Inventor · disambiguated record
Hans Van Der Laan
Also filed as: VAN DER LAAN HANS · VAN DER LAAN HANS ROBERT
43 granted patents·2 pending applications·590 citations·filing 1974–2023
98Inventor score
Top patents by PatentIndex Score
45 records- 0196US7112813B2Device inspection method and apparatus using an asymmetric markerASML NETHERLANDS BV·Filed 2003·Granted Sep 26, 2006·61 cites·64 claims
- 0295US6650399B2Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrationsASML NETHERLANDS BV·Filed 2002·Granted Nov 18, 2003·172 cites·15 claims
- 0392US6646729B2Method of measuring aberration in an optical imaging systemASML NETHERLANDS BV·Filed 2001·Granted Nov 11, 2003·59 cites·17 claims
- 0489US12276921B2Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology methodASML NETHERLANDS BV·Filed 2021·Granted Apr 15, 2025·2 cites·17 claims
- 0589US7403293B2Metrology apparatus, lithographic apparatus, process apparatus metrology method and device manufacturing methodASML NETHERLANDS·Filed 2006·Granted Jul 22, 2008·15 cites·32 claims
- 0688US10578982B2Substrate measurement recipe design of, or for, a target including a latent imageASML NETHERLANDS BV·Filed 2017·Granted Mar 3, 2020·4 cites·20 claims
- 0788US7443486B2Method for predicting a critical dimension of a feature imaged by a lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Oct 28, 2008·13 cites·35 claims
- 0888US3937346AMovable stacking deviceCUBIC HANDLING SYSTEMS NV·Filed 1974·Granted Feb 10, 1976·50 cites·10 claims
- 0987US11681229B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2021·Granted Jun 20, 2023·1 cites·20 claims
- 1086US6787789B2Method of measuring aberration of a projection system of a lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2002·Granted Sep 7, 2004·36 cites·22 claims
- 1184US8554510B2Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program productSTAALS FRANK·Filed 2010·Granted Oct 8, 2013·5 cites·14 claims
- 1282US12228862B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2023·Granted Feb 18, 2025·0 cites·20 claims
- 1382US10551750B2Metrology method and apparatus and associated computer productASML NETHERLANDS BV·Filed 2019·Granted Feb 4, 2020·2 cites·20 claims
- 1480US10635004B2Correction using stack differenceASML NETHERLANDS BV·Filed 2017·Granted Apr 28, 2020·3 cites·27 claims
- 1580US9958789B2Method of metrology, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted May 1, 2018·2 cites·19 claims
- 1680US8208122B2Method of measuring a lithographic projection apparatusSTAALS FRANK·Filed 2009·Granted Jun 26, 2012·7 cites·26 claims
- 1780US7697116B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Apr 13, 2010·4 cites·16 claims
- 1880US6940587B2Lithographic apparatus and a measurement systemASML NETHERLANDS BV·Filed 2003·Granted Sep 6, 2005·17 cites·29 claims
- 1978US6897947B1Method of measuring aberration in an optical imaging systemASML NETHERLANDS BV·Filed 2003·Granted May 24, 2005·16 cites·21 claims
- 2077US10310388B2Metrology method and apparatus and associated computer productASML NETHERLANDS BV·Filed 2018·Granted Jun 4, 2019·1 cites·20 claims
- 2177US7459690B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2006·Granted Dec 2, 2008·3 cites·29 claims
- 2276US7312860B2Test pattern, inspection method, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 25, 2007·4 cites·2 claims
- 2376US7170587B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jan 30, 2007·11 cites·20 claims
- 2475US6710856B2Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Mar 23, 2004·17 cites·26 claims
- 2574US10962886B2Selection of measurement locations for patterning processesASML NETHERLANDS BV·Filed 2016·Granted Mar 30, 2021·1 cites·20 claims
- 2674US6028660AIllumination unit for an optical apparatusASM LITHOGRAPHY BV·Filed 1996·Granted Feb 22, 2000·37 cites·27 claims
- 2771US6721389B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Apr 13, 2004·8 cites·17 claims
- 2864US7075620B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Jul 11, 2006·5 cites·18 claims
- 2962US8134683B2Device manufacturing method, computer program and lithographic apparatusVAN DER LAAN HANS·Filed 2007·Granted Mar 13, 2012·2 cites·15 claims
- 3061US8937705B2Lithographic apparatus and device manufacturing method with radiation beam inspection using moveable reflecting deviceTEL WIM TJIBBO·Filed 2009·Granted Jan 20, 2015·1 cites·26 claims
- 3161US7151594B2Test pattern, inspection method, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Dec 19, 2006·6 cites·14 claims
- 3261US7042550B2Device manufacturing method and computer programASML NETHERLANDS BV·Filed 2003·Granted May 9, 2006·8 cites·19 claims
- 3360US6963391B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Nov 8, 2005·7 cites·19 claims
- 3455US6960775B1Lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Nov 1, 2005·5 cites·22 claims
- 3555US2025021018A1Systems and methods for reducing pattern shift in a lithographic apparatusASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3654US7177010B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Feb 13, 2007·3 cites·30 claims
- 3752US8279405B2Lithographic apparatus and device manufacturing methodDIERICHS MARCEL MATHIJS THEODORE MARIE·Filed 2010·Granted Oct 2, 2012·0 cites·11 claims
- 3848US8570489B2Lithographic projection apparatus and method of compensating perturbation factorsVAN SCHOOT JAN BERNARD PLECHELMUS·Filed 2008·Granted Oct 29, 2013·0 cites·24 claims
- 3948US2007046917A1Lithographic apparatus and device manufacturing method that compensates for reticle induced CDUASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 4046US7505116B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Mar 17, 2009·0 cites·13 claims
- 4143US7382438B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jun 3, 2008·0 cites·18 claims
- 4242US8717540B2Calculating a laser metric within a lithographic apparatus and method thereofKÖHLER CARSTEN ANDREAS·Filed 2011·Granted May 6, 2014·0 cites·19 claims
- 4342US7274434B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Sep 25, 2007·2 cites·20 claims
- 4441US7663741B2Lithographic apparatus, device manufacturing method, calibration method and computer program productASML NETHERLANDS BV·Filed 2004·Granted Feb 16, 2010·0 cites·19 claims
- 4538US8773657B2Method to determine the value of process parameters based on scatterometry dataVAN DER LAAN HANS·Filed 2005·Granted Jul 8, 2014·0 cites·36 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →