Cluster tool architecture for processing a substrate

Abstract

The present invention generally provides a cluster tool for processing a substrate. In one embodiment, the cluster tool comprises at least one processing rack, which comprises a first plurality of substrate processing chambers that are positioned adjacent to each other and aligned in a first direction, a second plurality of substrate processing chambers that are positioned adjacent to each other and adjacent to at least one of the first plurality of substrate processing chambers, the second plurality of substrate processing chambers being positioned in a second direction relative to the first direction, a first shuttle robot movable in the first direction for moving substrates between each of the first plurality of substrate processing chambers, and a second shuttle robot movable in the second direction for moving substrates between each of the second plurality of substrate processing chambers.

1 . A cluster tool for processing a substrate, comprising:
 at least one processing rack, comprising:
 a first plurality of substrate processing chambers that are positioned adjacent to each other and aligned in a first direction; 
 a second plurality of substrate processing chambers that are positioned adjacent to each other and adjacent to at least one of the first plurality of substrate processing chambers, the second plurality of substrate processing chambers being positioned in a second direction relative to the first direction; 
 a first shuttle robot movable in the first direction for moving substrates between each of the first plurality of substrate processing chambers; and 
 a second shuttle robot movable in the second direction for moving substrates between each of the second plurality of substrate processing chambers. 
   
     
     
         2 . The cluster tool of  claim 1 , wherein each of the first plurality of processing chambers are isolated from each other. 
     
     
         3 . The cluster tool of  claim 2 , wherein the second direction is substantially normal to the first direction. 
     
     
         4 . The cluster tool of  claim 3 , wherein the first direction is a horizontal direction. 
     
     
         5 . The cluster tool of  claim 4 , wherein the second direction is a horizontal direction. 
     
     
         6 . The cluster tool of  claim 4 , wherein the second plurality of processing chambers are stacked on the first plurality of processing chambers. 
     
     
         7 . The cluster tool of  claim 2 , wherein each of the second plurality of processing chambers are isolated from the first plurality of processing chambers. 
     
     
         8 . The cluster tool of  claim 7 , wherein the second plurality of processing chambers are isolated from each other. 
     
     
         9 . A cluster tool for processing a substrate, comprising:
 at least one processing rack, comprising:
 a first plurality of substrate processing chambers that are positioned adjacent to each other and aligned in a horizontal direction; 
 a second plurality of substrate processing chambers that are positioned adjacent to each other and adjacent to each of the first plurality of substrate processing chambers in a vertical direction; 
 a first shuttle robot movable in the horizontal direction for moving substrates between each of the first plurality of substrate processing chambers; and 
 a second shuttle robot movable in the horizontal direction for moving substrates between each of the second plurality of substrate processing chambers. 
   
     
     
         10 . The cluster tool of  claim 9 , wherein each of the first plurality of processing chambers are isolated from each other. 
     
     
         11 . The cluster tool of  claim 10 , wherein each of the second plurality of processing chambers are isolated from the first plurality of processing chambers. 
     
     
         12 . The cluster tool of  claim 11 , wherein the second plurality of processing chambers are isolated from each other. 
     
     
         13 . The cluster tool of  claim 9 , wherein at least one of the first plurality of processing chambers or at least one of the second plurality of processing chambers comprise a heat exchanging device. 
     
     
         14 . The cluster tool of  claim 13 , wherein the heat exchanging device comprises a chill plate. 
     
     
         15 . The cluster tool of  claim 13 , wherein the heat exchanging device comprises a bake plate. 
     
     
         16 . A cluster tool for processing a substrate, comprising:
 at least a first processing rack, comprising:
 a first plurality of substrate processing chambers that are positioned adjacent to each other and aligned in a horizontal direction, each of the first plurality of processing chambers being isolated from each other and having a shuttle robot movable in the horizontal direction for moving substrates between each of the first plurality of substrate processing chambers; and 
 a second plurality of substrate processing chambers that are positioned adjacent to each other and adjacent to each of the first plurality of substrate processing chambers in a vertical direction, each of the second plurality of processing chambers being isolated from each other and having a shuttle robot movable in the horizontal direction for moving substrates between each of the second plurality of substrate processing chambers. 
   
     
     
         17 . The cluster tool of  claim 16 , wherein at least one of the first plurality of processing chambers or at least one of the second plurality of processing chambers comprise a heat exchanging device. 
     
     
         18 . The cluster tool of  claim 17 , wherein the heat exchanging device comprises a chill plate. 
     
     
         19 . The cluster tool of  claim 17 , wherein the heat exchanging device comprises a bake plate. 
     
     
         20 . The cluster tool of  claim 16 , further comprising:
 a second processing rack positioned in an opposing relationship to the first processing rack.   
     
     
         21 . The cluster tool of  claim 20 , wherein the second processing rack comprises:
 a third plurality of substrate processing chambers that are positioned adjacent to each other and aligned in the horizontal direction, each of the third plurality of processing chambers having a shuttle robot movable in the horizontal direction for moving substrates between each of the third plurality of substrate processing chambers; and   a fourth plurality of substrate processing chambers that are positioned adjacent to each other and adjacent to each of the third plurality of substrate processing chambers in the vertical direction, each of the fourth plurality of processing chambers having a shuttle robot movable in the horizontal direction for moving substrates between each of the fourth plurality of substrate processing chambers.