Inventor · disambiguated record
Christoph Zaczek
Also filed as: ZACZEK CHRISTOPH
23 granted patents·17 pending applications·118 citations·filing 2002–2024
93Inventor score
Files withZEISS CARL SMT AG17ZEISS CARL SMT GMBH11PAUL HANS-JOCHEN2PAZIDIS ALEXANDRA2ZACZEK CHRISTOPH2
Top patents by PatentIndex Score
40 records- 0193US7460206B2Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2004·Granted Dec 2, 2008·71 cites·3 claims
- 0287US7583443B2Reflective optical element for ultraviolet radiation, projection optical system and projection exposure system therewith, and method for forming the sameZEISS CARL SMT AG·Filed 2009·Granted Sep 1, 2009·15 cites·16 claims
- 0379US9146475B2Projection exposure system and projection exposure methodZEISS CARL SMT GMBH·Filed 2013·Granted Sep 29, 2015·3 cites·33 claims
- 0477US8488103B2Optical element for reflection of UV radiation, method for manufacturing the same and projection exposure apparatus comprising the samePAZIDIS ALEXANDRA·Filed 2010·Granted Jul 16, 2013·3 cites·9 claims
- 0574US7659976B2Devices and methods for inspecting optical elements with a view to contaminationZEISS CARL SMT AG·Filed 2006·Granted Feb 9, 2010·2 cites·29 claims
- 0670US10146137B2Catadioptric projection objective including a reflective optical component and a measuring deviceBLEIDISTEL SASCHA·Filed 2012·Granted Dec 4, 2018·2 cites·20 claims
- 0768US7518797B2Microlithographic exposure apparatusZEISS CARL SMT AG·Filed 2006·Granted Apr 14, 2009·2 cites·24 claims
- 0866US8546776B2Optical system for EUV lithography with a charged-particle sourceZEISS CARL SMT GMBH·Filed 2012·Granted Oct 1, 2013·1 cites·11 claims
- 0965US12117731B2Method for producing a mirror of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Oct 15, 2024·0 cites·17 claims
- 1064US6863398B2Method and coating system for coating substrates for optical componentsZEISS CARL SMT AG·Filed 2002·Granted Mar 8, 2005·8 cites·40 claims
- 1164US2023375939A1Method for producing a multi-part mirror of a projection illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1262US2024329285A1Method and apparatus for producing at least one hollow structure, mirror, euv lithography system, fluid feed apparatus and method for feeding a fluidZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1360US7093937B2Optical component and coating system for coating substrates for optical componentsZEISS CARL SMT AG·Filed 2005·Granted Aug 22, 2006·2 cites·5 claims
- 1459US11474281B2Optical element and method of making an optical elementZEISS CARL MEDITEC AG·Filed 2020·Granted Oct 18, 2022·0 cites·11 claims
- 1559US10578976B2Catadioptric projection objective including a reflective optical component and a measuring deviceZEISS CARL SMT GMBH·Filed 2018·Granted Mar 3, 2020·0 cites·20 claims
- 1658US2024019613A1Method for producing a mirror of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1758US2024027730A1Method for producing a mirror of a lithography systemZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1856US6842294B2Catadioptric objectiveZEISS CARL SMT AG·Filed 2002·Granted Jan 11, 2005·5 cites·2 claims
- 1954US7239447B2Objective with crystal lensesZEISS CARL SMT AG·Filed 2004·Granted Jul 3, 2007·4 cites·33 claims
- 2054US2008297745A1Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2154US2008291419A1Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 2253US11520087B2Reflective optical elementZEISS CARL SMT GMBH·Filed 2021·Granted Dec 6, 2022·0 cites·8 claims
- 2350US10698135B2Optical element and method of making an optical elementZEISS CARL MEDITEC AG·Filed 2017·Granted Jun 30, 2020·0 cites·17 claims
- 2447US8435726B2Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatusPAZIDIS ALEXANDRA·Filed 2008·Granted May 7, 2013·0 cites·29 claims
- 2546US8049964B2Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an elementZEISS CARL SMT GMBH·Filed 2006·Granted Nov 1, 2011·0 cites·19 claims
- 2646US2007242250A1Objective with crystal lensesZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 2745US9684252B2Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an elementZACZEK CHRISTOPH·Filed 2011·Granted Jun 20, 2017·0 cites·13 claims
- 2845US2010149510A1Methods for producing an antireflection surface on an optical element, optical element and associated optical arrangementZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 2942US9188771B2Reflective optical imaging systemDODOC AURELIAN·Filed 2011·Granted Nov 17, 2015·0 cites·28 claims
- 3041US2012134015A1Mirror for euv wavelengths, projection objective for microlithography having such mirror and projection exposure apparatus having such projection objectivePAUL HANS-JOCHEN·Filed 2011·Application pending·0 cites
- 3140US2007024982A1Imaging system for a microlithographic projection exposure systemZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 3240US2005264884A1Projection objective for microlithographyZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 3340US2007007491A1Optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatusMUELLER RALF·Filed 2006·Application pending·0 cites
- 3439US9915876B2EUV mirror and optical system comprising EUV mirrorZEISS CARL SMT GMBH·Filed 2015·Granted Mar 13, 2018·0 cites·22 claims
- 3539US2006262389A1Reflective optical element for ultraviolet radiation, projection optical system and projection exposure system therewith, and method for forming the sameZACZEK CHRISTOPH·Filed 2006·Application pending·0 cites
- 3639US2006132917A1Method for making an optical system with coated optical components and optical system made by the methodZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 3739US2005254120A1Optical imaging system, in particular catadioptric reduction objectiveZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 3839US2012212810A1Mirror for the euv wavelength range, projection objective for microlithography cromprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objectivePAUL HANS-JOCHEN·Filed 2012·Application pending·0 cites
- 3937US9494718B2Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objectiveMUELLENDER STEPHAN·Filed 2012·Granted Nov 15, 2016·0 cites·27 claims
- 4036US2005243435A1Catadioptric reduction objective having a polarization beamsplitterZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →