Inventor · disambiguated record
Charan V. V. S. Surisetty
Also filed as: SURISETTY CHARAN V · SURISETTY CHARAN V V S
12 granted patents·1 pending application·10 citations·filing 2015–2021
86Inventor score
Top patents by PatentIndex Score
13 records- 0192US9698101B2Self-aligned local interconnect technologyIBM·Filed 2015·Granted Jul 4, 2017·6 cites·19 claims
- 0288US10923471B2Minimizing shorting between FinFET epitaxial regionsTESSERA INC·Filed 2019·Granted Feb 16, 2021·2 cites·20 claims
- 0377US11522045B2Semiconductor structures including middle-of-line (MOL) capacitance reduction for self-aligned contact in gate stackTESSERA LLC·Filed 2021·Granted Dec 6, 2022·0 cites·24 claims
- 0477US10325848B2Self-aligned local interconnect technologyIBM·Filed 2018·Granted Jun 18, 2019·1 cites·20 claims
- 0567US10937861B2Semiconductor structures including middle-of-line (MOL) capacitance reduction for self-aligned contact in gate stackTESSERA INC·Filed 2019·Granted Mar 2, 2021·0 cites·18 claims
- 0666US10811410B2Simultaneously fabricating a high voltage transistor and a FinFETELPIS TECH INC·Filed 2019·Granted Oct 20, 2020·0 cites·17 claims
- 0766US10790284B2Spacer for trench epitaxial structuresIBM·Filed 2019·Granted Sep 29, 2020·0 cites·17 claims
- 0866US10763326B2Middle-of-line (MOL) capacitance reduction for self-aligned contact in gate stackTESSERA INC·Filed 2019·Granted Sep 1, 2020·0 cites·18 claims
- 0966US10741559B2Spacer for trench epitaxial structuresIBM·Filed 2019·Granted Aug 11, 2020·0 cites·17 claims
- 1066US9818873B2Forming stressed epitaxial layers between gates separated by different pitchesGLOBALFOUNDRIES INC·Filed 2015·Granted Nov 14, 2017·1 cites·14 claims
- 1159US10699951B2Self-aligned low dielectric constant gate cap and a method of forming the sameELPIS TECH INC·Filed 2017·Granted Jun 30, 2020·0 cites·17 claims
- 1259US10236253B2Self-aligned local interconnect technologyIBM·Filed 2017·Granted Mar 19, 2019·0 cites·20 claims
- 1350US2017025305A1Shallow trench isolation regions made from crystalline oxidesIBM·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →