Inventor · disambiguated record
Daniel J. W. Brown
Also filed as: BROWN DANIEL · BROWN DANIEL J · BROWN DANIEL J W
45 granted patents·9 pending applications·1,393 citations·filing 2001–2024
98Inventor score
Top patents by PatentIndex Score
54 records- 0199US6567450B2Very narrow band, two chamber, high rep rate gas discharge laser systemCYMER INC·Filed 2001·Granted May 20, 2003·265 cites·52 claims
- 0298US6625191B2Very narrow band, two chamber, high rep rate gas discharge laser systemCYMER INC·Filed 2001·Granted Sep 23, 2003·236 cites·78 claims
- 0397US7885309B2Laser systemCYMER INC·Filed 2007·Granted Feb 8, 2011·37 cites·23 claims
- 0497US7643529B2Laser systemCYMER INC·Filed 2007·Granted Jan 5, 2010·35 cites·15 claims
- 0596US8680495B1Extreme ultraviolet light sourceCYMER INC·Filed 2013·Granted Mar 25, 2014·17 cites·18 claims
- 0696US7920616B2Laser systemCYMER INC·Filed 2007·Granted Apr 5, 2011·32 cites·17 claims
- 0796US7822092B2Laser systemCYMER INC·Filed 2007·Granted Oct 26, 2010·37 cites·15 claims
- 0896US7715459B2Laser systemCYMER INC·Filed 2007·Granted May 11, 2010·36 cites·30 claims
- 0996US7154928B2Laser output beam wavefront splitter for bandwidth spectrum controlCYMER INC·Filed 2004·Granted Dec 26, 2006·62 cites·64 claims
- 1096US6538737B2High resolution etalon-grating spectrometerCYMER INC·Filed 2001·Granted Mar 25, 2003·109 cites·8 claims
- 1196US6532247B2Laser wavelength control unit with piezoelectric driverCYMER INC·Filed 2001·Granted Mar 11, 2003·79 cites·17 claims
- 1295US8653437B2EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periodsPARTLO WILLIAM N·Filed 2011·Granted Feb 18, 2014·20 cites·21 claims
- 1395US7630424B2Laser systemCYMER INC·Filed 2007·Granted Dec 8, 2009·24 cites·24 claims
- 1494US8144740B1Laser systemBROWN DANIEL J W·Filed 2009·Granted Mar 27, 2012·37 cites·16 claims
- 1593US7567607B2Very narrow band, two chamber, high rep-rate gas discharge laser systemCYMER INC·Filed 2006·Granted Jul 28, 2009·14 cites·3 claims
- 1693US7317196B2LPP EUV light sourceCYMER INC·Filed 2004·Granted Jan 8, 2008·54 cites·28 claims
- 1793US6704340B2Lithography laser system with in-place alignment toolCYMER INC·Filed 2002·Granted Mar 9, 2004·53 cites·13 claims
- 1892US9357625B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted May 31, 2016·11 cites·32 claims
- 1992US8654438B2Master oscillator-power amplifier drive laser with pre-pulse for EUV light sourceHOU KAI-CHUNG·Filed 2011·Granted Feb 18, 2014·14 cites·20 claims
- 2092US8170078B2Laser systemERSHOV ALEXANDER I·Filed 2011·Granted May 1, 2012·11 cites·20 claims
- 2192US7999915B2Laser systemCYMER INC·Filed 2007·Granted Aug 16, 2011·15 cites·24 claims
- 2291US7830934B2Multi-chamber gas discharge laser bandwidth control through discharge timingCYMER INC·Filed 2005·Granted Nov 9, 2010·13 cites·33 claims
- 2391US7778302B2Laser systemCYMER INC·Filed 2007·Granted Aug 17, 2010·15 cites·24 claims
- 2490US8014432B2Regenerative ring resonatorCYMER INC·Filed 2010·Granted Sep 6, 2011·12 cites·29 claims
- 2590US6985508B2Very narrow band, two chamber, high reprate gas discharge laser systemCYMER INC·Filed 2003·Granted Jan 10, 2006·29 cites·23 claims
- 2689US8908735B2Laser systemERSHOV ALEXANDER I·Filed 2011·Granted Dec 9, 2014·7 cites·17 claims
- 2789US7088758B2Relax gas discharge laser lithography light sourceCYMER INC·Filed 2004·Granted Aug 8, 2006·33 cites·109 claims
- 2887US10064261B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2017·Granted Aug 28, 2018·3 cites·24 claims
- 2985US6801560B2Line selected F2 two chamber laser systemCYMER INC·Filed 2002·Granted Oct 5, 2004·18 cites·77 claims
- 3083US7746913B2Laser systemCYMER INC·Filed 2007·Granted Jun 29, 2010·7 cites·33 claims
- 3182US7061961B2Very narrow band, two chamber, high rep-rate gas discharge laser systemCYMER INC·Filed 2005·Granted Jun 13, 2006·5 cites·20 claims
- 3280USRE45957ERegenerative ring resonatorCymer LLC·Filed 2013·Granted Mar 29, 2016·4 cites·38 claims
- 3380US7643528B2Immersion lithography laser light source with pulse stretcherCYMER INC·Filed 2007·Granted Jan 5, 2010·6 cites·11 claims
- 3479US8462425B2Oscillator-amplifier drive laser with seed protection for an EUV light sourceHOU KAI-CHUNG·Filed 2011·Granted Jun 11, 2013·5 cites·20 claims
- 3579US8102889B2Multi-chamber gas discharge laser bandwidth control through discharge timingJACQUES ROBERT N·Filed 2010·Granted Jan 24, 2012·5 cites·18 claims
- 3678US8295316B2Method and system for managing light source operationAKINS ROBERT P·Filed 2010·Granted Oct 23, 2012·5 cites·11 claims
- 3775US8284815B2Very high power laser chamber optical improvementsYE HONG·Filed 2009·Granted Oct 9, 2012·5 cites·13 claims
- 3872US9338870B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted May 10, 2016·3 cites·23 claims
- 3967US8982922B2Very high power laser chamber optical improvementsYE HONG·Filed 2012·Granted Mar 17, 2015·2 cites·17 claims
- 4066US2025126698A1Euv collector for an euv projection exposure apparatusZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 4163US7058107B2Line selected F2 two chamber laser systemCYMER INC·Filed 2004·Granted Jun 6, 2006·5 cites·77 claims
- 4261US6713770B2High resolution spectral measurement deviceCYMER INC·Filed 2002·Granted Mar 30, 2004·8 cites·20 claims
- 4360US7218661B2Line selected F2 two chamber laser systemCYMER INC·Filed 2004·Granted May 15, 2007·4 cites·77 claims
- 4457US7995637B2Gas discharge laser chamberCYMER INC·Filed 2009·Granted Aug 9, 2011·1 cites·25 claims
- 4556US9826616B2Extreme ultraviolet light source utilizing a target of finite extentASML NETHERLANDS BV·Filed 2016·Granted Nov 21, 2017·0 cites·25 claims
- 4651US2010074295A1Immersion lithography laser light source with pulse stretcherCYMER INC·Filed 2009·Application pending·0 cites
- 4749US2011122901A1High power high pulse repetition rate gas discharge laser systemCYMER INC·Filed 2011·Application pending·0 cites
- 4846US2009296758A1Laser systemCYMER INC·Filed 2007·Application pending·0 cites
- 4946US2009296755A1Laser systemCYMER INC·Filed 2007·Application pending·0 cites
- 5043US2006114956A1High power high pulse repetition rate gas discharge laser system bandwidth managementSANDSTROM RICHARD L·Filed 2004·Application pending·0 cites
Showing the top 50 of 54 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →