Inventor · disambiguated record
Franciscus Godefridus Casper Bijnen
Also filed as: BIJNEN FRANCISCUS · BIJNEN FRANCISCUS GODEFRIDUS · BIJNEN FRANCISCUS GODEFRIDUS C · BIJNEN FRANCISCUS GODEFRIDUS CASPER
41 granted patents·8 pending applications·112 citations·filing 2005–2023
97Inventor score
Files withASML NETHERLANDS BV35ASML HOLDING NV4BIJNEN FRANCISCUS GODEFRIDUS CASPER4HULSEBOS EDO MARIA2WARNAAR PATRICK2
Top patents by PatentIndex Score
49 records- 0194US10527958B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jan 7, 2020·7 cites·21 claims
- 0293US10474045B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 12, 2019·6 cites·20 claims
- 0392US8208121B2Alignment mark and a method of aligning a substrate comprising such an alignment markBIJNEN FRANCISCUS GODEFRIDUS CASPER·Filed 2009·Granted Jun 26, 2012·24 cites·34 claims
- 0491US11079684B2Measurement apparatus and a method for determining a substrate gridASML NETHERLANDS BV·Filed 2018·Granted Aug 3, 2021·3 cites·20 claims
- 0590US10331040B2Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Jun 25, 2019·4 cites·20 claims
- 0689US10620549B2Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2019·Granted Apr 14, 2020·3 cites·20 claims
- 0788US11966166B2Measurement apparatus and a method for determining a substrate gridASML NETHERLANDS BV·Filed 2021·Granted Apr 23, 2024·1 cites·20 claims
- 0887US9046385B2Alignment measurement system, lithographic apparatus, and a method to determine alignment in a lithographic apparatusBIJNEN FRANCISCUS GODEFRIDUS CASPER·Filed 2011·Granted Jun 2, 2015·5 cites·13 claims
- 0986US9454084B2Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement systemASML NETHERLANDS BV·Filed 2013·Granted Sep 27, 2016·5 cites·15 claims
- 1085US11029610B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jun 8, 2021·2 cites·21 claims
- 1185US7433038B2Alignment of substrates for bondingASML NETHERLANDS BV·Filed 2006·Granted Oct 7, 2008·11 cites·20 claims
- 1284US11105619B2Measurement apparatusASML NETHERLANDS BV·Filed 2018·Granted Aug 31, 2021·3 cites·20 claims
- 1383US8208140B2Alignment system and alignment marks for use therewithHULSEBOS EDO MARIA·Filed 2010·Granted Jun 26, 2012·4 cites·17 claims
- 1480US11054813B2Method and apparatus for controlling an industrial process using product groupingASML NETHERLANDS BV·Filed 2016·Granted Jul 6, 2021·2 cites·20 claims
- 1580US10901326B2Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted Jan 26, 2021·1 cites·22 claims
- 1680US7562686B2Method and system for 3D alignment in wafer scale integrationASML NETHERLANDS BV·Filed 2005·Granted Jul 21, 2009·10 cites·11 claims
- 1779US10962887B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Mar 30, 2021·1 cites·20 claims
- 1879US8982347B2Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatusASML NETHERLANDS N V·Filed 2012·Granted Mar 17, 2015·8 cites·17 claims
- 1975US11531280B2Compact alignment sensor arrangementsASML HOLDING NV·Filed 2019·Granted Dec 20, 2022·1 cites·18 claims
- 2074US2024151520A1Measurement apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2173US7463337B2Substrate table with windows, method of measuring a position of a substrate and a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Dec 9, 2008·3 cites·4 claims
- 2271US11874103B2Measurement apparatusASML NETHERLANDS BV·Filed 2021·Granted Jan 16, 2024·0 cites·20 claims
- 2370US9891540B2Measuring method, measurement apparatus, lithographic apparatus and device manufacturing methodASML HOLDING NV·Filed 2015·Granted Feb 13, 2018·1 cites·24 claims
- 2470US9835954B2Inspection method and apparatus, substrates for use therein and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Dec 5, 2017·1 cites·17 claims
- 2569US12242203B2Target for measuring a parameter of a lithographic processASML NETHERLANDS BV·Filed 2021·Granted Mar 4, 2025·0 cites·11 claims
- 2669US8208139B2Alignment system and alignment marks for use therewithHULSEBOS EDO MARIA·Filed 2008·Granted Jun 26, 2012·2 cites·16 claims
- 2765US9377700B2Determining position and curvature information directly from a surface of a patterning deviceASML HOLDING NV·Filed 2013·Granted Jun 28, 2016·1 cites·21 claims
- 2864US9726991B2Patterning device, method of producing a marker on a substrate and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Aug 8, 2017·1 cites·19 claims
- 2962US12032305B2Alignment method and associated alignment and lithographic apparatusesASML NETHERLANDS BV·Filed 2021·Granted Jul 9, 2024·0 cites·20 claims
- 3061US11442372B2Method of measuring an alignment mark or an alignment mark assembly, alignment system, and lithographic toolASML NETHERLANDS BV·Filed 2020·Granted Sep 13, 2022·0 cites·21 claims
- 3161US10151987B2Measuring method, apparatus and substrateDECKERS DAVID·Filed 2011·Granted Dec 11, 2018·1 cites·20 claims
- 3260US2025036031A1Target asymmetry measurement for substrate alignment in lithography systemsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3359US11927892B2Alignment method and associated alignment and lithographic apparatusesASML NETHERLANDS BV·Filed 2020·Granted Mar 12, 2024·0 cites·20 claims
- 3458US2024263941A1Intensity imbalance calibration on an overfilled bidirectional markASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3557US8908152B2Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structuresBIJNEN FRANCISCUS GODEFRIDUS CASPER·Filed 2009·Granted Dec 9, 2014·1 cites·22 claims
- 3657US8169593B2Lithographic apparatus and device manufacturing methodBIJNEN FRANCISCUS GODEFRIDUS CASPER·Filed 2008·Granted May 1, 2012·0 cites·10 claims
- 3756US8130366B2Method for coarse wafer alignment in a lithographic apparatusWARNAAR PATRICK·Filed 2009·Granted Mar 6, 2012·0 cites·15 claims
- 3855US11181836B2Method for determining deformationASML NETHERLANDS BV·Filed 2018·Granted Nov 23, 2021·0 cites·20 claims
- 3953US11803130B2Phase modulators in alignment to decrease mark sizeASML NETHERLANDS BV·Filed 2020·Granted Oct 31, 2023·0 cites·20 claims
- 4053US9280057B2Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Mar 8, 2016·0 cites·16 claims
- 4150US2012127452A1Method for coarse wafer alignment in a lithographic apparatusWARNAAR PATRICK·Filed 2012·Application pending·0 cites
- 4247US10514620B2Alignment methodASML NETHERLANDS BV·Filed 2017·Granted Dec 24, 2019·0 cites·20 claims
- 4345US2022100109A1Apparatus for and method of simultaneously acquiring parallel alignment marksASML HOLDING NV·Filed 2019·Application pending·0 cites
- 4444US2009153825A1Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 4539US10444647B2Methods and apparatus for determining the position of a target structure on a substrate, methods and apparatus for determining the position of a substrateASML NETHERLANDS BV·Filed 2017·Granted Oct 15, 2019·0 cites·20 claims
- 4639US10139740B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 27, 2018·0 cites·20 claims
- 4736US10527957B2Method and apparatus for processing a substrate in a lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Jan 7, 2020·0 cites·13 claims
- 4836US2010245792A1Alignment Measurement Arrangement, Alignment Measurement Method, Device Manufacturing Method and Lithographic ApparatusASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
- 4934US2007070311A1Contacts to microdevicesASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →