Inventor · disambiguated record
Chiu Chan
Also filed as: CHAN CHIU · CHAN CHIU YEE
15 granted patents·7 pending applications·226 citations·filing 2000–2019
93Inventor score
Files withAPPLIED MATERIALS INC8PADHI DEENESH5BALASUBRAMANIAN GANESH2SEAMONS MARTIN JAY2SHAH ASHISH2
Top patents by PatentIndex Score
22 records- 0196US8361906B2Ultra high selectivity ashable hard mask filmAPPLIED MATERIALS INC·Filed 2010·Granted Jan 29, 2013·63 cites·13 claims
- 0295US8536065B2Ultra high selectivity doped amorphous carbon strippable hardmask development and integrationSEAMONS MARTIN JAY·Filed 2011·Granted Sep 17, 2013·51 cites·17 claims
- 0394US8993454B2Ultra high selectivity doped amorphous carbon strippable hardmask development and integrationAPPLIED MATERIALS INC·Filed 2013·Granted Mar 31, 2015·16 cites·5 claims
- 0494US8197636B2Systems for plasma enhanced chemical vapor deposition and bevel edge etchingSHAH ASHISH·Filed 2008·Granted Jun 12, 2012·30 cites·11 claims
- 0589US7867578B2Method for depositing an amorphous carbon film with improved density and step coverageAPPLIED MATERIALS INC·Filed 2006·Granted Jan 11, 2011·12 cites·14 claims
- 0685US6468136B1Tungsten CMP with improved alignment mark integrity, reduced edge residue, and reduced retainer ring notchingAPPLIED MATERIALS INC·Filed 2000·Granted Oct 22, 2002·30 cites·21 claims
- 0784US8282734B2Methods to improve the in-film defectivity of PECVD amorphous carbon filmsPADHI DEENESH·Filed 2008·Granted Oct 9, 2012·6 cites·8 claims
- 0879US7922440B2Apparatus and method for centering a substrate in a process chamberAPPLIED MATERIALS INC·Filed 2008·Granted Apr 12, 2011·6 cites·20 claims
- 0979US7514125B2Methods to improve the in-film defectivity of PECVD amorphous carbon filmsAPPLIED MATERIALS INC·Filed 2007·Granted Apr 7, 2009·2 cites·7 claims
- 1074US10227695B2Shadow ring for modifying wafer edge and bevel depositionDU BOIS DALE R·Filed 2010·Granted Mar 12, 2019·4 cites·13 claims
- 1172US11136665B2Shadow ring for modifying wafer edge and bevel depositionAPPLIED MATERIALS INC·Filed 2019·Granted Oct 5, 2021·1 cites·13 claims
- 1267US8513129B2Planarizing etch hardmask to increase pattern density and aspect ratioSEAMONS MARTIN JAY·Filed 2010·Granted Aug 20, 2013·2 cites·13 claims
- 1366US9337072B2Apparatus and method for substrate clamping in a plasma chamberBALASUBRAMANIAN GANESH·Filed 2010·Granted May 10, 2016·2 cites·12 claims
- 1461US9653327B2Methods of removing a material layer from a substrate using water vapor treatmentLEE KWANGDUK DOUGLAS·Filed 2011·Granted May 16, 2017·1 cites·11 claims
- 1561US2012204795A1Methods to improve the in-film defectivity of pecvd amorphous carbon filmsPADHI DEENESH·Filed 2012·Application pending·0 cites
- 1652US9873105B2Sorbent material and a method for enhancing sorption performance thereofUNIV CITY HONG KONG·Filed 2014·Granted Jan 23, 2018·0 cites·10 claims
- 1752US2008084650A1Apparatus and method for substrate clamping in a plasma chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1848US2013284090A1Compensating concentration uncertainityBALASUBRAMANIAN GANESH·Filed 2013·Application pending·0 cites
- 1948US2012211164A1Systems for plasma enhanced chemical vapor deposition and bevel edge etchingSHAH ASHISH·Filed 2012·Application pending·0 cites
- 2046US2012208373A1Method for depositing an amorphous carbon film with improved density and step coveragePADHI DEENESH·Filed 2012·Application pending·0 cites
- 2144US2011104400A1Method for depositing an amorphous carbon film with improved density and step coveragePADHI DEENESH·Filed 2011·Application pending·0 cites
- 2242US2008153311A1Method for depositing an amorphous carbon film with improved density and step coveragePADHI DEENESH·Filed 2008·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →