Inventor · disambiguated record
Chris Mack
Also filed as: MACK CHRIS · MACK CHRIS A
36 granted patents·9 pending applications·582 citations·filing 1993–2025
98Inventor score
Top patents by PatentIndex Score
45 records- 0198US10176966B1Edge detection systemFRACTILIA LLC·Filed 2018·Granted Jan 8, 2019·35 cites·50 claims
- 0296US10665418B2System and method for generating and analyzing roughness measurementsFRACTILIA LLC·Filed 2019·Granted May 26, 2020·10 cites·20 claims
- 0396US10522322B2System and method for generating and analyzing roughness measurementsFRACTILIA LLC·Filed 2018·Granted Dec 31, 2019·13 cites·23 claims
- 0496US10488188B2System and method for removing noise from roughness measurementsFRACTILIA LLC·Filed 2018·Granted Nov 26, 2019·13 cites·28 claims
- 0596US7566517B1Feature printability optimization by optical toolKLA TENCOR TECH CORP·Filed 2005·Granted Jul 28, 2009·28 cites·19 claims
- 0695US10665417B2System and method for generating and analyzing roughness measurementsFRACTILIA LLC·Filed 2019·Granted May 26, 2020·10 cites·20 claims
- 0795US10656532B2Edge detection system and its use for optical proximity correctionFRACTILIA LLC·Filed 2019·Granted May 19, 2020·13 cites·20 claims
- 0895US7297453B2Systems and methods for mitigating variances on a patterned wafer using a prediction modelKLA TENCOR TECH CORP·Filed 2006·Granted Nov 20, 2007·25 cites·15 claims
- 0994US10664955B2Edge detection system and its use for machine learningFRACTILIA LLC·Filed 2019·Granted May 26, 2020·14 cites·20 claims
- 1093US11380516B2System and method for generating and analyzing roughness measurements and their use for process monitoring and controlFRACTILIA LLC·Filed 2020·Granted Jul 5, 2022·2 cites·20 claims
- 1193US10648801B2System and method for generating and analyzing roughness measurements and their use for process monitoring and controlFRACTILIA LLC·Filed 2019·Granted May 12, 2020·12 cites·20 claims
- 1293US10510509B2Edge detection systemFRACTILIA LLC·Filed 2018·Granted Dec 17, 2019·8 cites·20 claims
- 1393US7656512B2Method for determining lithographic focus and exposureKLA TENCOR TECH CORP·Filed 2008·Granted Feb 2, 2010·15 cites·40 claims
- 1493US7382447B2Method for determining lithographic focus and exposureKLA TENCOR TECH CORP·Filed 2002·Granted Jun 3, 2008·46 cites·18 claims
- 1593US7303842B2Systems and methods for modifying a reticle's optical propertiesKLA TENCOR TECH CORP·Filed 2006·Granted Dec 4, 2007·20 cites·39 claims
- 1693US6968253B2Computer-implemented method and carrier medium configured to generate a set of process parameters for a lithography processKLA TENCOR TECH CORP·Filed 2003·Granted Nov 22, 2005·57 cites·8 claims
- 1792US7804994B2Overlay metrology and control methodKLA TENCOR TECH CORP·Filed 2003·Granted Sep 28, 2010·54 cites·16 claims
- 1891US7368208B1Measuring phase errors on phase shift masksKLA TENCOR TECH CORP·Filed 2006·Granted May 6, 2008·12 cites·12 claims
- 1991US7352453B2Method for process optimization and control by comparison between 2 or more measured scatterometry signalsKLA TENCOR TECH CORP·Filed 2004·Granted Apr 1, 2008·56 cites·33 claims
- 2091US7142941B2Computer-implemented method and carrier medium configured to generate a set of process parameters and/or a list of potential causes of deviations for a lithography processKLA TENCOR TECH CORP·Filed 2005·Granted Nov 28, 2006·13 cites·11 claims
- 2190US11996265B2System and method for generating and analyzing roughness measurements and their use for process monitoring and controlFRACTILIA LLC·Filed 2022·Granted May 28, 2024·1 cites·20 claims
- 2290US11355306B2System and method for generating and analyzing roughness measurements and their use for process monitoring and controlFRACTILIA LLC·Filed 2020·Granted Jun 7, 2022·2 cites·20 claims
- 2390US5363171APhotolithography exposure tool and method for in situ photoresist measurments and exposure controlUS ARMY·Filed 1993·Granted Nov 8, 1994·64 cites·9 claims
- 2489US11004653B2Edge detection systemFRACTILIA LLC·Filed 2019·Granted May 11, 2021·4 cites·24 claims
- 2589US9188974B1Methods for improved monitor and control of lithography processesMACK CHRIS·Filed 2011·Granted Nov 17, 2015·16 cites·27 claims
- 2688US11004654B2System and method for generating and analyzing roughness measurementsFRACTILIA LLC·Filed 2019·Granted May 11, 2021·3 cites·20 claims
- 2787US11670480B2System and method for generating and analyzing roughness measurementsFRACTILIA LLC·Filed 2021·Granted Jun 6, 2023·1 cites·20 claims
- 2887US7528953B2Target acquisition and overlay metrology based on two diffracted orders imagingKLA TENCOR TECH CORP·Filed 2006·Granted May 5, 2009·10 cites·30 claims
- 2985US11361937B2System and method for generating and analyzing roughness measurements and their use for process monitoring and controlFRACTILIA LLC·Filed 2020·Granted Jun 14, 2022·1 cites·20 claims
- 3085US2023326711A1System and method for generating and analyzing roughness measurementsFRACTILIA LLC·Filed 2023·Application pending·0 cites
- 3182US7075639B2Method and mark for metrology of phase errors on phase shift masksKLA TENCOR TECH CORP·Filed 2003·Granted Jul 11, 2006·17 cites·20 claims
- 3281US2024312757A1System and method for generating and analyzing roughness measurements and their use for process monitoring and controlFRACTILIA LLC·Filed 2024·Application pending·0 cites
- 3377US11664188B2Edge detection systemFRACTILIA LLC·Filed 2021·Granted May 30, 2023·0 cites·24 claims
- 3467US2025069843A1Detection of Probabilistic Process WindowsFRACTILIA LLC·Filed 2024·Application pending·0 cites
- 3566US11508546B2System and method for low-noise edge detection and its use for process monitoring and controlFRACTILIA LLC·Filed 2021·Granted Nov 22, 2022·0 cites·20 claims
- 3665US11521825B2System and method for predicting stochastic-aware process window and yield and their use for process monitoring and controlFRACTILIA LLC·Filed 2021·Granted Dec 6, 2022·0 cites·20 claims
- 3761US2024258066A1Method of Dispositioning and Control of a Semiconductor Manufacturing ProcessFRACTILIA LLC·Filed 2024·Application pending·0 cites
- 3860US12142454B2Detection of probabilistic process windowsFRACTILIA LLC·Filed 2021·Granted Nov 12, 2024·0 cites·18 claims
- 3958US2023134093A1System and method for determining and/or predicting unbiased parameters associated with semiconductor measurementsFRACTILIA LLC·Filed 2022·Application pending·0 cites
- 4054US7300729B2Method for monitoring a reticleKLA TENCOR TECH CORP·Filed 2006·Granted Nov 27, 2007·4 cites·14 claims
- 4151US7300725B2Method for determining and correcting reticle variationsKLA TENCOR TECH CORP·Filed 2006·Granted Nov 27, 2007·3 cites·13 claims
- 4251US2025265646A1System and method for trading of assets with different characteristicsMACK CHRIS·Filed 2025·Application pending·0 cites
- 4346US2009111056A1Resolution enhancement techniques combining four beam interference-assisted lithography with other photolithography techniquesAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 4446US2009117491A1Resolution enhancement techniques combining interference-assisted lithography with other photolithography techniquesAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 4545US2004229736A1Swing trainerFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →