Inventor · disambiguated record
Ching-Ling Meng
Also filed as: MENG CHING L · MENG CHING-LING
31 granted patents·12 pending applications·420 citations·filing 1998–2024
97Inventor score
Files withTOKYO ELECTRON LTD24KLA TENCOR TECH CORP8INNOVUSION INC5KLA TENCOR TECHNOLOGIES2APPLIED MATERIALS INC1
Top patents by PatentIndex Score
43 records- 0198US8010222B2Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or toolKLA TENCOR TECH CORP·Filed 2008·Granted Aug 30, 2011·29 cites·10 claims
- 0297US10345246B2Dark field wafer nano-defect inspection system with a singular beamTOKYO ELECTRON LTD·Filed 2017·Granted Jul 9, 2019·20 cites·20 claims
- 0393US6866559B2Windows configurable to be coupled to a process tool or to be disposed within an opening in a polishing padKLA TENCOR TECHNOLOGIES·Filed 2003·Granted Mar 15, 2005·31 cites·90 claims
- 0492US10473525B2Spatially resolved optical emission spectroscopy (OES) in plasma processingTOKYO ELECTRON LTD·Filed 2017·Granted Nov 12, 2019·6 cites·20 claims
- 0592US7595869B1Optical metrology system optimized with a plurality of design goalsTOKYO ELECTRON LTD·Filed 2008·Granted Sep 29, 2009·24 cites·20 claims
- 0692US7332438B2Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or toolKLA TENCOR TECH CORP·Filed 2006·Granted Feb 19, 2008·11 cites·9 claims
- 0792US6884146B2Systems and methods for characterizing a polishing processKLA TENCOR TECH CORP·Filed 2003·Granted Apr 26, 2005·24 cites·39 claims
- 0891US7281862B2Optical device latching mechanismINTEL CORP·Filed 2005·Granted Oct 16, 2007·28 cites·20 claims
- 0990US7420681B1Gas purge system and methodsKLA TENCOR TECH CORP·Filed 2006·Granted Sep 2, 2008·22 cites·29 claims
- 1089US7761178B2Automated process control using an optical metrology system optimized with design goalsTOKYO ELECTRON LTD·Filed 2008·Granted Jul 20, 2010·16 cites·23 claims
- 1186US10692705B2Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamberTOKYO ELECTRON LTD·Filed 2016·Granted Jun 23, 2020·5 cites·23 claims
- 1286US7734437B2Apparatus for designing an optical metrology system optimized with signal criteriaTOKYO ELECTRON LTD·Filed 2008·Granted Jun 8, 2010·12 cites·20 claims
- 1386US6935922B2Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishingKLA TENCOR TECH CORP·Filed 2003·Granted Aug 30, 2005·16 cites·100 claims
- 1485US7589845B1Process control using an optical metrology system optimized with signal criteriaTOKYO ELECTRON LTD·Filed 2008·Granted Sep 15, 2009·16 cites·20 claims
- 1584US11385154B2Apparatus and method for monitoring and measuring properties of polymers in solutionsTOKYO ELECTRON LTD·Filed 2020·Granted Jul 12, 2022·1 cites·20 claims
- 1684US9970818B2Spatially resolved optical emission spectroscopy (OES) in plasma processingTOKYO ELECTRON LTD·Filed 2014·Granted May 15, 2018·5 cites·19 claims
- 1784US8831767B2Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or toolLEHMAN KURT·Filed 2011·Granted Sep 9, 2014·3 cites·19 claims
- 1884US7030018B2Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or toolKLA TENCOR TECH CORP·Filed 2003·Granted Apr 18, 2006·14 cites·23 claims
- 1984US6312319B1Polishing media magazine for improved polishingFiled 1998·Granted Nov 6, 2001·74 cites·45 claims
- 2083US12261030B2Normal-incidence in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2024·Granted Mar 25, 2025·0 cites·10 claims
- 2183US7742889B2Designing an optical metrology system optimized with signal criteriaTOKYO ELECTRON LTD·Filed 2008·Granted Jun 22, 2010·9 cites·20 claims
- 2282US10978278B2Normal-incident in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2018·Granted Apr 13, 2021·2 cites·19 claims
- 2380US9059038B2System for in-situ film stack measurement during etching and etch control methodTOKYO ELECTRON LTD·Filed 2013·Granted Jun 16, 2015·5 cites·10 claims
- 2480US7761250B2Optical metrology system optimized with design goalsTOKYO ELECTRON LTD·Filed 2008·Granted Jul 20, 2010·12 cites·18 claims
- 2580US7175503B2Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current deviceKLA TENCOR TECH CORP·Filed 2003·Granted Feb 13, 2007·11 cites·47 claims
- 2679US7052369B2Methods and systems for detecting a presence of blobs on a specimen during a polishing processKLA TENCOR TECH CORP·Filed 2003·Granted May 30, 2006·10 cites·38 claims
- 2774US2023136272A1Compact lidar systems for detecting objects in blind-spot areasINNOVUSION INC·Filed 2022·Application pending·0 cites
- 2874US2023138819A1Compact lidar systems for detecting objects in blind-spot areasINNOVUSION INC·Filed 2022·Application pending·0 cites
- 2973US2024418501A1Optical sensor for film thickness measurementTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3070US9846088B2Differential acoustic time of flight measurement of temperature of semiconductor substratesTOKYO ELECTRON LTD·Filed 2014·Granted Dec 19, 2017·2 cites·20 claims
- 3169US11961721B2Normal-incidence in-situ process monitor sensorTOKYO ELECTRON LTD·Filed 2021·Granted Apr 16, 2024·0 cites·8 claims
- 3267US10837902B2Optical sensor for phase determinationTOKYO ELECTRON LTD·Filed 2018·Granted Nov 17, 2020·1 cites·20 claims
- 3365US2024168206A1Systems and methods for polygon mirror angles adjustmentINNOVUSION INC·Filed 2023·Application pending·0 cites
- 3464US6679755B1Chemical mechanical planarization systemAPPLIED MATERIALS INC·Filed 2000·Granted Jan 20, 2004·9 cites·25 claims
- 3564US2024103138A1Stray light filter structures for lidar detector arrayINNOVUSION INC·Filed 2023·Application pending·0 cites
- 3663US2024230898A9Laser source with multiple seeds for lidarINNOVUSION INC·Filed 2023·Application pending·0 cites
- 3759US2025164410A1Optical metrologyTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3858US7789541B2Method and system for lamp temperature control in optical metrologyTOKYO ELECTRON LTD·Filed 2008·Granted Sep 7, 2010·2 cites·16 claims
- 3956US2009234687A1Method of designing an optical metrology system optimized for operating time budgetTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 4051US2006148383A1Methods and systems for detecting a presence of blobs on a specimen during a polishing processKLA TENCOR TECHNOLOGIES·Filed 2006·Application pending·0 cites
- 4147US2022139743A1Optical Sensor for Inspecting Pattern Collapse DefectsTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 4246US2009240537A1Apparatus for designing an optical metrology system optimized for operating time budgetTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 4337US2018286643A1Advanced optical sensor, system, and methodologies for etch processing monitoringTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →