Inventor · disambiguated record
Bruce W. Smith
Also filed as: SMITH BRUCE · SMITH BRUCE E · SMITH BRUCE W
28 granted patents·4 pending applications·715 citations·filing 1974–2021
97Inventor score
Files withASML NETHERLANDS BV8ROCHESTER INST TECH8SMITH BRUCE W7ASML MASKTOOLS BV2ASM LITHOGRAPHY BV1
Top patents by PatentIndex Score
32 records- 0198US4209069ADrills with chip collectorsLOCKHEED CORP·Filed 1974·Granted Jun 24, 1980·112 cites·18 claims
- 0296US6881523B2Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist featuresASML MASKTOOLS BV·Filed 2002·Granted Apr 19, 2005·121 cites·23 claims
- 0395US4053667AStiffened structural laminate and method of molding laminate with stiffener beadsLOCKHEED AIRCRAFT CORP·Filed 1974·Granted Oct 11, 1977·64 cites·6 claims
- 0493US7136143B2Method for aberration detection and measurementSMITH BRUCE W·Filed 2003·Granted Nov 14, 2006·42 cites·22 claims
- 0591US6525806B1Apparatus and method of image enhancement through spatial filteringASML NETHERLANDS BV·Filed 2000·Granted Feb 25, 2003·37 cites·47 claims
- 0691US6466304B1Illumination device for projection system and method for fabricatingASML NETHERLANDS BV·Filed 1999·Granted Oct 15, 2002·61 cites·14 claims
- 0791US6388736B1Imaging method using phase boundary masking with modified illuminationASM LITHOGRAPHY BV·Filed 2000·Granted May 14, 2002·39 cites·51 claims
- 0888US5939227AMulti-layered attenuated phase shift mask and a method for making the maskROCHESTER INST TECH·Filed 1998·Granted Aug 17, 1999·65 cites·20 claims
- 0985US7233887B2Method of photomask correction and its optimization using localized frequency analysisSMITH BRUCE W·Filed 2003·Granted Jun 19, 2007·26 cites·21 claims
- 1079US7345735B2Apparatus for aberration detection and measurementSMITH BRUCE W·Filed 2006·Granted Mar 18, 2008·4 cites·17 claims
- 1178US6395433B1Photomask for projection lithography at or below about 160 nm and a method thereofROCHESTER INST TECH·Filed 1999·Granted May 28, 2002·38 cites·63 claims
- 1276US6846595B2Method of improving photomask geometryASML NETHERLANDS BV·Filed 2001·Granted Jan 25, 2005·14 cites·31 claims
- 1376US6788388B2Illumination device for projection system and method for fabricatingASML NETHERLANDS BV·Filed 2002·Granted Sep 7, 2004·8 cites·34 claims
- 1475US6556361B1Projection imaging system with a non-circular aperture and a method thereofROCHESTER INST TECH·Filed 2000·Granted Apr 29, 2003·13 cites·24 claims
- 1573US6480263B1Apparatus and method for phase shift photomaskingASML NETHERLANDS BV·Filed 2000·Granted Nov 12, 2002·12 cites·30 claims
- 1668US7768648B2Method for aberration evaluation in a projection systemSMITH BRUCE W·Filed 2006·Granted Aug 3, 2010·2 cites·26 claims
- 1767US6368755B1Masks for use in optical lithography below 180 nmROCHESTER INST TECH·Filed 2000·Granted Apr 9, 2002·7 cites·22 claims
- 1865US6309780B1Attenuated phase shift mask and a method for making the maskROCHESTER INST TECH·Filed 1999·Granted Oct 30, 2001·21 cites·97 claims
- 1959USRE40239EIllumination device for projection system and method for fabricatingASML NETHERLANDS BV·Filed 2004·Granted Apr 15, 2008·3 cites·28 claims
- 2059US7170588B2Reduction Smith-Talbot interferometer prism for micropatterningSMITH BRUCE W·Filed 2004·Granted Jan 30, 2007·5 cites·25 claims
- 2157US6934010B2Optical proximity correction method utilizing gray bars as sub-resolution assist featuresASML MASKTOOLS BV·Filed 2002·Granted Aug 23, 2005·5 cites·18 claims
- 2255US2024001257A1System and Method of Treating BrinesSMITH BRUCE·Filed 2021·Application pending·0 cites
- 2354US6541750B1Modification of a projection imaging system with a non-circular aperture and a method thereofROCHESTER INST TECH·Filed 2000·Granted Apr 1, 2003·3 cites·26 claims
- 2450US6791667B2Illumination device for projection system and method for fabricatingASML NETHERLANDS BV·Filed 2002·Granted Sep 14, 2004·1 cites·24 claims
- 2547US7092073B2Method of illuminating a photomask using chevron illuminationASML NETHERLANDS BV·Filed 2001·Granted Aug 15, 2006·1 cites·19 claims
- 2647US6835505B2Mask for projection photolithography at or below about 160 nm and a method thereofROCHESTER INST TECH·Filed 2002·Granted Dec 28, 2004·1 cites·67 claims
- 2745US2022162529A1Packaging and products made using spent grainsCOORS BREWING CO·Filed 2020·Application pending·0 cites
- 2844US8852850B2Method of photolithography using a fluid and a system thereofSMITH BRUCE W·Filed 2005·Granted Oct 7, 2014·0 cites·40 claims
- 2944USRE39349EMasks for use in optical lithography below 180 nmROCHESTER INST TECH·Filed 2003·Granted Oct 17, 2006·0 cites·22 claims
- 3044US2007172745A1Evanescent wave assist features for microlithographySMITH BRUCE W·Filed 2007·Application pending·0 cites
- 3139US2002131154A1Photonic channel allocator and shifterFiled 2001·Application pending·0 cites
- 3230US6531656B1Supply line alignment apparatus for supply columnHILL ROM SERVICES INC·Filed 1999·Granted Mar 11, 2003·10 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →