Inventor · disambiguated record
Hamid Tavassoli
Also filed as: TAVASSOLI HAMID · TAVASSOLI HAMID F
30 granted patents·6 pending applications·765 citations·filing 2003–2020
97Inventor score
Files withAPPLIED MATERIALS INC19BUCHBERGER JR DOUGLAS A5TAVASSOLI HAMID4BRILLHART PAUL LUKAS3BERA KALLOL2
Top patents by PatentIndex Score
36 records- 0198US10580620B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Mar 3, 2020·38 cites·17 claims
- 0298US10546728B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 28, 2020·39 cites·11 claims
- 0398US10535502B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 14, 2020·35 cites·14 claims
- 0498US10453656B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Oct 22, 2019·36 cites·15 claims
- 0598US9741546B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 22, 2017·385 cites·17 claims
- 0696US8092639B2Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changesBUCHBERGER JR DOUGLAS A·Filed 2010·Granted Jan 10, 2012·20 cites·7 claims
- 0796US8012304B2Plasma reactor with a multiple zone thermal control feed forward control apparatusAPPLIED MATERIALS INC·Filed 2006·Granted Sep 6, 2011·27 cites·11 claims
- 0894US8617351B2Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reductionHOFFMAN DANIEL J·Filed 2005·Granted Dec 31, 2013·26 cites·10 claims
- 0994US8608900B2Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changesBUCHBERGER JR DOUGLAS A·Filed 2006·Granted Dec 17, 2013·18 cites·20 claims
- 1093US8221580B2Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loopsBUCHBERGER JR DOUGLAS A·Filed 2006·Granted Jul 17, 2012·14 cites·18 claims
- 1192US8980044B2Plasma reactor with a multiple zone thermal control feed forward control apparatusBRILLHART PAUL LUKAS·Filed 2010·Granted Mar 17, 2015·10 cites·19 claims
- 1292US8337660B2Capacitively coupled plasma reactor having very agile wafer temperature controlBUCHBERGER JR DOUGLAS A·Filed 2010·Granted Dec 25, 2012·12 cites·13 claims
- 1392US8021521B2Method for agile workpiece temperature control in a plasma reactor using a thermal modelAPPLIED MATERIALS INC·Filed 2006·Granted Sep 20, 2011·13 cites·19 claims
- 1491US8157951B2Capacitively coupled plasma reactor having very agile wafer temperature controlBUCHBERGER JR DOUGLAS A·Filed 2006·Granted Apr 17, 2012·18 cites·16 claims
- 1589US8092638B2Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distributionBRILLHART PAUL LUKAS·Filed 2006·Granted Jan 10, 2012·15 cites·9 claims
- 1687US9267742B2Apparatus for controlling the temperature uniformity of a substrateBERA KALLOL·Filed 2010·Granted Feb 23, 2016·5 cites·19 claims
- 1785US9564297B2Electron beam plasma source with remote radical sourceAPPLIED MATERIALS INC·Filed 2014·Granted Feb 7, 2017·6 cites·20 claims
- 1884US11315760B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2020·Granted Apr 26, 2022·1 cites·20 claims
- 1982US8916793B2Temperature control in plasma processing apparatus using pulsed heat transfer fluid flowSILVEIRA FERNANDO M·Filed 2011·Granted Dec 23, 2014·7 cites·13 claims
- 2082US8822876B2Multi-zoned plasma processing electrostatic chuck with improved temperature uniformityTAVASSOLI HAMID·Filed 2011·Granted Sep 2, 2014·5 cites·20 claims
- 2181US10615006B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2017·Granted Apr 7, 2020·1 cites·20 claims
- 2279US9799491B2Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etchingAPPLIED MATERIALS INC·Filed 2016·Granted Oct 24, 2017·2 cites·7 claims
- 2379US8629370B2Assembly for delivering RF power and DC voltage to a plasma processing chamberTAVASSOLI HAMID·Filed 2011·Granted Jan 14, 2014·5 cites·20 claims
- 2479US8236105B2Apparatus for controlling gas flow in a semiconductor substrate processing chamberBERA KALLOL·Filed 2004·Granted Aug 7, 2012·22 cites·27 claims
- 2576US10704147B2Process kit design for in-chamber heater and wafer rotating mechanismAPPLIED MATERIALS INC·Filed 2017·Granted Jul 7, 2020·2 cites·20 claims
- 2670US10537013B2Distributed electro-static chuck coolingAPPLIED MATERIALS INC·Filed 2013·Granted Jan 14, 2020·2 cites·18 claims
- 2765US9248509B2Multi-zoned plasma processing electrostatic chuck with improved temperature uniformityTAVASSOLI HAMID·Filed 2014·Granted Feb 2, 2016·1 cites·16 claims
- 2861US10386126B2Apparatus for controlling temperature uniformity of a substrateAPPLIED MATERIALS INC·Filed 2016·Granted Aug 20, 2019·0 cites·20 claims
- 2959US9214315B2Temperature control in plasma processing apparatus using pulsed heat transfer fluid flowAPPLIED MATERIALS INC·Filed 2014·Granted Dec 15, 2015·0 cites·7 claims
- 3059US2009159566A1Method and apparatus for controlling temperature of a substrateAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 3153US10697057B2Collimator for use in a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2017·Granted Jun 30, 2020·0 cites·20 claims
- 3251US2018053631A1Low Electron Temperature Etch Chamber with Independent Control Over Plasma Density, Radical Composition Ion Energy for Atomic Precision EtchingAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 3346US2016042961A1Electron beam plasma source with rotating cathode, backside helium cooling and liquid cooled pedestal for uniform plasma generationAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3446US2010319852A1Capacitivley coupled plasma reactor having a cooled/heated wafer support with uniform temperature distributionBRILLHART PAUL LUKAS·Filed 2010·Application pending·0 cites
- 3539US2013284372A1Esc cooling base for large diameter subsratesTAVASSOLI HAMID·Filed 2013·Application pending·0 cites
- 3638US2004040664A1Cathode pedestal for a plasma etch reactorFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →