Inventor · disambiguated record
Dzmitry Labetski
Also filed as: LABETSKI DZMITRY
22 granted patents·4 pending applications·44 citations·filing 2007–2023
92Inventor score
Files withASML NETHERLANDS BV14LABETSKI DZMITRY4SCHIMMEL HENDRIKUS GIJSBERTUS3VAN DE VIJVER YURI JOHANNES GABRIEL2LOOPSTRA ERIK ROELOF1
Top patents by PatentIndex Score
26 records- 0190US10222701B2Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing methodASML NETHERLANDS BV·Filed 2014·Granted Mar 5, 2019·11 cites·21 claims
- 0287US8368032B2Radiation source, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2010·Granted Feb 5, 2013·8 cites·20 claims
- 0378US11822252B2Guiding device and associated systemASML NETHERLANDS BV·Filed 2021·Granted Nov 21, 2023·1 cites·20 claims
- 0476US11874608B2Apparatus for and method of reducing contamination from source material in an EUV light sourceASML NETHERLANDS BV·Filed 2019·Granted Jan 16, 2024·1 cites·26 claims
- 0572US9013679B2Collector mirror assembly and method for producing extreme ultraviolet radiationLABETSKI DZMITRY·Filed 2011·Granted Apr 21, 2015·2 cites·16 claims
- 0669US8755032B2Radiation source and lithographic apparatusYAKUNIN ANDREI MIKHAILOVICH·Filed 2009·Granted Jun 17, 2014·2 cites·25 claims
- 0769US2024103387A1Apparatus for and method of reducing contamination from source material in an euv light sourceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0866US9715174B2Droplet generator, EUV radiation source, lithographic apparatus, method for generating droplets and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Jul 25, 2017·2 cites·12 claims
- 0965US9753383B2Radiation source and lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Sep 5, 2017·2 cites·14 claims
- 1065US8115900B2Lithographic apparatus and device manufacturing methodVAN DE VIJVER YURI JOHANNES GABRIEL·Filed 2007·Granted Feb 14, 2012·6 cites·23 claims
- 1163US12389519B2Guiding device and associated systemASML NETHERLANDS BV·Filed 2023·Granted Aug 12, 2025·0 cites·20 claims
- 1262US10394141B2Radiation source and lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted Aug 27, 2019·1 cites·20 claims
- 1362US9113539B2Radiation sourceSCHIMMEL HENDRIKUS GIJSBERTUS·Filed 2012·Granted Aug 18, 2015·2 cites·19 claims
- 1461US8220315B2Gas gauge, lithographic apparatus and device manufacturing methodLABETSKI DZMITRY·Filed 2009·Granted Jul 17, 2012·1 cites·5 claims
- 1559US9671698B2Fuel stream generator, source collector apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Jun 6, 2017·1 cites·17 claims
- 1656US8901521B2Module and method for producing extreme ultraviolet radiationVAN EMPEL TJARKO ADRIAAN RUDOLF·Filed 2008·Granted Dec 2, 2014·3 cites·31 claims
- 1754US9310689B2Radiation source and lithographic apparatusSCHIMMEL HENDRIKUS GIJSBERTUS·Filed 2012·Granted Apr 12, 2016·1 cites·29 claims
- 1853US9363879B2Module and method for producing extreme ultraviolet radiationASML NETHERLANDS BV·Filed 2014·Granted Jun 7, 2016·0 cites·19 claims
- 1952US10955749B2Guiding device and associated systemASML NETHERLANDS BV·Filed 2018·Granted Mar 23, 2021·0 cites·20 claims
- 2050US2025060681A1A system for use in a lithographic apparatusASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2144US8749756B2Lithographic apparatus and device manufacturing methodVAN DE VIJVER YURI JOHANNES GABRIEL·Filed 2012·Granted Jun 10, 2014·0 cites·20 claims
- 2244US8711325B2Method and system for determining a suppression factor of a suppression system and a lithographic apparatusSCHIMMEL HENDRIKUS GIJSBERTUS·Filed 2008·Granted Apr 29, 2014·0 cites·22 claims
- 2340US9091944B2Source collector, lithographic apparatus and device manufacturing methodLOOPSTRA ERIK ROELOF·Filed 2010·Granted Jul 28, 2015·0 cites·18 claims
- 2438US8405055B2Source module, radiation source and lithographic apparatusLABETSKI DZMITRY·Filed 2009·Granted Mar 26, 2013·0 cites·14 claims
- 2537US2011024651A1Radiation system and method, and a spectral purity filterASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 2635US2012327381A1Radiation Source, Lithographic Apparatus and Device Manufacturing MethodLABETSKI DZMITRY·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →