Inventor · disambiguated record
Frederik Bijkerk
Also filed as: BIJKERK FREDERIK
16 granted patents·11 pending applications·223 citations·filing 1999–2020
93Inventor score
Files withZEISS CARL SMT GMBH8ASML NETHERLANDS BV5ZEISS CARL SMT AG3ZEISS STIFTUNG2BIJKERK FREDERIK1
Top patents by PatentIndex Score
27 records- 0191US6452194B2Radiation source for use in lithographic projection apparatusASML NETHERLANDS BV·Filed 2000·Granted Sep 17, 2002·88 cites·23 claims
- 0284US8411355B2Reflective optical element and method of manufacturing the sameTSARFATI TIM·Filed 2011·Granted Apr 2, 2013·7 cites·19 claims
- 0383US6656575B2Multilayer system with protecting layer system and production methodZEISS STIFTUNG·Filed 2001·Granted Dec 2, 2003·33 cites·3 claims
- 0478US7172788B2Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor deviceZEISS CARL SMT AG·Filed 2002·Granted Feb 6, 2007·19 cites·24 claims
- 0575US7261957B2Multilayer system with protecting layer system and production methodZEISS CARL SMT AG·Filed 2003·Granted Aug 28, 2007·21 cites·6 claims
- 0674US8638494B2Reflective optical element and method of manufacturing the sameZEISS CARL SMT GMBH·Filed 2013·Granted Jan 28, 2014·2 cites·4 claims
- 0772US11360393B2Mirror, in particular for a microlithographic projection exposure systemZEISS CARL SMT GMBH·Filed 2020·Granted Jun 14, 2022·1 cites·20 claims
- 0872USRE41362ERadiation source, lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2006·Granted Jun 1, 2010·3 cites·67 claims
- 0971US9997268B2EUV-mirror, optical system with EUV-mirror and associated operating methodZEISS CARL SMT GMBH·Filed 2016·Granted Jun 12, 2018·1 cites·22 claims
- 1071US9442383B2EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating methodZEISS CARL SMT GMBH·Filed 2013·Granted Sep 13, 2016·3 cites·25 claims
- 1167US6667484B2Radiation source, lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Dec 23, 2003·9 cites·20 claims
- 1260US6469310B1Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatusASML NETHERLANDS BV·Filed 1999·Granted Oct 22, 2002·28 cites·17 claims
- 1358US6818912B2Radiation source, lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Nov 16, 2004·5 cites·40 claims
- 1453US9733580B2Method for producing a reflective optical element for EUV-lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Aug 15, 2017·0 cites·8 claims
- 1550US2007281109A1Multilayer system with protecting layer system and production methodZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 1649US6483597B2Method for the production of multi-layer systemsZEISS STIFTUNG·Filed 2001·Granted Nov 19, 2002·3 cites·15 claims
- 1747US10916356B2Reflective optical elementZEISS CARL SMT GMBH·Filed 2019·Granted Feb 9, 2021·0 cites·15 claims
- 1839US2005111083A1Optical broad band element and process for its productionFiled 2004·Application pending·0 cites
- 1938US2004052942A1Method for coating substrates and mask holderFiled 2001·Application pending·0 cites
- 2036US2004021061A1Photodiode, charged-coupled device and method for the productionFiled 2002·Application pending·0 cites
- 2136US2004233519A1Multi-layer mirror for radiation in the xuv wavelenght range and method for manufacture thereofFiled 2002·Application pending·0 cites
- 2234US2016116648A1Optical element comprising a multilayer coating, and optical arrangement comprising sameZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 2334US2019271586A1Method, apparatus and computer program for measuring and processing a spectrum of an xuv light source from soft x-rays to infrared wavelengthUNIV TWENTE·Filed 2017·Application pending·0 cites
- 2434US2010171050A1Method for regenerating a surface of an optical element in an xuv radiation source, and xuv radiation sourceSTICHTING FUND OND MATERIAL·Filed 2007·Application pending·0 cites
- 2534US2004245090A1Process for manufacturing multilayer systemsYAKSHIN ANDREY E·Filed 2001·Application pending·0 cites
- 2634US2017365371A1Euv multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirrorZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 2730US2013220971A1Method for manufacturing a multilayer structure with a lateral pattern for application in the xuv wavelength range, and bf and lmag structures manufactured according to this methodBIJKERK FREDERIK·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →