Inventor · disambiguated record
Edwin Te Sligte
Also filed as: TE SLIGTE EDWIN
7 granted patents·3 pending applications·7 citations·filing 2010–2020
73Inventor score
Files withZEISS CARL SMT GMBH4ASML NETHERLANDS BV2ASML HOLDING NV1BLOM PAULUS PETRUS MARIA1KOSTER NORBERTUS BENEDICTUS1
Top patents by PatentIndex Score
10 records- 0185US10073361B2EUV lithography system and operating methodZEISS CARL SMT GMBH·Filed 2017·Granted Sep 11, 2018·5 cites·15 claims
- 0278US11199363B2Method for removing a contamination layer by an atomic layer etching processZEISS CARL SMT GMBH·Filed 2020·Granted Dec 14, 2021·1 cites·23 claims
- 0363US10690812B2Optical element and optical system for EUV lithography, and method for treating such an optical elementZEISS CARL SMT GMBH·Filed 2015·Granted Jun 23, 2020·1 cites·17 claims
- 0460US8980009B2Method for removing a contamination layer from an optical surface and arrangement thereforZEISS CARL SMT GMBH·Filed 2013·Granted Mar 17, 2015·0 cites·12 claims
- 0549US11048180B2Component for use in a patterning device environmentASML NETHERLANDS BV·Filed 2019·Granted Jun 29, 2021·0 cites·13 claims
- 0645US12332570B2Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debrisASML HOLDING NV·Filed 2020·Granted Jun 17, 2025·0 cites·15 claims
- 0730US9161427B2Device and method for generating a plasma discharge for patterning the surface of a substrateBLOM PAULUS PETRUS MARIA·Filed 2010·Granted Oct 13, 2015·0 cites·36 claims
- 0829US2013126226A1Method of making a support structureKOSTER NORBERTUS BENEDICTUS·Filed 2010·Application pending·0 cites
- 0929US2012006258A1Hydrogen radical generatorSCHASFOORT GERARD FRANS JOZEF·Filed 2011·Application pending·0 cites
- 1026US2017045832A1Cleaning Apparatus and Associated Low Pressure Chamber ApparatusASML NETHERLANDS BV·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →