Particle beam system

Abstract

A particle beam system includes: a multi-beam particle source configured to generate a multiplicity of particle beams; an imaging optical unit configured to image an object plane in particle-optical fashion into an image plane and direct the multiplicity of particle beams on the image plane; and a field generating arrangement configured to generate electric and/or magnetic deflection fields of adjustable strength in regions close to the object plane. The particle beams are deflected in operation by the deflection fields through deflection angles that depend on the strength of the deflection fields.

1 - 21 . (canceled) 
     
     
         22 . A multi-charged particle beam irradiation apparatus comprising:
 a forming mechanism configured to form multiple charged particle beams;   a multipole deflector array configured to individually deflect each beam of the multiple charged particle beams so that a center axis trajectory of the each beam of the multiple charged particle beams does not converge in a region of a same plane orthogonal to a direction of a central axis of a trajectory of the multiple charged particle beams; and   an electron optical system configured to irradiate a substrate with the multiple charged particle beams while maintaining a state where the multiple charged particle beams are not converged.   
     
     
         23 . The apparatus according to  claim 22 , wherein the multipole deflector array is configured to individually deflect the each beam of the multiple charged particle beams so that a peripheral beam, located on a peripheral side off a center, in the multiple charged particle beams irradiates the substrate without passing through the central axis of the trajectory of the multiple charged particle beams. 
     
     
         24 . The apparatus according to  claim 22 , wherein the multipole deflector array is arranged at an intermediate image plane position of the multiple charged particle beams. 
     
     
         25 . The apparatus according to  claim 22 , wherein the electron optical system comprises at least one of an electromagnetic lens, a deflector and an aperture. 
     
     
         26 . A multi-charged particle beam inspection apparatus comprising:
 a forming mechanism configured to form multiple charged particle beams;   a multipole deflector array configured to individually deflect each beam of the multiple charged particle beams so that a center axis trajectory of the each beam of the multiple charged particle beams does not converge in a region of a same plane orthogonal to a direction of a central axis of a trajectory of the multiple charged particle beams;   an electron optical system configured to irradiate a substrate with the multiple charged particle beams while maintaining a state where the multiple charged particle beams are not converged; and   a multi-detector configured to detect multiple secondary electron beams emitted from the substrate due to irradiation with the multiple charged particle beams,   wherein electron intensities detected by the detector elements provide information concerning the object at the location at which a corresponding primary beam impinges on the object.   
     
     
         27 . The apparatus according to  claim 26 , wherein the multipole deflector array is configured to individually deflect the each beam of the multiple charged particle beams so that a peripheral beam, located on a peripheral side off a center, in the multiple charged particle beams irradiates the substrate without passing through the central axis of the trajectory of the multiple charged particle beams. 
     
     
         28 . The apparatus according to  claim 26 , wherein the multipole deflector array is arranged at an intermediate image plane position of the multiple charged particle beams. 
     
     
         29 . The apparatus according to  claim 26 , wherein the electron optical system comprises at least one of an electromagnetic lens, a deflector and an aperture. 
     
     
         30 . A particle beam system, comprising:
 a multi-beam particle source configured to generate a first multiplicity of particle beams;   a first imaging optical unit configured to: i) particle-optically image a first object plane into an image plane; and ii) direct the first multiplicity of particle beams onto the image plane; and   a first field generating arrangement configured to generate electric and/or magnetic deflection fields of adjustable strength in regions near the first object plane,   wherein, during operation of the particle beam system, the first multiplicity of particle beams are deflected by the deflection fields of the first field generating arrangement by deflection angles dependent on the strength of the deflection fields, and   wherein, during operation of the particle beam system, the deflection angles have an effect of enlarging a cross-section of the first multiplicity of particle beams in a crossover plane in which the cross-section is otherwise minimal.   
     
     
         31 . The particle beam system of  claim 30 ,
 wherein the enlarging of the cross-section of the first multiplicity of particle beams in the crossover plane by the deflection angles reduces the mutual repulsion of the particles from one another on account of Coulomb repulsion, which in turn enables smaller beam foci for the particle beams in the image plane.   
     
     
         32 . The particle beam system of  claim 31 ,
 wherein the first field generating arrangement is configured to generate the deflection angles to be oriented in a circumferential direction around an optical axis of the first imaging optical unit to cause the enlarging of the cross-section of the first multiplicity of particle beams in the crossover plane.   
     
     
         33 . The particle beam system of  claim 31 ,
 wherein the deflections angles cause the particles beam to run spiral paths around an optical axis passing through the center of the first field generating arrangement before being incident on the image plane.   
     
     
         34 . The particle beam apparatus of  claim 33 ,
 wherein the first imaging optical unit comprises an objective lens with a magnetic field extending to the image plane, and wherein   wherein the deflection angles cause the spiral paths to be orthogonally incident on the image plane in the presence of the magnetic field from the objective lens.   
     
     
         35 . The particle beam apparatus of  claim 34 ,
 wherein the first field generating arrangement is configured to generate the deflection angles to be oriented in a circumferential direction around an optical axis of the first imaging optical unit to cause the enlarging of the cross-section of the first multiplicity of particle beams in the crossover plane.   
     
     
         36 . The particle beam apparatus of  claim 35 ,
 wherein the first field generating arrangement comprises a deflector array comprising a pair of electrodes positioned to deflect each particle beam and wherein each such pair of electrodes is oriented in a circumferential direction with respect to a center of the first field generating arrangement.   
     
     
         37 . The particle beam apparatus of  claim 31 , wherein the first field generating arrangement is arranged at an intermediate image plane of the first imaging optical unit. 
     
     
         38 . The particle beam apparatus of  claim 31 , further comprising:
 a detector array configured to detect multiple secondary electron beams emitted from a substrate on the image plane in response to irradiation with the multiple charged particle beams,   wherein electron intensities detected by the detector elements provide information concerning the object at the location at which a corresponding primary beam impinges on the object.