Inventor · disambiguated record
Eran Amit
Also filed as: AMIT ERAN
32 granted patents·7 pending applications·117 citations·filing 2012–2024
96Inventor score
Top patents by PatentIndex Score
39 records- 0198US10527951B2Compound imaging metrology targetsKLA TENCOR CORP·Filed 2016·Granted Jan 7, 2020·18 cites·21 claims
- 0297US11248905B2Machine learning in metrology measurementsKLA TENCOR CORP·Filed 2017·Granted Feb 15, 2022·8 cites·20 claims
- 0395US11119417B2Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s)KLA TENCOR CORP·Filed 2019·Granted Sep 14, 2021·5 cites·13 claims
- 0494US10473460B2Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signalsKLA TENCOR CORP·Filed 2018·Granted Nov 12, 2019·20 cites·35 claims
- 0591US10274837B2Metrology target for combined imaging and scatterometry metrologyKLA TENCOR CORP·Filed 2015·Granted Apr 30, 2019·5 cites·18 claims
- 0691US9329033B2Method for estimating and correcting misregistration target inaccuracyKLA TENCOR CORP·Filed 2013·Granted May 3, 2016·8 cites·17 claims
- 0790US10551749B2Metrology targets with supplementary structures in an intermediate layerKLA TENCOR CORP·Filed 2017·Granted Feb 4, 2020·3 cites·29 claims
- 0888US8913237B2Device-like scatterometry overlay targetsKLA TENCOR CORP·Filed 2013·Granted Dec 16, 2014·9 cites·18 claims
- 0987US11006860B1Method and apparatus for gait analysisMOTIONIZE ISRAEL LTD·Filed 2020·Granted May 18, 2021·9 cites·21 claims
- 1087US10571811B2Device metrology targets and methodsKLA TENCOR CORP·Filed 2016·Granted Feb 25, 2020·5 cites·25 claims
- 1186US10365230B1Scatterometry overlay based on reflection peak locationsKLA TENCOR CORP·Filed 2015·Granted Jul 30, 2019·3 cites·13 claims
- 1284US11085754B2Enhancing metrology target information contentKLA TENCOR CORP·Filed 2018·Granted Aug 10, 2021·2 cites·29 claims
- 1384US9874527B2Removing process-variation-related inaccuracies from scatterometry measurementsKLA TENCOR CORP·Filed 2015·Granted Jan 23, 2018·3 cites·19 claims
- 1483US10622238B2Overlay measurement using phase and amplitude modelingKLA TENCOR CORP·Filed 2018·Granted Apr 14, 2020·4 cites·17 claims
- 1580US11372340B2Method and system for providing a quality metric for improved process controlKANDEL DANIEL·Filed 2012·Granted Jun 28, 2022·4 cites·22 claims
- 1679US12117347B2Metrology target design for tilted device designsKLA CORP·Filed 2016·Granted Oct 15, 2024·2 cites·40 claims
- 1778US11709433B2Device-like metrology targetsKLA TENCOR CORP·Filed 2022·Granted Jul 25, 2023·0 cites·20 claims
- 1876US11756687B2Method and system for assessing performanceMOTIONIZE ISRAEL LTD·Filed 2022·Granted Sep 12, 2023·1 cites·14 claims
- 1976US10685165B2Metrology using overlay and yield critical patternsKLA TENCOR CORP·Filed 2016·Granted Jun 16, 2020·2 cites·6 claims
- 2076US10303835B2Method and apparatus for direct self assembly in target design and productionKLA TENCOR CORP·Filed 2015·Granted May 28, 2019·2 cites·26 claims
- 2176US2025035489A1Metrology target design for tilted device designsKLA CORP·Filed 2024·Application pending·0 cites
- 2273US10415963B2Estimating and eliminating inter-cell process variation inaccuracyKLA TENCOR CORP·Filed 2015·Granted Sep 17, 2019·2 cites·21 claims
- 2371US2022107175A1Machine Learning in Metrology MeasurementsKLA TENCOR CORP·Filed 2021·Application pending·0 cites
- 2470US2021373445A1Single Cell Grey Scatterometry Overlay Targets and Their Measurement Using Varying Illumination Parameter(s)KLA TENCOR CORP·Filed 2021·Application pending·0 cites
- 2569US10763146B2Recipe optimization based zonal analysisKLA TENCOR CORP·Filed 2017·Granted Sep 1, 2020·1 cites·13 claims
- 2669US2023051705A1Method and System for Providing a Quality Metric for Improved Process ControlKLA CORP·Filed 2022·Application pending·0 cites
- 2766US11067904B2System for combined imaging and scatterometry metrologyKLA TENCOR CORP·Filed 2019·Granted Jul 20, 2021·0 cites·22 claims
- 2866US10699969B2Quick adjustment of metrology measurement parameters according to process variationKLA TENCOR CORP·Filed 2018·Granted Jun 30, 2020·1 cites·14 claims
- 2965US2020124981A1Device-like metrology targetsKLA TENCOR CORP·Filed 2019·Application pending·0 cites
- 3058US11060845B2Polarization measurements of metrology targets and corresponding target designsKLA TENCOR CORP·Filed 2019·Granted Jul 13, 2021·0 cites·42 claims
- 3153US11054752B2Device metrology targets and methodsKLA TENCOR CORP·Filed 2018·Granted Jul 6, 2021·0 cites·23 claims
- 3252US10331050B2Lithography systems with integrated metrology tools having enhanced functionalitiesKLA TENCOR CORP·Filed 2017·Granted Jun 25, 2019·0 cites·16 claims
- 3348US10458777B2Polarization measurements of metrology targets and corresponding target designsKLA TENCOR CORP·Filed 2015·Granted Oct 29, 2019·0 cites·20 claims
- 3447US10401841B2Identifying registration errors of DSA linesKLA TENCOR CORP·Filed 2015·Granted Sep 3, 2019·0 cites·20 claims
- 3547US2021386325A1Method and apparatus for gait analysisMOTIONIZE ISRAEL LTD·Filed 2021·Application pending·0 cites
- 3646US2024041410A1A method and apparatus for determining compliance with baseline biomechanical behaviorMOTIONIZE ISRAEL LTD·Filed 2021·Application pending·0 cites
- 3744US10025285B2On-product derivation and adjustment of exposure parameters in a directed self-assembly processKLA TENCOR CORP·Filed 2015·Granted Jul 17, 2018·0 cites·16 claims
- 3841US11158548B2Overlay measurement using multiple wavelengthsKLA TENCOR CORP·Filed 2018·Granted Oct 26, 2021·0 cites·11 claims
- 3940US10504802B2Target location in semiconductor manufacturingKLA TENCOR CORP·Filed 2017·Granted Dec 10, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →