Inventor · disambiguated record
Azat Latypov
Also filed as: LATYPOV AZAT · LATYPOV AZAT M
45 granted patents·3 pending applications·380 citations·filing 1999–2021
98Inventor score
Files withASML HOLDING NV30GLOBALFOUNDRIES INC13SIEMENS IND SOFTWARE INC2IPEC PREC INC1LATYPOV AZAT M1
Top patents by PatentIndex Score
48 records- 0194US11061373B1Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic processMENTOR GRAPHICS CORP·Filed 2019·Granted Jul 13, 2021·12 cites·17 claims
- 0294US8667430B1Methods for directed self-assembly process/proximity correctionGLOBALFOUNDRIES INC·Filed 2013·Granted Mar 4, 2014·22 cites·18 claims
- 0392US9305834B1Methods for fabricating integrated circuits using designs of integrated circuits adapted to directed self-assembly fabrication to form via and contact structuresGLOBALFOUNDRIES INC·Filed 2014·Granted Apr 5, 2016·17 cites·19 claims
- 0492US7133121B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2005·Granted Nov 7, 2006·13 cites·10 claims
- 0592US6831768B1Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithographyASML HOLDING NV·Filed 2003·Granted Dec 14, 2004·39 cites·21 claims
- 0691US8667428B1Methods for directed self-assembly process/proximity correctionGLOBALFOUNDRIES INC·Filed 2012·Granted Mar 4, 2014·15 cites·19 claims
- 0790US7158238B2System and method for calibrating a spatial light modulator array using shearing interferometryASML HOLDING NV·Filed 2005·Granted Jan 2, 2007·11 cites·22 claims
- 0890US6876440B1Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2003·Granted Apr 5, 2005·22 cites·15 claims
- 0989US7768653B2Method and system for wavefront measurements of an optical systemASML HOLDING NV·Filed 2008·Granted Aug 3, 2010·9 cites·20 claims
- 1089US7259831B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuationASML HOLDING NV·Filed 2006·Granted Aug 21, 2007·8 cites·7 claims
- 1189US6847461B1System and method for calibrating a spatial light modulator array using shearing interferometryASML HOLDING NV·Filed 2004·Granted Jan 25, 2005·27 cites·23 claims
- 1288US7023526B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuationASML HOLDING NV·Filed 2003·Granted Apr 4, 2006·22 cites·15 claims
- 1387US7580559B2System and method for calibrating a spatial light modulatorASML HOLDING NV·Filed 2004·Granted Aug 25, 2009·34 cites·16 claims
- 1487US6963434B1System and method for calculating aerial image of a spatial light modulatorASML HOLDING NV·Filed 2004·Granted Nov 8, 2005·20 cites·20 claims
- 1586US7469058B2Method and system for a maskless lithography rasterization technique based on global optimizationASML HOLDING NV·Filed 2006·Granted Dec 23, 2008·8 cites·22 claims
- 1686US7423732B2Lithographic apparatus and device manufacturing method utilizing placement of a patterning device at a pupil planeASML HOLDING NV·Filed 2005·Granted Sep 9, 2008·8 cites·9 claims
- 1783US7209275B2Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representationASML HOLDING NV·Filed 2005·Granted Apr 24, 2007·6 cites·14 claims
- 1882US8856698B1Method and apparatus for providing metric relating two or more process parameters to yieldGLOBALFOUNDRIES INC·Filed 2013·Granted Oct 7, 2014·6 cites·18 claims
- 1981US9208275B2Methods for fabricating integrated circuits including generating photomasks for directed self-assemblyGLOBALFOUNDRIES INC·Filed 2014·Granted Dec 8, 2015·5 cites·20 claims
- 2081US6965436B2System and method for calibrating a spatial light modulator array using shearing interferometryASML HOLDING NV·Filed 2004·Granted Nov 15, 2005·15 cites·22 claims
- 2180US7410736B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zonesASML HOLDING NV·Filed 2003·Granted Aug 12, 2008·15 cites·9 claims
- 2278US7889411B2System and method for calculating aerial image of a spatial light modulatorASML HOLDING NV·Filed 2008·Granted Feb 15, 2011·3 cites·20 claims
- 2377US7394584B2System and method for calculating aerial image of a spatial light modulatorASML HOLDING NV·Filed 2005·Granted Jul 1, 2008·3 cites·20 claims
- 2476US7688423B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zonesASML HOLDING NV·Filed 2008·Granted Mar 30, 2010·3 cites·16 claims
- 2573US7773287B2Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representationASML HOLDING NV·Filed 2007·Granted Aug 10, 2010·3 cites·15 claims
- 2668US10153162B2Shrink process aware assist featuresGLOBALFOUNDRIES INC·Filed 2016·Granted Dec 11, 2018·1 cites·17 claims
- 2768US7542013B2System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination modeASML HOLDING NV·Filed 2005·Granted Jun 2, 2009·2 cites·20 claims
- 2867US9009634B2Methods for fabricating integrated circuits including generating photomasks for directed self-assemblyGLOBALFOUNDRIES INC·Filed 2013·Granted Apr 14, 2015·1 cites·20 claims
- 2967US7102733B2System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography toolASML HOLDING NV·Filed 2004·Granted Sep 5, 2006·8 cites·29 claims
- 3066US9170501B2Methods for fabricating integrated circuits including generating photomasks for directed self-assemblyGLOBALFOUNDRIES INC·Filed 2013·Granted Oct 27, 2015·1 cites·19 claims
- 3165US9023730B1Methods for fabricating integrated circuits including generating e-beam patterns for directed self-assemblyGLOBALFOUNDRIES INC·Filed 2013·Granted May 5, 2015·1 cites·20 claims
- 3265US7826142B2Method for improved optical design using deterministically defined surfacesASML HOLDING NV·Filed 2005·Granted Nov 2, 2010·4 cites·7 claims
- 3364US9305800B2Methods for fabricating integrated circuits using directed self-assembly including lithographically-printable assist featuresGLOBALFOUNDRIES INC·Filed 2014·Granted Apr 5, 2016·1 cites·20 claims
- 3464US7463402B2Using time and/or power modulation to achieve dose gray-scale in optical maskless lithographyASML HOLDING NV·Filed 2006·Granted Dec 9, 2008·1 cites·3 claims
- 3563US9286434B2Methods for fabricating integrated circuits including generating photomasks for directed self-assembly (DSA) using DSA target patternsGLOBALFOUNDRIES INC·Filed 2014·Granted Mar 15, 2016·1 cites·19 claims
- 3663US8089038B1Reticle image generation using polarizers and metamaterial filtersLATYPOV AZAT M·Filed 2008·Granted Jan 3, 2012·4 cites·17 claims
- 3760US6985280B2Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithographyASML HOLDING NV·Filed 2004·Granted Jan 10, 2006·4 cites·9 claims
- 3857US7777861B2Methods, systems, and computer program products for printing patterns on photosensitive surfacesASML HOLDING NV·Filed 2007·Granted Aug 17, 2010·0 cites·20 claims
- 3956US7773199B2Methods and systems to compensate for a stitching disturbance of a printed patternASML HOLDING NV·Filed 2007·Granted Aug 10, 2010·0 cites·17 claims
- 4056US7630054B2Methods and systems to compensate for a stitching disturbance of a printed patternASML HOLDING NV·Filed 2007·Granted Dec 8, 2009·0 cites·19 claims
- 4154US2007146672A1Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2006·Application pending·0 cites
- 4252US11270054B1Method and system for calculating printed area metric indicative of stochastic variations of the lithographic processSIEMENS IND SOFTWARE INC·Filed 2020·Granted Mar 8, 2022·0 cites·21 claims
- 4348US7713667B2System and method for generating pattern data used to control a pattern generatorASML HOLDING NV·Filed 2004·Granted May 11, 2010·1 cites·16 claims
- 4446US2024346226A1Defectivity quantifer determinations for lithographical circuit fabrication processes through off-target process parametersSIEMENS IND SOFTWARE INC·Filed 2021·Application pending·0 cites
- 4543US2005259269A1Shearing interferometer with dynamic pupil fillASML HOLDING NV·Filed 2004·Application pending·0 cites
- 4638US9530662B2Methods for fabricating integrated circuits using directed self-assembly including a substantially periodic array of topographical features that includes etch resistant topographical features for transferability controlGLOBALFOUNDRIES INC·Filed 2015·Granted Dec 27, 2016·0 cites·20 claims
- 4737US9053923B2Methods for fabricating integrated circuits including topographical features for directed self-assemblyGLOBALFOUNDRIES INC·Filed 2013·Granted Jun 9, 2015·0 cites·20 claims
- 4834US6275770B1Method to remove station-induced error pattern from measured object characteristics and compensate the measured object characteristics with the errorIPEC PREC INC·Filed 1999·Granted Aug 14, 2001·4 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →