Inventor · disambiguated record
Atsushi Ookouchi
Also filed as: OOKOUCHI ATSUSHI
17 granted patents·2 pending applications·75 citations·filing 2002–2022
92Inventor score
Top patents by PatentIndex Score
19 records- 0195US11774854B2Substrate processing method, storage medium, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Oct 3, 2023·2 cites·7 claims
- 0287US8026048B2Developing apparatus and developing methodTOKYO ELECTRON LTD·Filed 2010·Granted Sep 27, 2011·7 cites·13 claims
- 0385US6811962B2Method for developing processing and apparatus for supplying developing solutionTOKYO ELECTRON LTD·Filed 2002·Granted Nov 2, 2004·29 cites·10 claims
- 0471US7806076B2Developing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Oct 5, 2010·3 cites·7 claims
- 0569US9704730B2Substrate cleaning apparatus, substrate cleaning method and non-transitory storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Jul 11, 2017·2 cites·6 claims
- 0667US11480881B2Substrate processing method, storage medium, and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Oct 25, 2022·0 cites·13 claims
- 0766US7918182B2Developing device and developing methodTOKYO ELECTRON LTD·Filed 2004·Granted Apr 5, 2011·7 cites·13 claims
- 0865US8545119B2Substrate cleaning apparatus, coating and developing apparatus having the same and substrate cleaning methodOOKOUCHI ATSUSHI·Filed 2011·Granted Oct 1, 2013·4 cites·20 claims
- 0964US8455183B2Resist pattern slimming treatment methodTSURUDA TOYOHISA·Filed 2010·Granted Jun 4, 2013·2 cites·3 claims
- 1061US7896562B2Developing method, developing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Mar 1, 2011·1 cites·24 claims
- 1161US7823534B2Development device and development methodTOKYO ELECTRON LTD·Filed 2004·Granted Nov 2, 2010·6 cites·14 claims
- 1261US7601933B2Heat processing apparatus and heat processing methodTOKYO ELECTRON LTD·Filed 2004·Granted Oct 13, 2009·8 cites·15 claims
- 1355US6991385B2Method for developing processing and apparatus for supplying developing solutionTOKYO ELECTRON LTD·Filed 2004·Granted Jan 31, 2006·4 cites·2 claims
- 1451US8445189B2Developing device and developing methodYAMAMOTO TARO·Filed 2011·Granted May 21, 2013·0 cites·12 claims
- 1547US9805958B2Substrate cleaning apparatus, substrate cleaning method and non-transitory storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Oct 31, 2017·0 cites·4 claims
- 1646US2010323307A1Developing apparatus and methodTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 1739US9570327B2Substrate liquid treatment apparatus and substrate liquid treatment methodTOKYO ELECTRON LTD·Filed 2013·Granted Feb 14, 2017·0 cites·16 claims
- 1837US8474396B2Developing apparatus, resist pattern forming method and storage mediumFUKUDA MASAHIRO·Filed 2010·Granted Jul 2, 2013·0 cites·9 claims
- 1937US2010291491A1Resist pattern slimming treatment methodTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Atsushi Ookouchi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →