Inventor · disambiguated record
Daniel Wack
Also filed as: WACK DANIEL · WACK DANIEL C · WACK DANIEL CHRISTOPHER
33 granted patents·2 pending applications·570 citations·filing 2000–2020
97Inventor score
Top patents by PatentIndex Score
35 records- 0198US7826071B2Parametric profiling using optical spectroscopic systemsKLA TENCOR CORP·Filed 2007·Granted Nov 2, 2010·114 cites·24 claims
- 0297US7175945B2Focus masking structures, focus patterns and measurements thereofKLA TENCOR CORP·Filed 2005·Granted Feb 13, 2007·37 cites·4 claims
- 0395US7280230B2Parametric profiling using optical spectroscopic systemsKLA TENCOR TECH CORP·Filed 2002·Granted Oct 9, 2007·71 cites·32 claims
- 0494US11333621B2Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffractionKLA TENCOR CORP·Filed 2018·Granted May 17, 2022·10 cites·27 claims
- 0594US7716003B1Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reductionKLA TENCOR TECH CORP·Filed 2007·Granted May 11, 2010·23 cites·14 claims
- 0694US7301649B2System for scatterometric measurements and applicationsKLA TENCOR TECH CORP·Filed 2005·Granted Nov 27, 2007·21 cites·25 claims
- 0794US7099005B1System for scatterometric measurements and applicationsKLA TENCOR TECH CORP·Filed 2000·Granted Aug 29, 2006·49 cites·125 claims
- 0892US10438825B2Spectral reflectometry for in-situ process monitoring and controlKLA TENCOR CORP·Filed 2017·Granted Oct 8, 2019·8 cites·20 claims
- 0992US9544984B2System and method for generation of extreme ultraviolet lightKLA TENCOR CORP·Filed 2014·Granted Jan 10, 2017·10 cites·25 claims
- 1092US8045179B1Bright and dark field scatterometry systems for line roughness metrologyKLA TENCOR CORP·Filed 2008·Granted Oct 25, 2011·25 cites·25 claims
- 1192US7515253B2System for measuring a sample with a layer containing a periodic diffracting structureKLA TENCOR TECH CORP·Filed 2006·Granted Apr 7, 2009·18 cites·35 claims
- 1291US8941336B1Optical characterization systems employing compact synchrotron radiation sourcesKLA TENCOR CORP·Filed 2014·Granted Jan 27, 2015·29 cites·10 claims
- 1391US8798966B1Measuring critical dimensions of a semiconductor structureHENCH JOHN·Filed 2007·Granted Aug 5, 2014·38 cites·35 claims
- 1490US8749179B2Optical characterization systems employing compact synchrotron radiation sourcesKLA TENCOR CORP·Filed 2013·Granted Jun 10, 2014·22 cites·48 claims
- 1589US6884552B2Focus masking structures, focus patterns and measurements thereofKLA TENCOR TECH CORP·Filed 2002·Granted Apr 26, 2005·29 cites·53 claims
- 1688US8842272B2Apparatus for EUV imaging and methods of using sameWACK DANIEL C·Filed 2012·Granted Sep 23, 2014·9 cites·18 claims
- 1784US7838309B1Measurement and control of strained devicesKLA TENCOR CORP·Filed 2008·Granted Nov 23, 2010·12 cites·9 claims
- 1883US7480047B1Time-domain computation of scattering spectra for use in spectroscopic metrologyKLA TENCOR CORP·Filed 2005·Granted Jan 20, 2009·8 cites·28 claims
- 1982US9295147B2EUV light source using cryogenic droplet targets in mask inspectionKLA TENCOR CORP·Filed 2014·Granted Mar 22, 2016·5 cites·29 claims
- 2081US7511830B2System for scatterometric measurements and applicationsKLA TENCOR TECH CORP·Filed 2007·Granted Mar 31, 2009·6 cites·11 claims
- 2179US11112691B2Inspection system with non-circular pupilKLA TENCOR CORP·Filed 2019·Granted Sep 7, 2021·2 cites·36 claims
- 2279US7951672B2Measurement and control of strained devicesKLA TENCOR CORP·Filed 2010·Granted May 31, 2011·4 cites·8 claims
- 2378US9164388B2Temperature control in EUV reticle inspection toolCHILESE FRANK·Filed 2013·Granted Oct 20, 2015·4 cites·20 claims
- 2477US7821654B2System for scatterometric measurements and applicationsKLA TENCOR CORP·Filed 2009·Granted Oct 26, 2010·3 cites·11 claims
- 2576US8772731B2Apparatus and method for synchronizing sample stage motion with a time delay integration charge-couple device in a semiconductor inspection toolKLA TENCOR CORP·Filed 2013·Granted Jul 8, 2014·2 cites·19 claims
- 2670US7826072B1Method for optimizing the configuration of a scatterometry measurement systemKLA TENCOR TECH CORP·Filed 2007·Granted Nov 2, 2010·6 cites·19 claims
- 2769US9151881B2Phase grating for mask inspection systemKLA TENCOR CORP·Filed 2013·Granted Oct 6, 2015·1 cites·37 claims
- 2864US9625810B2Source multiplexing illumination for mask inspectionWANG DAIMIAN·Filed 2012·Granted Apr 18, 2017·1 cites·17 claims
- 2964US9335637B2Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablationDELGADO GILDARDO·Filed 2011·Granted May 10, 2016·1 cites·18 claims
- 3059US2009190141A1System for measuring a sample with a layer containing a periodic diffracting structureKLA TENCOR TECH CORP·Filed 2009·Application pending·0 cites
- 3158US11968772B2Optical etendue matching methods for extreme ultraviolet metrologyKLA CORP·Filed 2020·Granted Apr 23, 2024·0 cites·37 claims
- 3258US8917432B2Multiplexing EUV sources in reticle inspectionWACK DANIEL·Filed 2012·Granted Dec 23, 2014·2 cites·19 claims
- 3356US11469571B2Fast phase-shift interferometry by laser frequency shiftKLA CORP·Filed 2020·Granted Oct 11, 2022·0 cites·24 claims
- 3449US2007108368A1Focus masking structures, focus patterns and measurements thereofKLA TENCOR CORP·Filed 2006·Application pending·0 cites
- 3546US9759912B2Particle and chemical control using tunnel flowKLA TENCOR CORP·Filed 2013·Granted Sep 12, 2017·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →