US2019129311A1PendingUtilityA1

Liquid jet and recovery system for immersion lithography

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Assignee: NIKON CORPPriority: Apr 11, 2003Filed: Dec 27, 2018Published: May 2, 2019
Est. expiryApr 11, 2023(expired)· nominal 20-yr term from priority
Inventors:W. Thomas NovakAndrew J. HazeltonDouglas C. Watson
G03F 7/70341
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PatentIndex Score
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Claims

Abstract

A liquid immersion lithography apparatus includes a projection system having an optical member of which an incidence side has a convex lens shape, and a flow passage connected to a hole from which liquid is supplied. A substrate is exposed through the liquid covering only a portion of an upper surface of the substrate. The optical member has an end surface via which the exposure light is projected to the substrate via the liquid. A material having the end surface is fused silica.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A liquid immersion lithography apparatus comprising:
 a projection system having an optical member of which an incidence side has a convex lens shape; and   a flow passage connected to a hole from which liquid is supplied, wherein   a substrate is exposed through the liquid covering only a portion of an upper surface of the substrate,   the optical member has an end surface via which the exposure light is projected to the substrate via the liquid, and   a material having the end surface is fused silica.

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