Inventor · disambiguated record
Gaku Furuta
Also filed as: FURUTA GAKU
32 granted patents·21 pending applications·190 citations·filing 2001–2024
96Inventor score
Top patents by PatentIndex Score
53 records- 0196US9382621B2Ground return for plasma processesCHOI SOO YOUNG·Filed 2010·Granted Jul 5, 2016·27 cites·33 claims
- 0291US7972470B2Asymmetric grounding of rectangular susceptorAPPLIED MATERIALS INC·Filed 2007·Granted Jul 5, 2011·10 cites·37 claims
- 0390US8877301B2Plasma processing including asymmetrically grounding a susceptorFURUTA GAKU·Filed 2011·Granted Nov 4, 2014·4 cites·18 claims
- 0490US7125758B2Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursorsAPPLIED MATERIALS INC·Filed 2004·Granted Oct 24, 2006·47 cites·23 claims
- 0586US9068262B2Tightly fitted ceramic insulator on large area electrodeKUDELA JOZEF·Filed 2011·Granted Jun 30, 2015·6 cites·16 claims
- 0685US9677177B2Substrate support with quadrantsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 13, 2017·6 cites·19 claims
- 0784US9187827B2Substrate support with ceramic insulationAPPLIED MATERIALS INC·Filed 2013·Granted Nov 17, 2015·2 cites·11 claims
- 0881US7959735B2Susceptor with insulative insertsAPPLIED MATERIALS INC·Filed 2007·Granted Jun 14, 2011·8 cites·17 claims
- 0980US9758869B2Anodized showerheadCHOI SOO YOUNG·Filed 2010·Granted Sep 12, 2017·4 cites·23 claims
- 1079US10123379B2Substrate support with quadrantsAPPLIED MATERIALS INC·Filed 2017·Granted Nov 6, 2018·2 cites·15 claims
- 1179US8281739B2RF shutterTINER ROBIN L·Filed 2008·Granted Oct 9, 2012·5 cites·12 claims
- 1278US8999847B2a-Si seasoning effect to improve SiN run-to-run uniformityFURUTA GAKU·Filed 2011·Granted Apr 7, 2015·4 cites·17 claims
- 1377US9299558B2Run-to-run stability of film depositionAPPLIED MATERIALS INC·Filed 2014·Granted Mar 29, 2016·3 cites·17 claims
- 1477US8299466B2Thin film transistors having multiple doped silicon layersFURUTA GAKU·Filed 2010·Granted Oct 30, 2012·6 cites·8 claims
- 1577US6623653B2System and method for etching adjoining layers of silicon and indium tin oxideSHARP LAB OF AMERICA INC·Filed 2001·Granted Sep 23, 2003·19 cites·21 claims
- 1672US2025046578A1Deposition chamber system diffuser with increased power efficiencyAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1771US7988875B2Differential etch rate control of layers deposited by chemical vapor depositionAPPLIED MATERIALS INC·Filed 2008·Granted Aug 2, 2011·3 cites·25 claims
- 1869US10468221B2Shadow frame with sides having a varied profile for improved deposition uniformityAPPLIED MATERIALS INC·Filed 2018·Granted Nov 5, 2019·0 cites·20 claims
- 1967US2009283039A1Robust outlet plumbing for high power flow remote plasma sourceAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 2065US7879409B2Repeatability of CVD film deposition during sequential processing of substrates in a deposition chamberAPPLIED MATERIALS INC·Filed 2004·Granted Feb 1, 2011·8 cites·7 claims
- 2164US2013140009A1Robust outlet plumbing for high power flow remote plasma sourceWHITE JOHN M·Filed 2012·Application pending·0 cites
- 2261US12136538B2Deposition chamber system diffuser with increased power efficiencyAPPLIED MATERIALS INC·Filed 2021·Granted Nov 5, 2024·0 cites·15 claims
- 2361US11123837B2Method of removal of sharp corners from diffuser plateAPPLIED MATERIALS INC·Filed 2017·Granted Sep 21, 2021·0 cites·23 claims
- 2458USD680946SGas flow diffuser faceplateANWAR SUHAIL·Filed 2010·Granted Apr 30, 2013·11 cites·1 claims
- 2558US2009107955A1Offset liner for chamber evacuationTINER ROBIN L·Filed 2008·Application pending·0 cites
- 2657US10923327B2Chamber linerAPPLIED MATERIALS INC·Filed 2018·Granted Feb 16, 2021·0 cites·20 claims
- 2757US2008178807A1Gas distribution uniformity improvement by baffle plate with multi-size holes for large size pecvd systemsWANG QUNHUA·Filed 2008·Application pending·0 cites
- 2856US9827578B2Tightly fitted ceramic insulator on large area electrodeAPPLIED MATERIALS INC·Filed 2015·Granted Nov 28, 2017·0 cites·18 claims
- 2956US9243328B2Susceptor with roll-formed surface and method for making sameFURUTA GAKU·Filed 2009·Granted Jan 26, 2016·0 cites·15 claims
- 3056US2009023241A1Clean rate improvement by pressure controlled remote plasma sourceFURUTA GAKU·Filed 2008·Application pending·0 cites
- 3153US10676817B2Flip edge shadow frameWANG QUNHUA·Filed 2012·Granted Jun 9, 2020·0 cites·15 claims
- 3253US2014251216A1Flip edge shadow frameWANG QUNHUA·Filed 2013·Application pending·0 cites
- 3353US2009197015A1Method and apparatus for controlling plasma uniformityAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 3453US2009258162A1Plasma processing apparatus and methodAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3552US2009255798A1Method to prevent parasitic plasma generation in gas feedthru of large size pecvd chamberFURUTA GAKU·Filed 2008·Application pending·0 cites
- 3651US2006228490A1Gas distribution uniformity improvement by baffle plate with multi-size holes for large size PECVD systemsAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 3750US10697063B2Corner spoiler for improving profile uniformityAPPLIED MATERIALS INC·Filed 2015·Granted Jun 30, 2020·0 cites·10 claims
- 3850US2010151688A1Method to prevent thin spot in large size systemAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3949US2018340257A1Diffuser for uniformity improvement in display pecvd applicationsAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 4048US10002711B2Low temperature multilayer dielectric film for passivation and capacitorAPPLIED MATERIALS INC·Filed 2015·Granted Jun 19, 2018·0 cites·14 claims
- 4148US2016305025A1Ground return for plasma processesAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 4247US9230796B2A-Si seasoning effect to improve SiN run-to-run uniformityAPPLIED MATERIALS INC·Filed 2015·Granted Jan 5, 2016·0 cites·19 claims
- 4347US2018090300A1Diffuser With Corner HCGAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 4447US2011041873A1Method of cleaning a CVD processing chamberAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 4545USD713200SSusceptor with heaterFURUTA GAKU·Filed 2012·Granted Sep 16, 2014·5 cites·1 claims
- 4640USD717113SSusceptor with heaterAPPLIED MATERIALS INC·Filed 2013·Granted Nov 11, 2014·3 cites·1 claims
- 4740USD716098SSusceptor with heaterAPPLIED MATERIALS INC·Filed 2014·Granted Oct 28, 2014·3 cites·1 claims
- 4840USD669032SFlow blocking shadow frame supportANWAR SUHAIL·Filed 2010·Granted Oct 16, 2012·4 cites·1 claims
- 4940US2020058497A1Silicon nitride forming precursor controlAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 5040US2011146577A1Showerhead with insulated corner regionsAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
Showing the top 50 of 53 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →