Inventor · disambiguated record
Caizhong Tian
Also filed as: TIAN CAIZ H · TIAN CAIZHONG
10 granted patents·9 pending applications·76 citations·filing 2004–2013
86Inventor score
Top patents by PatentIndex Score
19 records- 0188US7396431B2Plasma processing system for treating a substrateTOKYO ELECTRON LTD·Filed 2004·Granted Jul 8, 2008·50 cites·60 claims
- 0281US8925351B2Manufacturing method of top plate of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jan 6, 2015·5 cites·6 claims
- 0375US9048070B2Dielectric window for plasma treatment device, and plasma treatment deviceTOKYO ELECTRON LTD·Filed 2012·Granted Jun 2, 2015·3 cites·10 claims
- 0475US8967080B2Top plate of microwave plasma processing apparatus, plasma processing apparatus and plasma processing methodTIAN CAIZHONG·Filed 2009·Granted Mar 3, 2015·10 cites·8 claims
- 0575US8343308B2Ceiling plate and plasma process apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Jan 1, 2013·4 cites·6 claims
- 0669US8480848B2Plasma processing apparatusTIAN CAIZHONG·Filed 2006·Granted Jul 9, 2013·1 cites·8 claims
- 0769US7895971B2Microwave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Mar 1, 2011·3 cites·18 claims
- 0859US2008254220A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 0955US8273210B2Plasma processing apparatus and method for adjusting plasma density distributionTIAN CAIZHONG·Filed 2008·Granted Sep 25, 2012·0 cites·17 claims
- 1051US2011114021A1Planar antenna member and plasma processing apparatus including the sameUEDA ATSUSHI·Filed 2009·Application pending·0 cites
- 1150US2013081763A1Ceiling plate and plasma process apparatusTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 1248US2009050052A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1348US2009183677A1Temperature control device and processing apparatus using the sameTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1446US2010307685A1Microwave plasma processing apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1542US9277637B2Apparatus for plasma treatment and method for plasma treatmentNOZAWA TOSHIHISA·Filed 2011·Granted Mar 1, 2016·0 cites·19 claims
- 1642US2009266487A1Microwave introduction deviceTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 1740US2008190560A1Microwave Plasma Processing ApparatusTIAN CAIZHONG·Filed 2006·Application pending·0 cites
- 1839US8387560B2Plasma processing unitTIAN CAIZHONG·Filed 2005·Granted Mar 5, 2013·0 cites·13 claims
- 1935US2014166205A1Process monitoring device for use in substrate process apparatus, process monitoring method and substrate processing apparatusTIAN CAIZHONG·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →