Inventor · disambiguated record
Dae-Han Choi
Also filed as: CHOI DAE W · CHOI DAE-HAN
19 granted patents·12 pending applications·341 citations·filing 2003–2024
94Inventor score
Files withGLOBALFOUNDRIES INC16LAM RES CORP3GLOBAL HITEC ELECTRONICS CO LTD2HYUNDAI MOTOR CO LTD2LEE SANGHEON2
Top patents by PatentIndex Score
31 records- 0196US9159630B1Fin field-effect transistor (FinFET) device formed using a single spacer, double hardmask schemeGLOBALFOUNDRIES INC·Filed 2014·Granted Oct 13, 2015·32 cites·20 claims
- 0293US9735154B2Semiconductor structure having gap fill dielectric layer disposed between finsGLOBALFOUNDRIES INC·Filed 2015·Granted Aug 15, 2017·9 cites·20 claims
- 0393US8871651B1Mask formation processingGLOBALFOUNDRIES INC·Filed 2013·Granted Oct 28, 2014·167 cites·20 claims
- 0492US8697501B1Semiconductor device having a gate formed on a uniform surface and method for forming the sameGLOBALFOUNDRIES INC·Filed 2012·Granted Apr 15, 2014·17 cites·20 claims
- 0592US8658536B1Selective fin cut processCHOI DAE-HAN·Filed 2012·Granted Feb 25, 2014·60 cites·20 claims
- 0690US7695632B2Critical dimension reduction and roughness controlLAM RES CORP·Filed 2005·Granted Apr 13, 2010·14 cites·18 claims
- 0789US9105478B2Devices and methods of forming fins at tight fin pitchesGLOBALFOUNDRIES INC·Filed 2013·Granted Aug 11, 2015·9 cites·10 claims
- 0887US8268118B2Critical dimension reduction and roughness controlLEE SANGHEON·Filed 2010·Granted Sep 18, 2012·8 cites·5 claims
- 0984US8835328B2Methods for fabricating integrated circuits with improved semiconductor fin structuresGLOBALFOUNDRIES INC·Filed 2013·Granted Sep 16, 2014·6 cites·20 claims
- 1077US9196499B2Method of forming semiconductor finsGLOBALFOUNDRIES INC·Filed 2014·Granted Nov 24, 2015·3 cites·20 claims
- 1177US8993445B2Selective removal of gate structure sidewall(s) to facilitate sidewall spacer protectionGLOBALFOUNDRIES INC·Filed 2013·Granted Mar 31, 2015·5 cites·20 claims
- 1277US8614149B2Critical dimension reduction and roughness controlLEE SANGHEON·Filed 2012·Granted Dec 24, 2013·3 cites·18 claims
- 1375US10589395B2System and method for detecting damaged tool of multi-axis head machining equipmentHYUNDAI MOTOR CO LTD·Filed 2018·Granted Mar 17, 2020·2 cites·15 claims
- 1471US10574077B2Method for charging electronic device, electronic device, and storage mediumSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Feb 25, 2020·1 cites·11 claims
- 1571US8969205B2Double patterning via triangular shaped sidewall spacersGLOBALFOUNDRIES INC·Filed 2013·Granted Mar 3, 2015·2 cites·16 claims
- 1671US8357434B1Apparatus for the deposition of a conformal film on a substrate and methods thereforLAM RES CORP·Filed 2005·Granted Jan 22, 2013·3 cites·20 claims
- 1752US2025389452A1Heating medium temperature control device using thermoelectric elementGLOBAL HITEC ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1850US9384979B2Apparatus for the deposition of a conformal film on a substrate and methods thereforLAM RES CORP·Filed 2012·Granted Jul 5, 2016·0 cites·9 claims
- 1949US2024227725A9Apparatus and method for controlling vehicleHYUNDAI MOTOR CO LTD·Filed 2023·Application pending·0 cites
- 2047US11666707B2Disposable syringe set having improved compatibilitySEWOON MEDICAL CO LTD·Filed 2020·Granted Jun 6, 2023·0 cites·1 claims
- 2146US9034767B1Facilitating mask pattern formationGLOBALFOUNDRIES INC·Filed 2013·Granted May 19, 2015·0 cites·20 claims
- 2246US2025386960A1Heating medium temperature control device having dehumidification functionGLOBAL HITEC ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2346US2005164331A1Method and device for detecting toxic material in water using microbial fuel cellKOREA BIOSYSTEMS CORP·Filed 2003·Application pending·0 cites
- 2445US2015287595A1Devices and methods of forming fins at tight fin pitchesGLOBALFOUNDRIES INC·Filed 2015·Application pending·0 cites
- 2544US2006278339A1Etch rate uniformity using the independent movement of electrode piecesLAM RES CORP A DELAWARE CORP·Filed 2005·Application pending·0 cites
- 2643US2015270175A1Partially crystallized fin hard mask for fin field-effect-transistor (finfet) deviceGLOBALFOUNDRIES INC·Filed 2014·Application pending·0 cites
- 2743US2016005868A1Finfet with confined epitaxyGLOBALFOUNDRIES INC·Filed 2014·Application pending·0 cites
- 2841US2015255353A1Forming source/drain regions with single reticle and resulting deviceGLOBALFOUNDRIES INC·Filed 2014·Application pending·0 cites
- 2940US2014148011A1Method of forming semiconductor finsGLOBALFOUNDRIES INC·Filed 2012·Application pending·0 cites
- 3039US2014179093A1Gate structure formation processesGLOBALFOUNDRIES INC·Filed 2012·Application pending·0 cites
- 3132US2013224944A1Methods for fabricating integrated circuits using tailored chamfered gate liner profilesKHANNA PUNEET·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →