC·Filed 2019·Granted Nov 24, 2020·12 cites·16 claims
- 0591US5671116AMultilayered electrostatic chuck and method of manufacture thereofLAM RES CORP·Filed 1995·Granted Sep 23, 1997·116 cites·29 claims
- 0690US9905402B2Plasma processing chamber with a grounded electrode assemblyLAM RES CORP·Filed 2015·Granted Feb 27, 2018·5 cites·18 claims
- 0789US6474712B1Gripper for supporting substrate in a vertical orientationAPPLIED MATERIALS INC·Filed 2000·Granted Nov 5, 2002·42 cites·24 claims
- 0888US8261905B2Wafer carrier drive apparatus and method for operating the sameKHOLODENKO ARNOLD·Filed 2010·Granted Sep 11, 2012·11 cites·12 claims
- 0986US12341048B2Porous plug for electrostatic chuck gas deliveryAPPLIED MATERIALS INC·Filed 2021·Granted Jun 24, 2025·1 cites·20 claims
- 1086US5548470ACharacterization, modeling, and design of an electrostatic chuck with improved wafer temperature uniformityIBM·Filed 1994·Granted Aug 20, 1996·89 cites·21 claims
- 1183US6406359B1Apparatus for transferring semiconductor substrates using an input moduleAPPLIED MATERIALS INC·Filed 2000·Granted Jun 18, 2002·28 cites·20 claims
- 1280US10504765B2Electrostatic chuck assembly having a dielectric fillerAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·2 cites·20 claims
- 1380US6303895B1Method and apparatus for controlling a temperature of a waferLAM RES CORP·Filed 2000·Granted Oct 16, 2001·21 cites·19 claims
- 1480US6140612AControlling the temperature of a wafer by varying the pressure of gas between the underside of the wafer and the chuckLAM RES CORP·Filed 1995·Granted Oct 31, 2000·54 cites·19 claims
- 1579US6516816B1Spin-rinse-dryerAPPLIED MATERIALS INC·Filed 2000·Granted Feb 11, 2003·21 cites·47 claims
- 1678US5880922AMultilayered electrostatic chuck and method of manufacture thereofLAM RES CORP·Filed 1997·Granted Mar 9, 1999·48 cites·30 claims
- 1776US5911833AMethod of in-situ cleaning of a chuck within a plasma chamberLAM RES CORP·Filed 1997·Granted Jun 15, 1999·49 cites·17 claims
- 1874US4544311AMask alignment apparatusMICRONIX PARTNERS·Filed 1983·Granted Oct 1, 1985·24 cites·20 claims
- 1965US8584613B2Single substrate processing head for particle removal using low viscosity fluidKHOLODENKO ARNOLD·Filed 2008·Granted Nov 19, 2013·2 cites·6 claims
- 2063US10930540B2Electrostatic chuck assembly having a dielectric fillerAPPLIED MATERIALS INC·Filed 2019·Granted Feb 23, 2021·0 cites·9 claims
- 2163US8161984B2Generator for foam to clean substrateKHOLODENKO ARNOLD·Filed 2008·Granted Apr 24, 2012·1 cites·15 claims
- 2263US2021043428A1Edge ring assembly for a substrate support in a plasma processing chamberAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2361US12198903B2Plasma resistant arc preventative coatings for manufacturing equipment componentsAPPLIED MATERIALS INC·Filed 2021·Granted Jan 14, 2025·0 cites·20 claims
- 2460US11488852B2Methods and apparatus for reducing high voltage arcing in semiconductor process chambersAPPLIED MATERIALS INC·Filed 2020·Granted Nov 1, 2022·0 cites·20 claims
- 2556US11171030B2Methods and apparatus for dechucking wafersAPPLIED MATERIALS INC·Filed 2019·Granted Nov 9, 2021·0 cites·20 claims
- 2655US12211734B2Lift pin mechanismAPPLIED MATERIALS INC·Filed 2022·Granted Jan 28, 2025·0 cites·20 claims
- 2755US2008041422A1Semiconductor substrate cleaning systemBROWN BRIAN J·Filed 2007·Application pending·0 cites
- 2853US11424096B2Temperature controlled secondary electrode for ion control at substrate edgeAPPLIED MATERIALS INC·Filed 2019·Granted Aug 23, 2022·0 cites·20 claims
- 2953US8739805B2Confinement of foam delivered by a proximity headKHOLODENKO ARNOLD·Filed 2008·Granted Jun 3, 2014·0 cites·8 claims
- 3052US8557051B2Method for using generator for foam to clean substrateKHOLODENKO ARNOLD·Filed 2012·Granted Oct 15, 2013·0 cites·20 claims
- 3152US2006180177A1Semiconductor substrate cleaning systemBROWN BRIAN J·Filed 2006·Application pending·0 cites
- 3251US11551916B2Sheath and temperature control of a process kit in a substrate processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·0 cites·19 claims
- 3351US2014251382A1Methods for Confinement of Foam Delivered by a Proximity HeadLAM RES CORP·Filed 2014·Application pending·0 cites
- 3450US11551960B2Helical plug for reduction or prevention of arcing in a substrate supportAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·0 cites·12 claims
- 3548US11543954B2Scroll activity detection for selection and display of informationSMASHTECH LLC·Filed 2020·Granted Jan 3, 2023·0 cites·7 claims
- 3646US7226514B2Spin-rinse-dryerAPPLIED MATERIALS INC·Filed 2002·Granted Jun 5, 2007·1 cites·17 claims
- 3745US2020411355A1Apparatus for reduction or prevention of arcing in a substrate supportAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3843US2003200988A1Semiconductor substrate cleaning systemAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 3941US2003026683A1Gripper for supporting substrate in a vertical orientationFiled 2002·Application pending·0 cites
- 4040US2018323042A1Method to modulate the wafer edge sheath in a plasma processing chamberAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 4134US2016217970A1Ion implanter and method for ion implantationADVANCED ION BEAM TECH INC·Filed 2015·Application pending·0 cites
- 4229US2016203950A1Method and ion implanter for low temperature implantationADVANCED ION BEAM TECH INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →