Inventor · disambiguated record
Gerhard Fuerter
Also filed as: FUERTER GERHARD
11 granted patents·2 pending applications·172 citations·filing 1984–2018
89Inventor score
Top patents by PatentIndex Score
13 records- 0195US7511886B2Optical beam transformation system and illumination system comprising an optical beam transformation systemZEISS CARL SMT AG·Filed 2005·Granted Mar 31, 2009·63 cites·54 claims
- 0292US4613217ASpectacle lens having astigmatic powerZEISS STIFTUNG·Filed 1984·Granted Sep 23, 1986·81 cites·13 claims
- 0382US9104016B2Optical projection systemZEISS CARL SMT GMBH·Filed 2012·Granted Aug 11, 2015·2 cites·24 claims
- 0476US8300210B2Optical projection systemRAU JOHANNES·Filed 2005·Granted Oct 30, 2012·3 cites·33 claims
- 0572USRE40743EProjection exposure system having a reflective reticleZEISS CARL SMT AG·Filed 2004·Granted Jun 16, 2009·13 cites·40 claims
- 0670US9557653B2Optical projection systemZEISS CARL SMT GMBH·Filed 2015·Granted Jan 31, 2017·1 cites·30 claims
- 0764US7271876B2Projection objective for microlithographyZEISS CARL SMT AG·Filed 2004·Granted Sep 18, 2007·7 cites·6 claims
- 0863US2018259856A1Optical Projection SystemZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 0962US9891535B2Optical projection systemZEISS CARL SMT GMBH·Filed 2017·Granted Feb 13, 2018·0 cites·20 claims
- 1059US7697211B2Symmetrical objective having four lens groups for microlithographyZEISS CARL SMT AG·Filed 2008·Granted Apr 13, 2010·2 cites·26 claims
- 1148US2008049320A1Projection objective for microlithographyZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 1244US7405808B2Optical system, in particular illumination system, of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Granted Jul 29, 2008·0 cites·13 claims
- 1334US8873151B2Illumination system for a microlithgraphic exposure apparatusSOHMER ALEXANDER·Filed 2006·Granted Oct 28, 2014·0 cites·25 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →