Inventor · disambiguated record
Barak Bringoltz
Also filed as: BRINGOLTZ BARAK
27 granted patents·5 pending applications·119 citations·filing 2013–2025
95Inventor score
Top patents by PatentIndex Score
32 records- 0195US9739702B2Symmetric target design in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 22, 2017·31 cites·46 claims
- 0293US11763181B2Metrology and process control for semiconductor manufacturingNOVA LTD·Filed 2021·Granted Sep 19, 2023·3 cites·20 claims
- 0392US10591406B2Symmetric target design in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2016·Granted Mar 17, 2020·6 cites·20 claims
- 0492US9958385B2Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrologyKLA TENCOR CORP·Filed 2014·Granted May 1, 2018·9 cites·36 claims
- 0592US9851300B1Decreasing inaccuracy due to non-periodic effects on scatterometric signalsKLA TENCOR CORP·Filed 2015·Granted Dec 26, 2017·12 cites·20 claims
- 0690US9581430B2Phase characterization of targetsKLA TENCOR CORP·Filed 2013·Granted Feb 28, 2017·15 cites·12 claims
- 0789US10533940B2Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrologyKLA TENCOR CORP·Filed 2018·Granted Jan 14, 2020·2 cites·20 claims
- 0889US9903711B2Feed forward of metrology data in a metrology systemKLA TENCOR CORP·Filed 2016·Granted Feb 27, 2018·5 cites·33 claims
- 0989US9784987B2Apodization for pupil imaging scatterometryKLA TENCOR CORP·Filed 2015·Granted Oct 10, 2017·5 cites·26 claims
- 1088US10203200B2Analyzing root causes of process variation in scatterometry metrologyKLA TENCOR CORP·Filed 2016·Granted Feb 12, 2019·7 cites·23 claims
- 1186US9091650B2Apodization for pupil imaging scatterometryKLA TENCOR CORP·Filed 2013·Granted Jul 28, 2015·5 cites·30 claims
- 1284US9874527B2Removing process-variation-related inaccuracies from scatterometry measurementsKLA TENCOR CORP·Filed 2015·Granted Jan 23, 2018·3 cites·19 claims
- 1381US10831108B2Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrologyKLA CORP·Filed 2016·Granted Nov 10, 2020·5 cites·77 claims
- 1480US12236364B2Metrology and process control for semiconductor manufacturingNOVA LTD·Filed 2023·Granted Feb 25, 2025·0 cites·18 claims
- 1576US12321102B2Machine and deep learning methods for spectra-based metrology and process controlNOVA LTD·Filed 2023·Granted Jun 3, 2025·0 cites·18 claims
- 1676US9869543B2Reducing algorithmic inaccuracy in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2014·Granted Jan 16, 2018·4 cites·25 claims
- 1776US2025334887A1Machine and deep learning methods for spectra-based metrology and process controlNOVA LTD·Filed 2025·Application pending·0 cites
- 1876US2025027767A1Detecting outliers and anomalies for ocd metrology machine learningNOVA LTD·Filed 2024·Application pending·0 cites
- 1975US11093840B2Metrology and process control for semiconductor manufacturingNOVA MEASURING INSTR LTD·Filed 2019·Granted Aug 17, 2021·1 cites·16 claims
- 2075US2025181941A1Metrology and process control for semiconductor manufacturingNOVA LTD·Filed 2025·Application pending·0 cites
- 2173US10415963B2Estimating and eliminating inter-cell process variation inaccuracyKLA TENCOR CORP·Filed 2015·Granted Sep 17, 2019·2 cites·21 claims
- 2267US10261014B2Near field metrologyKLA TENCOR CORP·Filed 2014·Granted Apr 16, 2019·2 cites·17 claims
- 2367US10126238B2Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrologyKLA TENCOR CORP·Filed 2017·Granted Nov 13, 2018·0 cites·20 claims
- 2465US11815819B2Machine and deep learning methods for spectra-based metrology and process controlNOVA LTD·Filed 2021·Granted Nov 14, 2023·0 cites·17 claims
- 2565US9909982B2Pupil plane calibration for scatterometry overlay measurementKLA TENCOR CORP·Filed 2014·Granted Mar 6, 2018·1 cites·18 claims
- 2662US12038271B2Detecting outliers and anomalies for OCD metrology machine learningNOVA LTD·Filed 2021·Granted Jul 16, 2024·0 cites·17 claims
- 2762US10234280B2Reflection symmetric scatterometry overlay targets and methodsKLA TENCOR CORP·Filed 2015·Granted Mar 19, 2019·1 cites·17 claims
- 2857US11862522B2Accuracy improvements in optical metrologyKLA TENCOR CORP·Filed 2021·Granted Jan 2, 2024·0 cites·9 claims
- 2947US9726984B2Aperture alignment in scatterometry metrology systemsKLA TENCOR CORP·Filed 2014·Granted Aug 8, 2017·0 cites·28 claims
- 3045US2014136164A1Analytic continuations to the continuum limit in numerical simulations of wafer responseBRINGOLTZ BARAK·Filed 2013·Application pending·0 cites
- 3143US2018047646A1Accuracy improvements in optical metrologyKLA TENCOR CORP·Filed 2017·Application pending·0 cites
- 3242US11874606B2System and method for controlling measurements of sample's parametersNOVA LTD·Filed 2021·Granted Jan 16, 2024·0 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →