Inventor · disambiguated record
Anchuan Wang
Also filed as: WANG ANCHUAN
143 granted patents·31 pending applications·15,132 citations·filing 2001–2025
99Inventor score
Top patents by PatentIndex Score
174 records- 0199US10062578B2Methods for etch of metal and metal-oxide filmsAPPLIED MATERIALS INC·Filed 2015·Granted Aug 28, 2018·94 cites·20 claims
- 0299US9842744B2Methods for etch of SiN filmsAPPLIED MATERIALS INC·Filed 2016·Granted Dec 12, 2017·113 cites·10 claims
- 0399US9837284B2Oxide etch selectivity enhancementAPPLIED MATERIALS INC·Filed 2017·Granted Dec 5, 2017·112 cites·12 claims
- 0499US9754800B2Selective etch for silicon filmsAPPLIED MATERIALS INC·Filed 2016·Granted Sep 5, 2017·110 cites·20 claims
- 0599US9613822B2Oxide etch selectivity enhancementAPPLIED MATERIALS INC·Filed 2014·Granted Apr 4, 2017·128 cites·12 claims
- 0699US9607856B2Selective titanium nitride removalAPPLIED MATERIALS INC·Filed 2015·Granted Mar 28, 2017·126 cites·18 claims
- 0799US9520303B2Aluminum selective etchAPPLIED MATERIALS INC·Filed 2014·Granted Dec 13, 2016·131 cites·14 claims
- 0899US9478432B2Silicon oxide selective removalAPPLIED MATERIALS INC·Filed 2014·Granted Oct 25, 2016·129 cites·15 claims
- 0999US9449846B2Vertical gate separationAPPLIED MATERIALS INC·Filed 2015·Granted Sep 20, 2016·133 cites·15 claims
- 1099US9418858B2Selective etch of silicon by way of metastable hydrogen terminationAPPLIED MATERIALS INC·Filed 2014·Granted Aug 16, 2016·138 cites·20 claims
- 1199US9390937B2Silicon-carbon-nitride selective etchAPPLIED MATERIALS INC·Filed 2013·Granted Jul 12, 2016·132 cites·20 claims
- 1299US9343327B2Methods for etch of sin filmsAPPLIED MATERIALS INC·Filed 2015·Granted May 17, 2016·147 cites·16 claims
- 1399US9190293B2Even tungsten etch for high aspect ratio trenchesAPPLIED MATERIALS INC·Filed 2014·Granted Nov 17, 2015·251 cites·14 claims
- 1499US9093390B2Conformal oxide dry etchAPPLIED MATERIALS INC·Filed 2014·Granted Jul 28, 2015·185 cites·17 claims
- 1599US9040422B2Selective titanium nitride removalAPPLIED MATERIALS INC·Filed 2013·Granted May 26, 2015·194 cites·19 claims
- 1699US8801952B1Conformal oxide dry etchAPPLIED MATERIALS INC·Filed 2013·Granted Aug 12, 2014·191 cites·18 claims
- 1799US8765574B2Dry etch processAPPLIED MATERIALS INC·Filed 2013·Granted Jul 1, 2014·182 cites·17 claims
- 1898US10062579B2Selective SiN lateral recessAPPLIED MATERIALS INC·Filed 2016·Granted Aug 28, 2018·95 cites·18 claims
- 1998US9991134B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2014·Granted Jun 5, 2018·100 cites·17 claims
- 2098US9887096B2Differential silicon oxide etchAPPLIED MATERIALS INC·Filed 2015·Granted Feb 6, 2018·113 cites·17 claims
- 2198US9831097B2Methods for selective etching of a silicon material using HF gas without nitrogen etchantsAPPLIED MATERIALS INC·Filed 2016·Granted Nov 28, 2017·100 cites·18 claims
- 2298US9768034B1Removal methods for high aspect ratio structuresAPPLIED MATERIALS INC·Filed 2016·Granted Sep 19, 2017·118 cites·20 claims
- 2398US9704723B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2015·Granted Jul 11, 2017·114 cites·17 claims
- 2498US9659792B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2015·Granted May 23, 2017·125 cites·13 claims
- 2598US9576809B2Etch suppression with germaniumAPPLIED MATERIALS INC·Filed 2014·Granted Feb 21, 2017·131 cites·4 claims
- 2698US9576788B2Cleaning high aspect ratio viasAPPLIED MATERIALS INC·Filed 2015·Granted Feb 21, 2017·99 cites·12 claims
- 2798US9576815B2Gas-phase silicon nitride selective etchAPPLIED MATERIALS INC·Filed 2015·Granted Feb 21, 2017·34 cites·16 claims
- 2898US9553102B2Tungsten separationAPPLIED MATERIALS INC·Filed 2014·Granted Jan 24, 2017·46 cites·13 claims
- 2998US9502258B2Anisotropic gap etchAPPLIED MATERIALS INC·Filed 2014·Granted Nov 22, 2016·129 cites·14 claims
- 3098US9478434B2Chlorine-based hardmask removalAPPLIED MATERIALS INC·Filed 2014·Granted Oct 25, 2016·134 cites·14 claims
- 3198US9449850B2Processing systems and methods for halide scavengingAPPLIED MATERIALS INC·Filed 2015·Granted Sep 20, 2016·135 cites·18 claims
- 3298US9449845B2Selective titanium nitride etchingAPPLIED MATERIALS INC·Filed 2014·Granted Sep 20, 2016·138 cites·19 claims
- 3398US9437451B2Radical-component oxide etchAPPLIED MATERIALS INC·Filed 2015·Granted Sep 6, 2016·134 cites·19 claims
- 3498US9412608B2Dry-etch for selective tungsten removalAPPLIED MATERIALS INC·Filed 2015·Granted Aug 9, 2016·134 cites·17 claims
- 3598US9406523B2Highly selective doped oxide removal methodAPPLIED MATERIALS INC·Filed 2014·Granted Aug 2, 2016·135 cites·15 claims
- 3698US9384997B2Dry-etch selectivityAPPLIED MATERIALS INC·Filed 2015·Granted Jul 5, 2016·146 cites·20 claims
- 3798US9378969B2Low temperature gas-phase carbon removalAPPLIED MATERIALS INC·Filed 2014·Granted Jun 28, 2016·529 cites·14 claims
- 3898US9373522B1Titanium nitride removalAPPLIED MATERIALS INC·Filed 2015·Granted Jun 21, 2016·140 cites·13 claims
- 3998US9368364B2Silicon etch process with tunable selectivity to SiO2 and other materialsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 14, 2016·146 cites·12 claims
- 4098US9355856B2V trench dry etchAPPLIED MATERIALS INC·Filed 2014·Granted May 31, 2016·146 cites·15 claims
- 4198US9355862B2Fluorine-based hardmask removalAPPLIED MATERIALS INC·Filed 2014·Granted May 31, 2016·147 cites·12 claims
- 4298US9355863B2Non-local plasma oxide etchAPPLIED MATERIALS INC·Filed 2015·Granted May 31, 2016·130 cites·20 claims
- 4398US9349605B1Oxide etch selectivity systems and methodsAPPLIED MATERIALS INC·Filed 2015·Granted May 24, 2016·156 cites·16 claims
- 4498US9343272B1Self-aligned processAPPLIED MATERIALS INC·Filed 2015·Granted May 17, 2016·149 cites·17 claims
- 4598US9324576B2Selective etch for silicon filmsZHANG JINGCHUN·Filed 2011·Granted Apr 26, 2016·152 cites·16 claims
- 4698US9309598B2Oxide and metal removalAPPLIED MATERIALS INC·Filed 2014·Granted Apr 12, 2016·560 cites·18 claims
- 4798US9299575B2Gas-phase tungsten etchAPPLIED MATERIALS INC·Filed 2014·Granted Mar 29, 2016·163 cites·15 claims
- 4898US9299583B1Aluminum oxide selective etchAPPLIED MATERIALS INC·Filed 2014·Granted Mar 29, 2016·160 cites·15 claims
- 4998US9287134B2Titanium oxide etchAPPLIED MATERIALS INC·Filed 2014·Granted Mar 15, 2016·153 cites·15 claims
- 5098US9275834B1Selective titanium nitride etchAPPLIED MATERIALS INC·Filed 2015·Granted Mar 1, 2016·554 cites·15 claims
Showing the top 50 of 174 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →