Inventor · disambiguated record
Bernd Geh
Also filed as: GEH BERND · GEH BERND PETER
19 granted patents·7 pending applications·142 citations·filing 2001–2020
93Inventor score
Top patents by PatentIndex Score
26 records- 0191US7198873B2Lithographic processing optimization based on hypersampled correlationsASML NETHERLANDS BV·Filed 2003·Granted Apr 3, 2007·57 cites·27 claims
- 0289US7684013B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 23, 2010·12 cites·15 claims
- 0388US10852643B2Optical system, and methodZEISS CARL SMT GMBH·Filed 2019·Granted Dec 1, 2020·3 cites·19 claims
- 0487US6678240B2Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elementsZEISS CARL SMT AG·Filed 2002·Granted Jan 13, 2004·27 cites·20 claims
- 0584US7301622B2Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elementsZEISS CARL SMT AG·Filed 2005·Granted Nov 27, 2007·6 cites·18 claims
- 0682US8120748B2Lithographic processing optimization based on hypersampled correlationsGEH BERND·Filed 2007·Granted Feb 21, 2012·8 cites·27 claims
- 0779US10353295B2Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a waferZEISS CARL SMS LTD·Filed 2016·Granted Jul 16, 2019·3 cites·58 claims
- 0876US11366382B2Method and apparatus for performing an aerial image simulation of a photolithographic maskZEISS CARL SMT GMBH·Filed 2020·Granted Jun 21, 2022·1 cites·21 claims
- 0976US6934011B2Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elementsZEISS CARL SMT AG·Filed 2003·Granted Aug 23, 2005·11 cites·10 claims
- 1075US7818151B2Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation toolASML MASKTOOLS BV·Filed 2006·Granted Oct 19, 2010·4 cites·16 claims
- 1174US10607873B2Substrate edge detectionASML NETHERLANDS BV·Filed 2017·Granted Mar 31, 2020·2 cites·21 claims
- 1271US7423727B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Sep 9, 2008·3 cites·20 claims
- 1367US8339574B2Lithographic apparatus and device manufacturing methodTOTZECK MICHAEL·Filed 2008·Granted Dec 25, 2012·2 cites·7 claims
- 1460US7961297B2Method for determining intensity distribution in the image plane of a projection exposure arrangementZEISS CARL SMS GMBH·Filed 2006·Granted Jun 14, 2011·1 cites·25 claims
- 1559US9568838B2Projection objective for microlithographyZEISS CARL SMT GMBH·Filed 2015·Granted Feb 14, 2017·0 cites·8 claims
- 1659US2017248850A1Projection objective for microlithographyZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 1756US9217932B2Projection objective for microlithographyGEH BERND·Filed 2012·Granted Dec 22, 2015·0 cites·10 claims
- 1850US8212988B2Projection objective for microlithographyGEH BERND·Filed 2005·Granted Jul 3, 2012·0 cites·15 claims
- 1948US7952685B2Illuminator for a lithographic apparatus and methodZEISS CARL SMT AG·Filed 2007·Granted May 31, 2011·0 cites·24 claims
- 2047US2008284998A1Lithographic apparatus and method of controllingZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2146US2008204692A1Microlithographic projection exposure apparatus and method for producing microstructured componentsZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2245US7581305B2Method of manufacturing an optical componentZEISS CARL SMT AG·Filed 2004·Granted Sep 1, 2009·2 cites·24 claims
- 2345US2008068599A1Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elementsZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 2439US2006256311A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 2532US2006291031A1Arrangement of aperture diaphragms and/or filters, with changeable characteristics for optical devicesBOEHM KLAUS·Filed 2006·Application pending·0 cites
- 2632US2002085208A1Interferometer system and interferometric methodFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →