Inventor · disambiguated record
Guorong V. Zhuang
Also filed as: ZHUANG GUORONG V · ZHUANG GUORONG VERA
19 granted patents·3 pending applications·450 citations·filing 2001–2022
94Inventor score
Top patents by PatentIndex Score
22 records- 0198US9470639B1Optical metrology with reduced sensitivity to grating anomaliesKLA TENCOR CORP·Filed 2016·Granted Oct 18, 2016·31 cites·20 claims
- 0298US7929667B1High brightness X-ray metrologyKLA TENCOR CORP·Filed 2009·Granted Apr 19, 2011·191 cites·18 claims
- 0396US9228943B2Dynamically adjustable semiconductor metrology systemKLA TENCOR CORP·Filed 2012·Granted Jan 5, 2016·31 cites·41 claims
- 0495US9404872B1Selectably configurable multiple mode spectroscopic ellipsometryWANG HAIMING·Filed 2012·Granted Aug 2, 2016·29 cites·30 claims
- 0593US10006865B1Confined illumination for small spot size metrologyKLA TENCOR CORP·Filed 2017·Granted Jun 26, 2018·8 cites·15 claims
- 0693US6713753B1Combination of normal and oblique incidence polarimetry for the characterization of gratingsNANOMETRICS INC·Filed 2001·Granted Mar 30, 2004·66 cites·20 claims
- 0792US9846132B2Small-angle scattering X-ray metrology systems and methodsKLA TENCOR CORP·Filed 2014·Granted Dec 19, 2017·10 cites·13 claims
- 0892US9693439B1High brightness liquid droplet X-ray source for semiconductor metrologyKLA TENCOR CORP·Filed 2014·Granted Jun 27, 2017·20 cites·19 claims
- 0992US8045179B1Bright and dark field scatterometry systems for line roughness metrologyKLA TENCOR CORP·Filed 2008·Granted Oct 25, 2011·25 cites·25 claims
- 1092US7760364B1Systems and methods for near-field heterodyne spectroscopyKLA TENCOR CORP·Filed 2008·Granted Jul 20, 2010·19 cites·36 claims
- 1190US11137350B2Mid-infrared spectroscopy for measurement of high aspect ratio structuresKLA CORP·Filed 2020·Granted Oct 5, 2021·2 cites·37 claims
- 1284US7928390B1Infrared metrologyKLA TENCOR CORP·Filed 2008·Granted Apr 19, 2011·12 cites·20 claims
- 1380US11231362B1Multi-environment polarized infrared reflectometer for semiconductor metrologyKLA CORP·Filed 2019·Granted Jan 25, 2022·1 cites·20 claims
- 1474US9719932B1Confined illumination for small spot size metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 1, 2017·2 cites·11 claims
- 1566US9146156B2Light source tracking in optical metrology systemZHUANG GUORONG V·Filed 2011·Granted Sep 29, 2015·3 cites·21 claims
- 1660US8790603B2Apparatus for purifying a controlled-pressure environmentKLA TENCOR CORP·Filed 2013·Granted Jul 29, 2014·0 cites·30 claims
- 1753US2022316045A1System and method for ion-assisted deposition of optical coatingsKLA CORP·Filed 2022·Application pending·0 cites
- 1845US9970863B2Optical metrology with reduced focus error sensitivityKLA TENCOR CORP·Filed 2015·Granted May 15, 2018·0 cites·20 claims
- 1945US9156068B2Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiationKLA TENCOR CORP·Filed 2014·Granted Oct 13, 2015·0 cites·38 claims
- 2043US8570514B2Optical system polarizer calibrationDE VEER JOHANNES D·Filed 2011·Granted Oct 29, 2013·0 cites·1 claims
- 2143US2014168758A1Carbon as grazing incidence euv mirror and spectral purity filterKLA TENCOR CORP·Filed 2013·Application pending·0 cites
- 2239US2014158914A1Optical component with blocking surface and method thereofSANDIA CORP·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →