Inventor · disambiguated record
Duane Outka
Also filed as: OUTKA DUANE
34 granted patents·6 pending applications·378 citations·filing 1999–2025
96Inventor score
Top patents by PatentIndex Score
40 records- 0198US6350697B1Method of cleaning and conditioning plasma reaction chamberLAM RES CORP·Filed 1999·Granted Feb 26, 2002·281 cites·21 claims
- 0287US8313635B2Bare aluminum baffles for resist stripping chambersEGLEY FRED D·Filed 2010·Granted Nov 20, 2012·9 cites·11 claims
- 0385US8852685B2Coating method for gas delivery systemKENWORTHY IAN·Filed 2010·Granted Oct 7, 2014·11 cites·11 claims
- 0485US7638004B1Method for cleaning microwave applicator tubeLAM RES CORP·Filed 2006·Granted Dec 29, 2009·8 cites·28 claims
- 0584US10967407B2Conditioning chamber componentLAM RES CORP·Filed 2018·Granted Apr 6, 2021·3 cites·11 claims
- 0683US8171877B2Backside mounted electrode carriers and assemblies incorporating the sameAUGUSTINO JASON·Filed 2008·Granted May 8, 2012·8 cites·20 claims
- 0783US7811409B2Bare aluminum baffles for resist stripping chambersLAM RES CORP·Filed 2007·Granted Oct 12, 2010·6 cites·10 claims
- 0882US8075701B2Processes for reconditioning multi-component electrodesAVOYAN ARMEN·Filed 2008·Granted Dec 13, 2011·7 cites·20 claims
- 0981US9337002B2Corrosion resistant aluminum coating on plasma chamber componentsLAM RES CORP·Filed 2013·Granted May 10, 2016·6 cites·21 claims
- 1081US8097105B2Extending lifetime of yttrium oxide as a plasma chamber materialSHIH HONG·Filed 2007·Granted Jan 17, 2012·5 cites·11 claims
- 1180US8075703B2Immersive oxidation and etching process for cleaning silicon electrodesAVOYAN ARMEN·Filed 2009·Granted Dec 13, 2011·4 cites·21 claims
- 1279US7976641B1Extending storage time of removed plasma chamber components prior to cleaning thereofLAM RES CORP·Filed 2005·Granted Jul 12, 2011·3 cites·20 claims
- 1377US8276898B2Electrode transporter and fixture sets incorporating the sameAVOYAN ARMEN·Filed 2008·Granted Oct 2, 2012·9 cites·18 claims
- 1473US8585844B2Extending lifetime of yttrium oxide as a plasma chamber materialSHIH HONG·Filed 2011·Granted Nov 19, 2013·2 cites·12 claims
- 1572US8276604B2Peripherally engaging electrode carriers and assemblies incorporating the sameAUGUSTINO JASON·Filed 2008·Granted Oct 2, 2012·4 cites·16 claims
- 1670US2025208022A1Method and apparatus for measuring particlesLAM RES CORP·Filed 2025·Application pending·0 cites
- 1769US12064795B2Conditioning chamber componentLAM RES CORP·Filed 2021·Granted Aug 20, 2024·0 cites·11 claims
- 1868US11384430B2Method for conditioning a ceramic coatingLAM RES CORP·Filed 2019·Granted Jul 12, 2022·0 cites·16 claims
- 1966US7736441B2Cleaning fixtures and methods of cleaning electrode assembly plenumsLAM RES CORP·Filed 2007·Granted Jun 15, 2010·1 cites·18 claims
- 2065US12270748B2Method and apparatus for measuring particlesLAM RES CORP·Filed 2019·Granted Apr 8, 2025·0 cites·13 claims
- 2165US8550880B2Platen and adapter assemblies for facilitating silicon electrode polishingAVOYAN ARMEN·Filed 2009·Granted Oct 8, 2013·0 cites·19 claims
- 2264US8545639B2Method of cleaning aluminum plasma chamber partsSHIH HONG·Filed 2011·Granted Oct 1, 2013·1 cites·19 claims
- 2364US8221552B2Cleaning of bonded silicon electrodesOUTKA DUANE·Filed 2007·Granted Jul 17, 2012·3 cites·20 claims
- 2462US8216388B2Extending storage time of removed plasma chamber components prior to cleaning thereofSHIH HONG·Filed 2011·Granted Jul 10, 2012·0 cites·20 claims
- 2559US11124659B2Method to selectively pattern a surface for plasma resistant coat applicationsLAM RES CORP·Filed 2018·Granted Sep 21, 2021·0 cites·12 claims
- 2659US9120201B2Platen and adapter assemblies for facilitating silicon electrode polishingLAM RES CORP·Filed 2013·Granted Sep 1, 2015·0 cites·20 claims
- 2757US6770214B2Method of reducing aluminum fluoride deposits in plasma etch reactorLAM RES CORP·Filed 2001·Granted Aug 3, 2004·7 cites·20 claims
- 2855US8859432B2Bare aluminum baffles for resist stripping chambersLAM RES CORP·Filed 2012·Granted Oct 14, 2014·0 cites·13 claims
- 2954US12072318B2Chamber component cleanliness measurement systemLAM RES CORP·Filed 2020·Granted Aug 27, 2024·0 cites·22 claims
- 3054US9689533B2Coating method for gas delivery systemLAM RES CORP·Filed 2014·Granted Jun 27, 2017·0 cites·20 claims
- 3151US9387521B2Method of wet cleaning aluminum chamber partsLAM RES CORP·Filed 2013·Granted Jul 12, 2016·0 cites·20 claims
- 3250US2014113453A1Tungsten carbide coated metal component of a plasma reactor chamber and method of coatingLAM RES CORP·Filed 2012·Application pending·0 cites
- 3349US2023138555A1Plasma processing chamber with multilayer protective surfaceLAM RES CORP·Filed 2021·Application pending·0 cites
- 3447US9766063B2Method for treating a nonhomogenous surfaceLAM RES CORP·Filed 2015·Granted Sep 19, 2017·0 cites·18 claims
- 3546US2011146909A1Methods for wet cleaning quartz surfaces of components for plasma processing chambersLAM RES CORP·Filed 2011·Application pending·0 cites
- 3645US9393666B2Adapter plate for polishing and cleaning electrodesLAM RES CORP·Filed 2013·Granted Jul 19, 2016·0 cites·19 claims
- 3742US2005274396A1Methods for wet cleaning quartz surfaces of components for plasma processing chambersSHIH HONG·Filed 2004·Application pending·0 cites
- 3840US2005284573A1Bare aluminum baffles for resist stripping chambersEGLEY FRED D·Filed 2004·Application pending·0 cites
- 3935US8444456B2Electrode securing platens and electrode polishing assemblies incorporating the sameLA CROIX CLIFF·Filed 2010·Granted May 21, 2013·0 cites·20 claims
- 4032US8580079B2Electrode carrier assembliesLA CROIX CLIFF·Filed 2010·Granted Nov 12, 2013·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →