Inventor · disambiguated record
Frank Schlesener
Also filed as: SCHLESENER FRANK
31 granted patents·1 pending application·62 citations·filing 2010–2019
95Inventor score
Top patents by PatentIndex Score
32 records- 0193US9703206B2Method for operating an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Jul 11, 2017·4 cites·30 claims
- 0292US8467033B2Method for operating an illumination system of a microlithographic projection exposure apparatusNATT OLIVER·Filed 2010·Granted Jun 18, 2013·12 cites·38 claims
- 0389US9551941B2Illumination system for an EUV lithography device and facet mirror thereforZEISS CARL SMT GMBH·Filed 2015·Granted Jan 24, 2017·4 cites·24 claims
- 0488US9645503B2CollectorZEISS CARL SMT GMBH·Filed 2014·Granted May 9, 2017·5 cites·22 claims
- 0588US9046786B2Illumination system of a microlithographic projection exposure apparatusPATRA MICHAEL·Filed 2012·Granted Jun 2, 2015·5 cites·19 claims
- 0687US9341957B2Method for operating an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted May 17, 2016·2 cites·30 claims
- 0785US9983483B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted May 29, 2018·2 cites·19 claims
- 0885US9703205B2Measuring an optical symmetry property on a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jul 11, 2017·3 cites·20 claims
- 0984US9477157B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Oct 25, 2016·2 cites·19 claims
- 1084US9280060B2Illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2014·Granted Mar 8, 2016·5 cites·28 claims
- 1183US9500954B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Nov 22, 2016·3 cites·21 claims
- 1283US9217931B2Method for operating an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Dec 22, 2015·2 cites·31 claims
- 1382US10444631B2Method of operating a microlithographic projection apparatus and illumination system of such an apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Oct 15, 2019·2 cites·22 claims
- 1478US8873023B2Illumination system for microlithographySCHOLZ AXEL·Filed 2011·Granted Oct 28, 2014·4 cites·12 claims
- 1577US9632413B2Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure systemZEISS CARL SMT GMBH·Filed 2014·Granted Apr 25, 2017·2 cites·28 claims
- 1671US9310690B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 12, 2016·1 cites·21 claims
- 1770US9665008B2Mirror system comprising at least one mirror for use for guiding illumination and imaging light in EUV projection lithographyZEISS CARL SMT GMBH·Filed 2014·Granted May 30, 2017·1 cites·13 claims
- 1870US9606441B2Illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Mar 28, 2017·1 cites·20 claims
- 1967US9507269B2Illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Nov 29, 2016·1 cites·22 claims
- 2067US9411245B2Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Aug 9, 2016·1 cites·22 claims
- 2167US2019155166A1Method for operating an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Application pending·0 cites
- 2264US10222704B2Method for operating an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Mar 5, 2019·0 cites·27 claims
- 2357US10088754B2Illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2017·Granted Oct 2, 2018·0 cites·19 claims
- 2456US9910359B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 6, 2018·0 cites·27 claims
- 2553US9798249B2Method and apparatus for compensating at least one defect of an optical systemZEISS CARL SMS LTD·Filed 2014·Granted Oct 24, 2017·0 cites·20 claims
- 2651US9442385B2Optical system for a microlithographic projection exposure apparatus and microlithographic exposure methodZEISS CARL SMT GMBH·Filed 2014·Granted Sep 13, 2016·0 cites·17 claims
- 2751US9182677B2Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Nov 10, 2015·0 cites·25 claims
- 2850US9817317B2Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Nov 14, 2017·0 cites·27 claims
- 2948US9753375B2Illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2014·Granted Sep 5, 2017·0 cites·15 claims
- 3046US9500956B2Optical system of a microlithographic projection exposure apparatus, and microlithographic exposureZEISS CARL SMT GMBH·Filed 2013·Granted Nov 22, 2016·0 cites·18 claims
- 3143US9581910B2Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 28, 2017·0 cites·21 claims
- 3242US9488918B2Optical system for a microlithographic projection exposure apparatus and microlithographic exposure methodZEISS CARL SMT GMBH·Filed 2015·Granted Nov 8, 2016·0 cites·30 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →