Inventor · disambiguated record
Daria Negri
Also filed as: NEGRI DARIA
30 granted patents·9 pending applications·139 citations·filing 2010–2024
95Inventor score
Top patents by PatentIndex Score
39 records- 0197US8441639B2Metrology systems and methodsKANDEL DANIEL·Filed 2010·Granted May 14, 2013·35 cites·22 claims
- 0296US11796925B2Scanning overlay metrology using overlay targets having multiple spatial frequenciesKLA CORP·Filed 2022·Granted Oct 24, 2023·6 cites·22 claims
- 0396US11573497B2System and method for measuring misregistration of semiconductor device wafers utilizing induced topographyKLA CORP·Filed 2020·Granted Feb 7, 2023·5 cites·20 claims
- 0496US10190979B2Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structuresKLA TENCOR CORP·Filed 2015·Granted Jan 29, 2019·12 cites·21 claims
- 0596US9080971B2Metrology systems and methodsKLA TENCOR CORP·Filed 2014·Granted Jul 14, 2015·21 cites·12 claims
- 0694US12032300B2Imaging overlay with mutually coherent oblique illuminationKLA CORP·Filed 2022·Granted Jul 9, 2024·2 cites·23 claims
- 0794US8873054B2Metrology systems and methodsKLA TENCOR CORP·Filed 2013·Granted Oct 28, 2014·14 cites·26 claims
- 0892US12253805B2Scatterometry overlay metrology with orthogonal fine-pitch segmentationKLA CORP·Filed 2022·Granted Mar 18, 2025·2 cites·45 claims
- 0992US12001148B2Enhancing performance of overlay metrologyKLA CORP·Filed 2023·Granted Jun 4, 2024·2 cites·26 claims
- 1090US9581430B2Phase characterization of targetsKLA TENCOR CORP·Filed 2013·Granted Feb 28, 2017·15 cites·12 claims
- 1189US8582114B2Overlay metrology by pupil phase analysisMANASSEN AMNON·Filed 2011·Granted Nov 12, 2013·7 cites·23 claims
- 1288US11281112B2Method of measuring misregistration in the manufacture of topographic semiconductor device wafersKLA CORP·Filed 2020·Granted Mar 22, 2022·2 cites·22 claims
- 1386US9164397B2Optics symmetrization for metrologyMANASSEN AMNON·Filed 2011·Granted Oct 20, 2015·7 cites·15 claims
- 1484US10444161B2Systems and methods for metrology with layer-specific illumination spectraKLA TENCOR CORP·Filed 2017·Granted Oct 15, 2019·2 cites·57 claims
- 1583US11592755B2Enhancing performance of overlay metrologyKLA CORP·Filed 2021·Granted Feb 28, 2023·1 cites·30 claims
- 1681US10579768B2Process compatibility improvement by fill factor modulationKLA TENCOR CORP·Filed 2016·Granted Mar 3, 2020·3 cites·5 claims
- 1777US2024337953A1System and method for tracking real-time position for scanning overlay metrologyKLA CORP·Filed 2023·Application pending·0 cites
- 1875US11852590B1Systems and methods for metrology with layer-specific illumination spectraKLA TENCOR CORP·Filed 2019·Granted Dec 26, 2023·1 cites·34 claims
- 1973US11880141B2Method of measuring misregistration in the manufacture of topographic semiconductor device wafersKLA CORP·Filed 2022·Granted Jan 23, 2024·0 cites·24 claims
- 2072US2024337952A1System and method for determining overlay measurement of a scanning targetKLA CORP·Filed 2023·Application pending·0 cites
- 2169US9341769B2Spectral control systemKLA TENCOR CORP·Filed 2013·Granted May 17, 2016·2 cites·9 claims
- 2266US2024337606A1Parallel scanning overlay metrology with optical meta-surfacesKLA CORP·Filed 2024·Application pending·0 cites
- 2365US2025257992A1Metrology measurements on small targets with control of zero-order side lobesKLA CORP·Filed 2024·Application pending·0 cites
- 2465US2025297955A1Scanning diffraction based overlay scatterometryKLA CORP·Filed 2024·Application pending·0 cites
- 2563US2025306477A1Single grab pupil landscape via outside the objective lens broadband illuminationKLA CORP·Filed 2024·Application pending·0 cites
- 2662US2025138435A1Massive measurement sampling using multiple chucks and optical columnsKLA CORP·Filed 2023·Application pending·0 cites
- 2761US12327741B2Oscillating secondary stage for frame-mode overlay metrologyKLA CORP·Filed 2023·Granted Jun 10, 2025·0 cites·20 claims
- 2858US12105414B2Targets for diffraction-based overlay error metrologyKLA CORP·Filed 2022·Granted Oct 1, 2024·0 cites·16 claims
- 2957US2024068804A1Multi-pitch grid overlay target for scanning overlay metrologyKLA CORP·Filed 2023·Application pending·0 cites
- 3057US2024167813A1System and method for suppression of tool induced shift in scanning overlay metrologyKLA CORP·Filed 2023·Application pending·0 cites
- 3154US9921050B2Spectral control systemKLA TENCOR CORP·Filed 2016·Granted Mar 20, 2018·0 cites·28 claims
- 3253US12131959B2Systems and methods for improved metrology for semiconductor device wafersKLA CORP·Filed 2021·Granted Oct 29, 2024·0 cites·24 claims
- 3352US12165930B2Adaptive modeling misregistration measurement system and methodKLA CORP·Filed 2022·Granted Dec 10, 2024·0 cites·22 claims
- 3451US12105431B2Annular apodizer for small target overlay measurementKLA CORP·Filed 2022·Granted Oct 1, 2024·0 cites·9 claims
- 3550US12080610B2Wavelet system and method for ameliorating misregistration and asymmetry of semiconductor devicesKLA CORP·Filed 2020·Granted Sep 3, 2024·0 cites·21 claims
- 3649US11879632B2System and method for generating lightTECHNION RES & DEV FOUNDATION·Filed 2021·Granted Jan 23, 2024·0 cites·20 claims
- 3748US12222199B2Systems and methods for measurement of misregistration and amelioration thereofKLA CORP·Filed 2020·Granted Feb 11, 2025·0 cites·22 claims
- 3846US12170215B2Systems and methods for correction of impact of wafer tilt on misregistration measurementsKLA CORP·Filed 2020·Granted Dec 17, 2024·0 cites·12 claims
- 3944US10976562B2Nano-structured non-polarizing beamsplitterKLA TENCOR CORP·Filed 2018·Granted Apr 13, 2021·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →