Inventor · disambiguated record
Douglas C. Watson
Also filed as: WATSON DOUGLAS · WATSON DOUGLAS C · WATSON DOUGLAS CHANDLER
75 granted patents·42 pending applications·1,793 citations·filing 1994–2018
99Inventor score
Top patents by PatentIndex Score
117 records- 0199US7522259B2Cleanup method for optics in immersion lithographyNIKON CORP·Filed 2005·Granted Apr 21, 2009·71 cites·38 claims
- 0299US7251017B2Environmental system including a transport region for an immersion lithography apparatusNIKON CORP·Filed 2005·Granted Jul 31, 2007·65 cites·37 claims
- 0399US6600547B2Sliding sealNIKON CORP·Filed 2001·Granted Jul 29, 2003·713 cites·28 claims
- 0497US7443482B2Liquid jet and recovery system for immersion lithographyNIKON CORP·Filed 2005·Granted Oct 28, 2008·27 cites·68 claims
- 0595US7345742B2Environmental system including a transport region for an immersion lithography apparatusNIKON CORP·Filed 2007·Granted Mar 18, 2008·43 cites·24 claims
- 0695US6408767B1Low stiffness suspension for a stageNIKON CORP·Filed 2000·Granted Jun 25, 2002·45 cites·57 claims
- 0794US7932989B2Liquid jet and recovery system for immersion lithographyNIKON CORP·Filed 2007·Granted Apr 26, 2011·11 cites·30 claims
- 0894US7929111B2Environmental system including a transport region for an immersion lithography apparatusNIKON CORP·Filed 2007·Granted Apr 19, 2011·10 cites·22 claims
- 0994US7477358B2EUV reticle handling system and methodNIKON CORP·Filed 2005·Granted Jan 13, 2009·16 cites·20 claims
- 1094US6842277B2Deformable mirror with high-bandwidth servo for rigid body controlNIKON CORP·Filed 2003·Granted Jan 11, 2005·56 cites·19 claims
- 1192US7929110B2Environmental system including a transport region for an immersion lithography apparatusNIKON CORP·Filed 2007·Granted Apr 19, 2011·7 cites·26 claims
- 1290US6239924B1Kinematic lens mounting with distributed support and radial flexureNIKON CORP·Filed 1999·Granted May 29, 2001·94 cites·8 claims
- 1390US5959427AMethod and apparatus for compensating for reaction forces in a stage assemblyNIKON CORP·Filed 1998·Granted Sep 28, 1999·74 cites·15 claims
- 1489US7969552B2Environmental system including a transport region for an immersion lithography apparatusNIKON CORP·Filed 2007·Granted Jun 28, 2011·5 cites·24 claims
- 1589US7172493B2Fine force actuator assembly for chemical mechanical polishing apparatusesNIKON CORP·Filed 2005·Granted Feb 6, 2007·14 cites·46 claims
- 1688US6880942B2Adaptive optic with discrete actuators for continuous deformation of a deformable mirror systemNIKON CORP·Filed 2003·Granted Apr 19, 2005·28 cites·16 claims
- 1788US6873478B2Kinematic lens mount with reduced clamping forceNIKON CORP·Filed 2003·Granted Mar 29, 2005·28 cites·16 claims
- 1887US7591561B2Liquid cooled mirror for use in extreme ultraviolet lithographyNIKON CORP·Filed 2006·Granted Sep 22, 2009·22 cites·19 claims
- 1987US6774981B1Modular exposure apparatus with removable optical device and improved isolation of the optical deviceNIKON CORP·Filed 2000·Granted Aug 10, 2004·24 cites·112 claims
- 2085US8705170B2High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locationsWILLIAMSON DAVID M·Filed 2009·Granted Apr 22, 2014·15 cites·14 claims
- 2185US8085381B2Cleanup method for optics in immersion lithography using sonic deviceKAWAI HIDEMI·Filed 2007·Granted Dec 27, 2011·4 cites·17 claims
- 2285US7804583B2EUV reticle handling system and methodNIKON CORP·Filed 2008·Granted Sep 28, 2010·6 cites·9 claims
- 2385US6927838B2Multiple stage, stage assembly having independent stage basesNIKON CORP·Filed 2001·Granted Aug 9, 2005·25 cites·53 claims
- 2485US6840638B2Deformable mirror with passive and active actuatorsNIKON CORP·Filed 2003·Granted Jan 11, 2005·29 cites·18 claims
- 2584US7965376B2Environmental system including a transport region for an immersion lithography apparatusNIKON CORP·Filed 2007·Granted Jun 21, 2011·3 cites·23 claims
- 2684US6937911B2Compensating for cable drag forces in high precision stagesNIKON CORP·Filed 2002·Granted Aug 30, 2005·19 cites·12 claims
- 2783US6922293B2Kinematic optical mounting assembly with flexuresNIKON CORP·Filed 2002·Granted Jul 26, 2005·28 cites·77 claims
- 2883US6731372B2Multiple chamber fluid mountNIKON CORP·Filed 2001·Granted May 4, 2004·24 cites·42 claims
- 2982US8059258B2Liquid jet and recovery system for immersion lithographyNOVAK W THOMAS·Filed 2008·Granted Nov 15, 2011·3 cites·24 claims
- 3082US6953109B2Vibration isolator with low lateral stiffnessNIKON CORP·Filed 2002·Granted Oct 11, 2005·22 cites·87 claims
- 3182US6499880B2Static pressure air bearingNIKON CORP·Filed 2001·Granted Dec 31, 2002·18 cites·15 claims
- 3281US6794660B2Long stroke mover for a stage assemblyNIKON CORP·Filed 2001·Granted Sep 21, 2004·19 cites·45 claims
- 3381US6467960B1Air bearing linear guide for use in a vacuumNIKON CORP·Filed 2000·Granted Oct 22, 2002·16 cites·25 claims
- 3480US9958786B2Cleanup method for optics in immersion lithography using object on wafer holder in place of waferNIKON CORP·Filed 2014·Granted May 1, 2018·1 cites·35 claims
- 3580US7095482B2Multiple system vibration isolatorNIKON CORP·Filed 2002·Granted Aug 22, 2006·20 cites·102 claims
- 3678US8441615B2System for isolating an exposure apparatusHASHEMI FARDAD A·Filed 2009·Granted May 14, 2013·7 cites·31 claims
- 3778US6281655B1High performance stage assemblyNIKON CORP·Filed 1999·Granted Aug 28, 2001·47 cites·67 claims
- 3877US8767174B2Temperature-controlled holding devices for planar articlesSOGARD MICHAEL R·Filed 2011·Granted Jul 1, 2014·4 cites·44 claims
- 3977US6888620B2System and method for holding a device with minimal deformationNIKON CORP·Filed 2001·Granted May 3, 2005·14 cites·144 claims
- 4076US7717966B2Barrier assembly for an exposure apparatusNIKON CORP·Filed 2005·Granted May 18, 2010·4 cites·40 claims
- 4175US5519223AApparatus and method for automated collimator exchangeADAC LAB INC·Filed 1994·Granted May 21, 1996·31 cites·56 claims
- 4272US7583361B2System for controlling a dual mover assembly for an exposure apparatusNIKON CORP·Filed 2006·Granted Sep 1, 2009·3 cites·29 claims
- 4372US6639654B2Wafer stage carrier and removal assemblyNIKON CORP·Filed 2001·Granted Oct 28, 2003·11 cites·58 claims
- 4471US7683506B2CI-core actuator for long travel in a transverse directionNIKON CORP·Filed 2005·Granted Mar 23, 2010·5 cites·8 claims
- 4570US10185222B2Liquid jet and recovery system for immersion lithographyNIKON CORP·Filed 2017·Granted Jan 22, 2019·0 cites·20 claims
- 4670US9341942B2Vacuum chamber assembly for supporting a workpieceHASHEMI FARDAD·Filed 2011·Granted May 17, 2016·3 cites·19 claims
- 4770US2018164703A1Environmental system including a transport region for an immersion lithography apparatusNIKON CORP·Filed 2018·Application pending·0 cites
- 4870US2019129311A1Liquid jet and recovery system for immersion lithographyNIKON CORP·Filed 2018·Application pending·0 cites
- 4969US9910370B2Environmental system including a transport region for an immersion lithography apparatusNIKON CORP·Filed 2017·Granted Mar 6, 2018·0 cites·27 claims
- 5069US8794011B2Method and apparatus for utilizing in-situ measurements techniques in conjunction with thermoelectric chips (TECs)PHILLIPS ALTON H·Filed 2011·Granted Aug 5, 2014·2 cites·29 claims
Showing the top 50 of 117 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Douglas C. Watson files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →