Inventor · disambiguated record
Helen R. Armer
Also filed as: ARMER HELEN · ARMER HELEN R
17 granted patents·4 pending applications·1,209 citations·filing 2002–2013
96Inventor score
Top patents by PatentIndex Score
21 records- 0198US7925377B2Cluster tool architecture for processing a substrateAPPLIED MATERIALS INC·Filed 2006·Granted Apr 12, 2011·45 cites·3 claims
- 0298US7743728B2Cluster tool architecture for processing a substrateAPPLIED MATERIALS INC·Filed 2008·Granted Jun 29, 2010·36 cites·16 claims
- 0398US7694647B2Cluster tool architecture for processing a substrateAPPLIED MATERIALS INC·Filed 2006·Granted Apr 13, 2010·42 cites·19 claims
- 0498US7357842B2Cluster tool architecture for processing a substrateSOKUDO CO LTD·Filed 2005·Granted Apr 15, 2008·106 cites·11 claims
- 0598US7018941B2Post treatment of low k dielectric filmsAPPLIED MATERIALS INC·Filed 2004·Granted Mar 28, 2006·674 cites·20 claims
- 0696US8146530B2Cluster tool architecture for processing a substrateISHIKAWA TETSUYA·Filed 2008·Granted Apr 3, 2012·22 cites·8 claims
- 0795US8550031B2Cluster tool architecture for processing a substrateISHIKAWA TETSUYA·Filed 2012·Granted Oct 8, 2013·13 cites·10 claims
- 0895US7819079B2Cartesian cluster tool configuration for lithography type processesAPPLIED MATERIALS INC·Filed 2006·Granted Oct 26, 2010·26 cites·11 claims
- 0995US7082345B2Method, system and medium for process control for the matching of tools, chambers and/or other semiconductor-related entitiesAPPLIED MATERIALS INC·Filed 2002·Granted Jul 25, 2006·100 cites·43 claims
- 1094US8215262B2Cluster tool architecture for processing a substrateISHIKAWA TETSUYA·Filed 2008·Granted Jul 10, 2012·15 cites·9 claims
- 1194US8181596B2Cluster tool architecture for processing a substrateISHIKAWA TETSUYA·Filed 2008·Granted May 22, 2012·15 cites·20 claims
- 1293US6831284B2Large area source for uniform electron beam generationAPPLIED MATERIALS INC·Filed 2002·Granted Dec 14, 2004·59 cites·47 claims
- 1392US9275334B2Increasing signal to noise ratio for creation of generalized and robust prediction modelsAPPLIED MATERIALS INC·Filed 2013·Granted Mar 1, 2016·14 cites·20 claims
- 1490US7522968B2Scheduling method for processing equipmentAPPLIED MATERIALS INC·Filed 2007·Granted Apr 21, 2009·18 cites·17 claims
- 1588US8019467B2Scheduling method for processing equipmentAPPLIED MATERIALS INC·Filed 2007·Granted Sep 13, 2011·15 cites·18 claims
- 1685US7501354B2Formation of low K material utilizing process having readily cleaned by-productsAPPLIED MATERIALS INC·Filed 2005·Granted Mar 10, 2009·6 cites·10 claims
- 1760US2012180983A1Cluster tool architecture for processing a substrateISHIKAWA TETSUYA·Filed 2012·Application pending·0 cites
- 1860US2008223293A1Cluster tool architecture for processing a substrateSOKUDO CO LTD·Filed 2008·Application pending·0 cites
- 1958US7049606B2Electron beam treatment apparatusAPPLIED MATERIALS INC·Filed 2003·Granted May 23, 2006·3 cites·17 claims
- 2044US2008050679A1Methods and systems for performing immersion processing during lithographySOKUDO CO LTD·Filed 2007·Application pending·0 cites
- 2139US2008051930A1Scheduling method for processing equipmentOH HILARIO L·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →