Inventor · disambiguated record
Einstein Noel Abarra
Also filed as: ABARRA EINSTEIN NOEL
33 granted patents·9 pending applications·69 citations·filing 2008–2024
95Inventor score
Files withTOKYO ELECTRON LTD16CANON ANELVA CORP14ENDO TETSUYA5HIRAYANAGI HIROHISA2ABARRA EINSTEIN NOEL1
Top patents by PatentIndex Score
42 records- 0190US8016537B2Inline-type wafer conveyance deviceCANON ANELVA CORP·Filed 2010·Granted Sep 13, 2011·12 cites·15 claims
- 0288US9058962B2Magnet unit and magnetron sputtering apparatusENDO TETSUYA·Filed 2011·Granted Jun 16, 2015·9 cites·4 claims
- 0388US8378576B2Ion beam generatorCANON ANELVA CORP·Filed 2010·Granted Feb 19, 2013·12 cites·10 claims
- 0487US12170217B2Substrate processing apparatus and abnormality detection methodTOKYO ELECTRON LTD·Filed 2022·Granted Dec 17, 2024·1 cites·3 claims
- 0587US7955480B2Sputtering apparatus and film deposition methodCANON ANELVA CORP·Filed 2010·Granted Jun 7, 2011·4 cites·14 claims
- 0683US8776542B2Cooling systemENDO TETSUYA·Filed 2010·Granted Jul 15, 2014·6 cites·12 claims
- 0781US11939665B2Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming methodTOKYO ELECTRON LTD·Filed 2021·Granted Mar 26, 2024·1 cites·28 claims
- 0876US8092139B2Inline-type wafer conveyance deviceWATANABE NAOKI·Filed 2010·Granted Jan 10, 2012·4 cites·2 claims
- 0975US12437976B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Granted Oct 7, 2025·0 cites·14 claims
- 1075US8053747B2Substrate processing apparatus and cleaning method of the sameCANON ANELVA CORP·Filed 2009·Granted Nov 8, 2011·3 cites·10 claims
- 1174US8673124B2Magnet unit and magnetron sputtering apparatusENDO TETSUYA·Filed 2011·Granted Mar 18, 2014·3 cites·9 claims
- 1272US8999121B2Sputtering apparatusSUGI KYOSUKE·Filed 2011·Granted Apr 7, 2015·2 cites·13 claims
- 1370US11220741B2Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2019·Granted Jan 11, 2022·1 cites·9 claims
- 1468US8507113B2Magnetic sensor stack body, method of forming the same, film formation control program, and recording mediumABARRA EINSTEIN NOEL·Filed 2010·Granted Aug 13, 2013·3 cites·10 claims
- 1567US12400963B2Conductive superlattice structures and methods of forming the sameTOKYO ELECTRON LTD·Filed 2022·Granted Aug 26, 2025·0 cites·20 claims
- 1667US9355878B2Substrate processing apparatusIZA CORP·Filed 2013·Granted May 31, 2016·3 cites·6 claims
- 1763US9312102B2Apparatus and method for processing substrate using ion beamKAMIYA YASUSHI·Filed 2011·Granted Apr 12, 2016·2 cites·8 claims
- 1862US8043483B2Film forming method by sputtering and sputtering apparatus thereofCANON ANELVA CORP·Filed 2010·Granted Oct 25, 2011·1 cites·11 claims
- 1960US11742190B2Sputtering apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2021·Granted Aug 29, 2023·0 cites·12 claims
- 2060US2010108496A1Sputtering apparatus, thin film formation apparatus, and magnetic recording medium manufacturing methodCANON ANELVA CORP·Filed 2009·Application pending·0 cites
- 2160US2010155227A1Sputtering apparatus and film forming methodCANON ANELVA CORP·Filed 2009·Application pending·0 cites
- 2257US11851750B2Apparatus and method for performing sputtering processTOKYO ELECTRON LTD·Filed 2021·Granted Dec 26, 2023·0 cites·15 claims
- 2356US12469723B2Substrate processing apparatus and abnormality detection methodTOKYO ELECTRON LTD·Filed 2022·Granted Nov 11, 2025·0 cites·6 claims
- 2456US8536539B2Ion beam generator, and substrate processing apparatus and production method of electronic device using the ion beam generatorHIRAYANAGI HIROHISA·Filed 2010·Granted Sep 17, 2013·2 cites·7 claims
- 2555US12002667B2Sputtering apparatus and method of controlling sputtering apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jun 4, 2024·0 cites·13 claims
- 2654US12235045B2Magnetic annealing equipment and methodTOKYO ELECTRON LTD·Filed 2022·Granted Feb 25, 2025·0 cites·20 claims
- 2753US8048277B2Magnet unit and magnetron sputtering apparatusCANON ANELVA CORP·Filed 2009·Granted Nov 1, 2011·0 cites·3 claims
- 2852US11715671B2Film forming system, magnetization characteristic measuring device, and film forming methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 1, 2023·0 cites·20 claims
- 2951US11823880B2Target structure and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Nov 21, 2023·0 cites·18 claims
- 3051US9911526B2Magnet unit and magnetron sputtering apparatusCANON ANELVA CORP·Filed 2015·Granted Mar 6, 2018·0 cites·8 claims
- 3151US2009078571A1Magnet assembly capable of generating magnetic field having direction that is uniform and can be changed and sputtering apparatus using the sameCANON ANELVA CORP·Filed 2008·Application pending·0 cites
- 3250US10062545B2Apparatus and method for processing substrate using ion beamCANON ANELVA CORP·Filed 2016·Granted Aug 28, 2018·0 cites·3 claims
- 3349US11581171B2Cathode unit and film forming apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Feb 14, 2023·0 cites·11 claims
- 3449US2022081757A1Film forming apparatus, film forming system, and film forming methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 3548US2010108495A1Thin film formation apparatus and magnetic recording medium manufacturing methodCANON ANELVA CORP·Filed 2009·Application pending·0 cites
- 3646US8778150B2Magnetron sputtering cathode, magnetron sputtering apparatus, and method of manufacturing magnetic deviceENDO TETSUYA·Filed 2010·Granted Jul 15, 2014·0 cites·15 claims
- 3744US9422623B2Ion beam generator and ion beam plasma processing apparatusCANON ANELVA CORP·Filed 2014·Granted Aug 23, 2016·0 cites·6 claims
- 3844US2020093027A1Substrate placement mechanism, film forming apparatus, and film forming methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 3942US11495446B2Film formation device and film formation methodTOKYO ELECTRON LTD·Filed 2019·Granted Nov 8, 2022·0 cites·8 claims
- 4039US2012193216A1Substrate cooling device, sputtering apparatus and method for manufacturing electronic deviceENDO TETSUYA·Filed 2012·Application pending·0 cites
- 4136US2010189532A1Inline-type wafer conveyance deviceCANON ANELVA CORP·Filed 2010·Application pending·0 cites
- 4226US2012104274A1Ion beam generating apparatus, substrate processing apparatus and method of manufacturing electronic deviceHIRAYANAGI HIROHISA·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →