Inventor · disambiguated record
Haripin Chandra
Also filed as: CHANDRA HARIPIN
28 granted patents·17 pending applications·840 citations·filing 2012–2025
96Inventor score
Top patents by PatentIndex Score
45 records- 0198US8993072B2Halogenated organoaminosilane precursors and methods for depositing films comprising sameAIR PROD & CHEM·Filed 2012·Granted Mar 31, 2015·285 cites·36 claims
- 0298US8771807B2Organoaminosilane precursors and methods for making and using sameXIAO MANCHAO·Filed 2012·Granted Jul 8, 2014·453 cites·10 claims
- 0397US11152206B2Compositions and methods using same for carbon doped silicon containing filmsVERSUM MAT US LLC·Filed 2020·Granted Oct 19, 2021·4 cites·2 claims
- 0495US10453675B2Organoaminosilane precursors and methods for depositing films comprising sameVERSUM MAT US LLC·Filed 2014·Granted Oct 22, 2019·17 cites·5 claims
- 0595US9337018B2Methods for depositing films with organoaminodisilane precursorsAIR PROD & CHEM·Filed 2013·Granted May 10, 2016·15 cites·45 claims
- 0695US9005719B2Organoaminosilane precursors and methods for making and using sameXIAO MANCHAO·Filed 2014·Granted Apr 14, 2015·12 cites·7 claims
- 0793US9200167B2Alkoxyaminosilane compounds and applications thereofAIR PROD & CHEM·Filed 2013·Granted Dec 1, 2015·10 cites·16 claims
- 0892US10145008B2Compositions and methods using same for carbon doped silicon containing filmsVERSUM MAT US LLC·Filed 2016·Granted Dec 4, 2018·8 cites·20 claims
- 0990US9905415B2Methods for depositing silicon nitride filmsAIR PROD & CHEM·Filed 2014·Granted Feb 27, 2018·10 cites·15 claims
- 1090US9460912B2High temperature atomic layer deposition of silicon oxide thin filmsAIR PROD & CHEM·Filed 2013·Granted Oct 4, 2016·9 cites·13 claims
- 1189US2025304804A1Compositions and processes for depositing carbon-doped silicon-containing filmsVERSUM MAT US LLC·Filed 2025·Application pending·0 cites
- 1288US10242864B2High temperature atomic layer deposition of silicon oxide thin filmsAIR PROD & CHEM·Filed 2016·Granted Mar 26, 2019·4 cites·8 claims
- 1387US10985010B2Methods for making silicon and nitrogen containing filmsVERSUM MAT US LLC·Filed 2019·Granted Apr 20, 2021·4 cites·18 claims
- 1486US11139162B2Organoaminosilane precursors and methods for depositing films comprising sameVERSUM MAT US LLC·Filed 2019·Granted Oct 5, 2021·2 cites·15 claims
- 1586US2024304438A1Composition and methods using same for carbon doped silicon containing filmsVERSUM MAT US LLC·Filed 2024·Application pending·0 cites
- 1684US2023348736A1Compositions and processes for depositing carbon-doped silicon-containing filmsVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 1783US12230496B2Organoaminosilane precursors and methods for depositing films comprising sameVERSON MAT US LLC·Filed 2021·Granted Feb 18, 2025·1 cites·20 claims
- 1883US2023377874A1Composition and methods using same for carbon doped silicon containing filmsVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 1980US2025183029A1Organoaminosilane precursors and methods for depositing films comprising sameVERSUM MAT US LLC·Filed 2025·Application pending·0 cites
- 2078US11742200B2Composition and methods using same for carbon doped silicon containing filmsVERSUM MAT US LLC·Filed 2021·Granted Aug 29, 2023·0 cites·5 claims
- 2178US11725111B2Compositions and processes for depositing carbon-doped silicon-containing filmsVERSUM MAT US LLC·Filed 2021·Granted Aug 15, 2023·0 cites·6 claims
- 2277US10283348B2High temperature atomic layer deposition of silicon-containing filmsVERSUM MAT US LLC·Filed 2017·Granted May 7, 2019·2 cites·13 claims
- 2376US10991571B2High temperature atomic layer deposition of silicon oxide thin filmsVERSUM MAT US LLC·Filed 2019·Granted Apr 27, 2021·1 cites·12 claims
- 2474US9613799B2Methods for depositing films with organoaminodisilane precursorsAIR PROD & CHEM·Filed 2016·Granted Apr 4, 2017·1 cites·14 claims
- 2574US2022145453A1Methods For Making Silicon Containing Films That Have High Carbon ContentVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 2672US2020071819A1Methods For Making Silicon Containing Films That Have High Carbon ContentVERSUM MAT US LLC·Filed 2019·Application pending·0 cites
- 2770US9447287B2Compositions and processes for depositing carbon-doped silicon-containing filmsXIAO MANCHAO·Filed 2012·Granted Sep 20, 2016·1 cites·24 claims
- 2866US9978585B2Organoaminodisilane precursors and methods for depositing films comprising sameAIR PROD & CHEM·Filed 2013·Granted May 22, 2018·1 cites·17 claims
- 2966US2019287798A1Compositions and Processes for Depositing Carbon-Doped Silicon-Containing FilmsVERSUM MAT US LLC·Filed 2019·Application pending·0 cites
- 3065US2025270698A1Boron-containing precursors for the ald deposition of boron nitride filmsVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 3164US10283350B2Methods for depositing films with organoaminodisilane precursorsVERSUM MAT US LLC·Filed 2018·Granted May 7, 2019·0 cites·14 claims
- 3264US10077364B2Organoaminodisilane precursors and methods for depositing films comprising sameVERSUM MAT US LLC·Filed 2017·Granted Sep 18, 2018·0 cites·25 claims
- 3363US9997350B2Methods for depositing films with organoaminodisilane precursorsVERSUM MAT US LLC·Filed 2017·Granted Jun 12, 2018·0 cites·16 claims
- 3463US2025101586A1Halide-functionalized cyclotrisilazanes as precursors for deposition of silicon-containing filmsVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 3561US9627193B2Organoaminodisilane precursors and methods for depositing films comprising sameAIR PROD & CHEM·Filed 2014·Granted Apr 18, 2017·0 cites·20 claims
- 3660US2018033614A1Compositions and Methods Using Same for Carbon Doped Silicon Containing FilmsVERSUM MAT US LLC·Filed 2017·Application pending·0 cites
- 3759US10460929B2Organoaminosilane precursors and methods for depositing films comprising sameVERSUM MAT US LLC·Filed 2017·Granted Oct 29, 2019·0 cites·5 claims
- 3858US2025146131A1Compositions and methods using same for carbon doped silicon containing filmsVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 3957US10319584B2Compositions and processes for depositing carbon-doped silicon-containing filmsAIR PROD & CHEM·Filed 2016·Granted Jun 11, 2019·0 cites·4 claims
- 4057US2024093360A1Compositions and methods using same for films comprising silicon and boronVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 4155US2023058258A1Method for depositing a filmVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 4253US11649547B2Deposition of carbon doped silicon oxideVERSUM MAT US LLC·Filed 2020·Granted May 16, 2023·0 cites·9 claims
- 4353US2024158915A1Composition for atomic layer deposition of high quality silicon oxide thin filmsVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 4452US2024170283A1Selective deposition of silicon dielectric filmVERSUM MAT US LLC·Filed 2022·Application pending·0 cites
- 4534US2015275355A1Compositions and methods for the deposition of silicon oxide filmsAIR PROD & CHEM·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →