Inventor · disambiguated record
Cheng-Yuan Ko
Also filed as: KO CHENG-YUAN
6 granted patents·7 pending applications·0 citations·filing 2013–2024
65Inventor score
Top patents by PatentIndex Score
13 records- 0167US12466979B2CMP composition including anionic and cationic inhibitorsCMC MAT LLC·Filed 2024·Granted Nov 11, 2025·0 cites·4 claims
- 0260US2024174891A1Titanium dioxide chemical-mechanical polishing composition for polishing nickel substratesENTEGRIS INC·Filed 2023·Application pending·0 cites
- 0358US12234382B2CMP composition including anionic and cationic inhibitorsCMC MAT INC·Filed 2021·Granted Feb 25, 2025·0 cites·13 claims
- 0450US11629271B2Titanium dioxide containing ruthenium chemical mechanical polishing slurryCMC MAT INC·Filed 2021·Granted Apr 18, 2023·0 cites·21 claims
- 0550US2019241783A1Composition and method for polishing silicon carbideCABOT MICROELECTRONICS CORP·Filed 2019·Application pending·0 cites
- 0648US10294399B2Composition and method for polishing silicon carbideCABOT MICROELECTRONICS CORP·Filed 2017·Granted May 21, 2019·0 cites·8 claims
- 0742US2014063206A1System and method of viewer centric depth adjustmentUNIV NAT TAIWAN·Filed 2013·Application pending·0 cites
- 0839US2020308451A1Additives to improve particle dispersion for cmp slurryCABOT MICROELECTRONICS CORP·Filed 2020·Application pending·0 cites
- 0939US2020181454A1Oxidizer free slurry for ruthenium cmpCABOT MICROELECTRONICS CORP·Filed 2019·Application pending·0 cites
- 1037US9828574B2Cleaning composition and method for cleaning semiconductor wafers after CMPCABOT MICROELECTRONICS CORP·Filed 2016·Granted Nov 28, 2017·0 cites·19 claims
- 1137US2014264151A1Aqueous cleaning composition for post copper chemical mechanical planarizationCABOT MICROELECTRONICS CORP·Filed 2014·Application pending·0 cites
- 1235US10100272B2Cleaning composition following CMP and methods related theretoCABOT MICROELECTRONICS CORP·Filed 2015·Granted Oct 16, 2018·0 cites·28 claims
- 1330US2017158993A1Stabilization of tris(2 hydroxyethyl)methylammonium hydroxide against decomposition with dialkyhydroxylamineCABOT MICROELECTRONICS CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →