Inventor · disambiguated record
Dan Katz
Also filed as: KATZ DAN
38 granted patents·17 pending applications·1,394 citations·filing 1992–2023
98Inventor score
Top patents by PatentIndex Score
55 records- 0198US6586886B1Gas distribution plate electrode for a plasma reactorAPPLIED MATERIALS INC·Filed 2001·Granted Jul 1, 2003·115 cites·46 claims
- 0297US7264688B1Plasma reactor apparatus with independent capacitive and toroidal plasma sourcesAPPLIED MATERIALS INC·Filed 2006·Granted Sep 4, 2007·73 cites·16 claims
- 0396US11315439B2System and method for extended spectrum ultrasound training using animate and inanimate training objectsSONOSIM INC·Filed 2019·Granted Apr 26, 2022·10 cites·19 claims
- 0496US11062624B2Embedded motion sensing technology for integration within commercial ultrasound probesSONOSIM INC·Filed 2018·Granted Jul 13, 2021·11 cites·20 claims
- 0596US7645357B2Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequencyAPPLIED MATERIALS INC·Filed 2006·Granted Jan 12, 2010·40 cites·12 claims
- 0696US7030335B2Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppressionAPPLIED MATERIALS INC·Filed 2001·Granted Apr 18, 2006·72 cites·125 claims
- 0796US6894245B2Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppressionAPPLIED MATERIALS INC·Filed 2001·Granted May 17, 2005·108 cites·31 claims
- 0896US6189484B1Plasma reactor having a helicon wave high density plasma sourceAPPLIED MATERIALS INC·Filed 1999·Granted Feb 20, 2001·116 cites·44 claims
- 0996US5429070AHigh density plasma deposition and etching apparatusPLASMA & MATERIALS TECH·Filed 1992·Granted Jul 4, 1995·277 cites·13 claims
- 1094US10380920B2System and method for augmented ultrasound simulation using flexible touch sensitive surfacesSONOSIM INC·Filed 2015·Granted Aug 13, 2019·10 cites·18 claims
- 1193US10380919B2System and method for extended spectrum ultrasound training using animate and inanimate training objectsSONOSIM INC·Filed 2014·Granted Aug 13, 2019·11 cites·20 claims
- 1293US10257887B2Substrate support assemblyAPPLIED MATERIALS INC·Filed 2017·Granted Apr 9, 2019·6 cites·20 claims
- 1393US7780864B2Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distributionAPPLIED MATERIALS INC·Filed 2006·Granted Aug 24, 2010·21 cites·17 claims
- 1493US7436645B2Method and apparatus for controlling temperature of a substrateAPPLIED MATERIALS INC·Filed 2006·Granted Oct 14, 2008·37 cites·14 claims
- 1593US5421891AHigh density plasma deposition and etching apparatusPLASMA & MATERIALS TECH·Filed 1992·Granted Jun 6, 1995·130 cites·17 claims
- 1692US9883549B2Substrate support assembly having rapid temperature controlAPPLIED MATERIALS INC·Filed 2016·Granted Jan 30, 2018·6 cites·20 claims
- 1792US9275887B2Substrate processing with rapid temperature gradient controlMATYUSHKIN ALEXANDER·Filed 2007·Granted Mar 1, 2016·20 cites·19 claims
- 1892US7674394B2Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distributionAPPLIED MATERIALS INC·Filed 2007·Granted Mar 9, 2010·17 cites·21 claims
- 1992US6676760B2Process chamber having multiple gas distributors and methodAPPILED MATERIALS INC·Filed 2001·Granted Jan 13, 2004·55 cites·22 claims
- 2092US6471822B1Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasmaAPPLIED MATERIALS INC·Filed 1999·Granted Oct 29, 2002·88 cites·50 claims
- 2191US11594150B1System and method for extended spectrum ultrasound training using animate and inanimate training objectsSAVITSKY ERIC·Filed 2022·Granted Feb 28, 2023·1 cites·20 claims
- 2290US7132618B2MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppressionAPPLIED MATERIALS INC·Filed 2003·Granted Nov 7, 2006·43 cites·35 claims
- 2389US8066895B2Method to control uniformity using tri-zone showerheadBELEN RODOLFO P·Filed 2008·Granted Nov 29, 2011·18 cites·23 claims
- 2489US7186943B2MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppressionAPPLIED MATERIALS INC·Filed 2005·Granted Mar 6, 2007·12 cites·20 claims
- 2588US11120709B2System and method for teaching basic ultrasound skillsSAVITSKY ERIC·Filed 2018·Granted Sep 14, 2021·10 cites·20 claims
- 2688US7832354B2Cathode liner with wafer edge gas injection in a plasma reactor chamberAPPLIED MATERIALS INC·Filed 2007·Granted Nov 16, 2010·13 cites·17 claims
- 2787US6677712B2Gas distribution plate electrode for a plasma receptorAPPLIED MATERIALS INC·Filed 2003·Granted Jan 13, 2004·22 cites·14 claims
- 2883US8607731B2Cathode with inner and outer electrodes at different heightsHOFFMAN DANIEL J·Filed 2008·Granted Dec 17, 2013·8 cites·16 claims
- 2983US8236133B2Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension biasKATZ DAN·Filed 2008·Granted Aug 7, 2012·13 cites·9 claims
- 3083US7879250B2Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injectionAPPLIED MATERIALS INC·Filed 2007·Granted Feb 1, 2011·7 cites·8 claims
- 3181US12249250B1System and method for extended spectrum ultrasound training using animate and inanimate training objectsSAVITSKY ERIC·Filed 2023·Granted Mar 11, 2025·0 cites·20 claims
- 3279US9870721B2System and method for teaching basic ultrasound skillsSAVITSKY ERIC·Filed 2013·Granted Jan 16, 2018·11 cites·17 claims
- 3379US7727413B2Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion densityAPPLIED MATERIALS INC·Filed 2006·Granted Jun 1, 2010·5 cites·14 claims
- 3471US8383002B2Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injectionAPPLIED MATERIALS INC·Filed 2010·Granted Feb 26, 2013·2 cites·6 claims
- 3567US8297983B2Multimodal ultrasound training systemSAVITSKY ERIC·Filed 2012·Granted Oct 30, 2012·4 cites·13 claims
- 3660US10026338B2Embedded motion sensing technology for integration within commercial ultrasound probesSAVITSKY ERIC·Filed 2012·Granted Jul 17, 2018·1 cites·9 claims
- 3758US2008193673A1Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrodeAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 3858US2008178805A1Mid-chamber gas distribution plate, tuned plasma flow control grid and electrodeAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 3957US2012251991A1Peripheral Probe with Six Degrees of Freedom Plus Compressive Force FeedbackSAVITSKY ERIC·Filed 2012·Application pending·0 cites
- 4057US2012237102A1System and Method for Improving Acquired Ultrasound-Image ReviewSAVITSKY ERIC·Filed 2012·Application pending·0 cites
- 4156US8017526B2Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch processAPPLIED MATERIALS INC·Filed 2007·Granted Sep 13, 2011·1 cites·17 claims
- 4254US11631342B1Embedded motion sensing technology for integration within commercial ultrasound probesSAVITSKY ERIC·Filed 2021·Granted Apr 18, 2023·0 cites·20 claims
- 4351US2009236447A1Method and apparatus for controlling gas injection in process chamberAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 4449US2008230008A1Plasma species and uniformity control through pulsed vhf operationPATERSON ALEXANDER·Filed 2007·Application pending·0 cites
- 4549US2008236490A1Plasma reactor with an overhead inductive antenna and an overhead gas distribution showerheadPATERSON ALEXANDER·Filed 2007·Application pending·0 cites
- 4648US2016104393A1Embedded system and method for needle tracking during medical training and testingSONOSIM INC·Filed 2015·Application pending·0 cites
- 4747US2007246161A1Plasma reactor apparatus with a toroidal plasma source and a VHF capacitively coupled plasma source with variable frequencyAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4847US2007245960A1Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion densityAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4947US2007246163A1Plasma reactor apparatus with independent capacitive and inductive plasma sourcesAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 5047US2007246162A1Plasma reactor apparatus with an inductive plasma source and a VHF capacitively coupled plasma source with variable frequencyAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →