Inventor · disambiguated record
Benjamen M. Rathsack
Also filed as: RATHSACK BENJAMEN M · RATHSACK BENJAMEN MICHAEL
35 granted patents·6 pending applications·755 citations·filing 2005–2018
97Inventor score
Files withTOKYO ELECTRON LTD28TEXAS INSTRUMENTS INC5RATHSACK BENJAMEN M3SOMERVELL MARK H3RATHSACK BENJAMEN MICHAEL2
Top patents by PatentIndex Score
41 records- 0199US9613801B2Integration of absorption based heating bake methods into a photolithography track systemTOKYO ELECTRON LTD·Filed 2015·Granted Apr 4, 2017·464 cites·18 claims
- 0298US9136110B2Multi-step bake apparatus and method for directed self-assembly lithography controlTOKYO ELECTRON LTD·Filed 2014·Granted Sep 15, 2015·65 cites·20 claims
- 0397US9519227B2Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)TOKYO ELECTRON LTD·Filed 2015·Granted Dec 13, 2016·12 cites·20 claims
- 0495US9349604B2Use of topography to direct assembly of block copolymers in grapho-epitaxial applicationsTOKYO ELECTRON LTD·Filed 2014·Granted May 24, 2016·15 cites·15 claims
- 0595US8108805B2Simplified micro-bridging and roughness analysisRATHSACK BENJAMEN M·Filed 2010·Granted Jan 31, 2012·33 cites·20 claims
- 0694US9618848B2Methods and techniques to use with photosensitized chemically amplified resist chemicals and processesTOKYO ELECTRON LTD·Filed 2015·Granted Apr 11, 2017·12 cites·10 claims
- 0794US8795952B2Line pattern collapse mitigation through gap-fill material applicationSOMERVELL MARK H·Filed 2011·Granted Aug 5, 2014·13 cites·20 claims
- 0893US9418860B2Use of topography to direct assembly of block copolymers in grapho-epitaxial applicationsTOKYO ELECTRON LTD·Filed 2014·Granted Aug 16, 2016·12 cites·20 claims
- 0993US9412611B2Use of grapho-epitaxial directed self-assembly to precisely cut linesTOKYO ELECTRON LTD·Filed 2014·Granted Aug 9, 2016·10 cites·22 claims
- 1092US10020195B2Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resistsTOKYO ELECTRON LTD·Filed 2015·Granted Jul 10, 2018·8 cites·18 claims
- 1192US9005877B2Method of forming patterns using block copolymers and articles thereofRATHSACK BENJAMEN M·Filed 2012·Granted Apr 14, 2015·11 cites·15 claims
- 1292US7673278B2Enhanced process yield using a hot-spot libraryTOKYO ELECTRON LTD·Filed 2007·Granted Mar 2, 2010·26 cites·8 claims
- 1389US9454081B2Line pattern collapse mitigation through gap-fill material applicationTOKYO ELECTRON LTD·Filed 2014·Granted Sep 27, 2016·4 cites·20 claims
- 1487US8288174B1Electrostatic post exposure bake apparatus and methodRATHSACK BENJAMEN M·Filed 2011·Granted Oct 16, 2012·13 cites·18 claims
- 1586US9735026B2Controlling cleaning of a layer on a substrate using nozzlesTOKYO ELECTRON LTD·Filed 2013·Granted Aug 15, 2017·7 cites·20 claims
- 1685US10429745B2Photo-sensitized chemically amplified resist (PS-CAR) simulationTOKYO ELECTRON LTD·Filed 2016·Granted Oct 1, 2019·3 cites·24 claims
- 1785US7930656B2System and method for making photomasksTEXAS INSTRUMENTS INC·Filed 2007·Granted Apr 19, 2011·8 cites·11 claims
- 1882US9209014B2Multi-step bake apparatus and method for directed self-assembly lithography controlTOKYO ELECTRON LTD·Filed 2014·Granted Dec 8, 2015·4 cites·20 claims
- 1981US7737016B2Two-print two-etch method for enhancement of CD control using ghost polyTEXAS INSTRUMENTS INC·Filed 2006·Granted Jun 15, 2010·7 cites·10 claims
- 2080US9711419B2Substrate backside texturingTOKYO ELECTRON LTD·Filed 2015·Granted Jul 18, 2017·3 cites·16 claims
- 2179US9281251B2Substrate backside texturingTOKYO ELECTRON LTD·Filed 2014·Granted Mar 8, 2016·3 cites·19 claims
- 2276US10622267B2Facilitation of spin-coat planarization over feature topography during substrate fabricationTOKYO ELECTRON LTD·Filed 2017·Granted Apr 14, 2020·2 cites·19 claims
- 2376US8176443B2Layout of printable assist features to aid transistor controlRATHSACK BENJAMEN MICHAEL·Filed 2008·Granted May 8, 2012·8 cites·8 claims
- 2473US8318607B2Immersion lithography wafer edge bead removal for wafer and scanner defect preventionRATHSACK BENJAMEN MICHAEL·Filed 2008·Granted Nov 27, 2012·4 cites·13 claims
- 2572US9147574B2Topography minimization of neutral layer overcoats in directed self-assembly applicationsTOKYO ELECTRON LTD·Filed 2014·Granted Sep 29, 2015·2 cites·20 claims
- 2670US7807343B2EDA methodology for extending ghost feature beyond notched active to improve adjacent gate CD control using a two-print-two-etch approachTEXAS INSTRUMENTS INC·Filed 2007·Granted Oct 5, 2010·3 cites·15 claims
- 2768US8129089B2Use of blended solvents in defectivity preventionSOMERVELL MARK H·Filed 2010·Granted Mar 6, 2012·1 cites·10 claims
- 2867US9793137B2Use of grapho-epitaxial directed self-assembly applications to precisely cut logic linesTOKYO ELECTRON LTD·Filed 2016·Granted Oct 17, 2017·1 cites·18 claims
- 2967US9633847B2Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective depositionTOKYO ELECTRON LTD·Filed 2016·Granted Apr 25, 2017·1 cites·26 claims
- 3058US9715172B2Use of topography to direct assembly of block copolymers in grapho-epitaxial applicationsTOKYO ELECTRON LTD·Filed 2016·Granted Jul 25, 2017·0 cites·20 claims
- 3155US2016363868A1Line pattern collapse mitigation through gap-fill material applicationTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 3254US12165870B2Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resistsTOKYO ELECTRON LTD·Filed 2018·Granted Dec 10, 2024·0 cites·22 claims
- 3354US2014273534A1Integration of absorption based heating bake methods into a photolithography track systemTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3451US10534266B2Methods and techniques to use with photosensitized chemically amplified resist chemicals and processesTOKYO ELECTRON LTD·Filed 2017·Granted Jan 14, 2020·0 cites·22 claims
- 3551US2013107237A1Method of slimming radiation-sensitive material lines in lithographic applicationsTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 3650US8263306B2Use of blended solvents in defectivity preventionSOMERVELL MARK H·Filed 2005·Granted Sep 11, 2012·0 cites·5 claims
- 3747US2016141169A1Substrate backside texturingTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 3842US7910289B2Use of dual mask processing of different composition such as inorganic/organic to enable a single poly etch using a two-print-two-etch approachTEXAS INSTRUMENTS INC·Filed 2006·Granted Mar 22, 2011·0 cites·19 claims
- 3942US2007099424A1Reduction of mechanical stress on pattern specific geometries during etch using double pattern layout and process approachTEXAS INSTRUMENTS INC·Filed 2005·Application pending·0 cites
- 4040US10170354B2Subtractive methods for creating dielectric isolation structures within open featuresTOKYO ELECTRON LTD·Filed 2016·Granted Jan 1, 2019·0 cites·17 claims
- 4136US2016358786A1Techniques for Spin-on-Carbon PlanarizationTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →