Inventor · disambiguated record
Andras G. Major
Also filed as: MAJOR ANDRAS G · MAJOR ANDRÁS · MAJOR ANDRÁS G
18 granted patents·4 pending applications·48 citations·filing 2009–2025
92Inventor score
Files withZEISS CARL SMT GMBH8CARL ZEISS MULTISEM GMBH5MAJOR ANDRAS G3DEGUENTHER MARKUS2XALTER STEFAN2
Top patents by PatentIndex Score
22 records- 0196US9013684B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2012·Granted Apr 21, 2015·17 cites·18 claims
- 0289US2025379030A1Particle beam systemCARL ZEISS MULTISEM GMBH·Filed 2025·Application pending·0 cites
- 0385US8339577B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2009·Granted Dec 25, 2012·9 cites·31 claims
- 0483US8854604B2Microlithographic projection exposure apparatusDEGUENTHER MARKUS·Filed 2011·Granted Oct 7, 2014·4 cites·22 claims
- 0583US7782443B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2009·Granted Aug 24, 2010·5 cites·15 claims
- 0680US9897925B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 20, 2018·1 cites·18 claims
- 0780US2025232951A1Particle beam systemCARL ZEISS MULTISEM GMBH·Filed 2025·Application pending·0 cites
- 0876US9013680B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2010·Granted Apr 21, 2015·2 cites·22 claims
- 0973US9239229B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jan 19, 2016·1 cites·13 claims
- 1072US10161808B2Method and arrangement for determining the heating condition of a mirror in an optical systemZEISS CARL SMT GMBH·Filed 2013·Granted Dec 25, 2018·3 cites·27 claims
- 1171US12293896B2Particle beam systemCARL ZEISS MULTISEM GMBH·Filed 2020·Granted May 6, 2025·0 cites·33 claims
- 1266US9052606B2Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Granted Jun 9, 2015·1 cites·19 claims
- 1366US9001309B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 7, 2015·0 cites·30 claims
- 1465US9946161B2Optical system for a microlithographic projection exposure apparatus and microlithographic exposure methodZEISS CARL SMT GMBH·Filed 2012·Granted Apr 17, 2018·1 cites·27 claims
- 1565US2018246415A1Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1663US8164046B2Illumination system for illuminating a mask in a microlithographic projection exposure apparatusMAJOR ANDRAS G·Filed 2009·Granted Apr 24, 2012·2 cites·14 claims
- 1762US8773639B2Illumination system of a microlithographic projection exposure apparatusDEGUENTHER MARKUS·Filed 2009·Granted Jul 8, 2014·2 cites·21 claims
- 1860US9019475B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 28, 2015·0 cites·26 claims
- 1953US12512291B2Particle beam system having a multi-pole lens sequence for independently focusing a multiplicity of individual particle beams, and its use and associated methodCARL ZEISS MULTISEM GMBH·Filed 2022·Granted Dec 30, 2025·0 cites·21 claims
- 2052US12249478B2Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam systemCARL ZEISS MULTISEM GMBH·Filed 2021·Granted Mar 11, 2025·0 cites·25 claims
- 2142US9310701B2Device for guiding electromagnetic radiation into a projection exposure apparatusMAJOR ANDRAS G·Filed 2012·Granted Apr 12, 2016·0 cites·18 claims
- 2237US2012127440A1Optical assembly for projection lithographyMAJOR ANDRAS G·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →