Inventor · disambiguated record
Hiroki Ohno
Also filed as: OHNO HIROKI
43 granted patents·15 pending applications·366 citations·filing 1990–2024
98Inventor score
Top patents by PatentIndex Score
58 records- 0193US7806989B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Oct 5, 2010·24 cites·28 claims
- 0288US10115609B2Separation and regeneration apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Oct 30, 2018·6 cites·8 claims
- 0386US10504718B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Dec 10, 2019·5 cites·10 claims
- 0485US10395950B2Substrate processing apparatus, substrate processing method, and recording mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 27, 2019·5 cites·10 claims
- 0584US9881784B2Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jan 30, 2018·4 cites·12 claims
- 0684US9662685B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted May 30, 2017·5 cites·5 claims
- 0784US8337659B2Substrate processing method and substrate processing apparatusORII TAKEHIKO·Filed 2005·Granted Dec 25, 2012·10 cites·13 claims
- 0884US8056257B2Substrate processing apparatus and substrate processing methodOHNO HIROKI·Filed 2007·Granted Nov 15, 2011·11 cites·17 claims
- 0984US7837804B2Substrate cleaning method, substrate cleaning equipment, computer program, and program recording mediumTOKYO ELECTRON LTD·Filed 2005·Granted Nov 23, 2010·10 cites·19 claims
- 1083US10046370B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 14, 2018·3 cites·3 claims
- 1182US10923368B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Feb 16, 2021·3 cites·13 claims
- 1282US6536452B1Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 25, 2003·28 cites·30 claims
- 1381US8372212B2Supercritical drying method and apparatus for semiconductor substratesTOSHIBA KK·Filed 2012·Granted Feb 12, 2013·5 cites·5 claims
- 1480US10950465B2Method of cleaning substrate processing apparatus and system of cleaning substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Mar 16, 2021·3 cites·7 claims
- 1580US8147617B2Substrate cleaning method and computer readable storage mediumSEKIGUCHI KENJI·Filed 2005·Granted Apr 3, 2012·8 cites·8 claims
- 1679US8771429B2Supercritical drying method for semiconductor substrate and supercritical drying apparatusJI LINAN·Filed 2012·Granted Jul 8, 2014·5 cites·8 claims
- 1778US8042742B2Noncontact IC label and method and apparatus for manufacturing the sameTOPPAN FORMS CO LTD·Filed 2005·Granted Oct 25, 2011·10 cites·3 claims
- 1878US5801466AVibrator attaching structureUNIDEN KK·Filed 1995·Granted Sep 1, 1998·50 cites·27 claims
- 1977US8794250B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Aug 5, 2014·3 cites·7 claims
- 2077US6513537B1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Feb 4, 2003·20 cites·11 claims
- 2177US2025069907A1Substrate cleaning method and substrate cleaning deviceTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2276US10692739B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jun 23, 2020·2 cites·8 claims
- 2375US7803230B2Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the methodTOKYO ELECTRON LTD·Filed 2005·Granted Sep 28, 2010·5 cites·10 claims
- 2475US6800546B2Film forming method by radiating a plasma on a surface of a low dielectric constant filmTOKYO ELECTRON LTD·Filed 2002·Granted Oct 5, 2004·20 cites·9 claims
- 2573US9583330B2Supercritical drying method for semiconductor substrate and supercritical drying apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Feb 28, 2017·2 cites·4 claims
- 2673US8747689B2Liquid processing method, liquid processing apparatus and storage mediumOHNO HIROKI·Filed 2012·Granted Jun 10, 2014·3 cites·7 claims
- 2771US10651061B2Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted May 12, 2020·1 cites·14 claims
- 2869US8197606B2Substrate cleaning method, substrate cleaning apparatus, control program, and computer-readable storage mediumWATANABE TSUKASA·Filed 2010·Granted Jun 12, 2012·2 cites·14 claims
- 2967US12198947B2Substrate cleaning method and substrate cleaning deviceTOKYO ELECTRON LTD·Filed 2020·Granted Jan 14, 2025·0 cites·10 claims
- 3066US5830280AWashing liquid for post-polishing and polishing-cleaning method in semiconductor processTOKYO ELECTRON LTD·Filed 1997·Granted Nov 3, 1998·33 cites·10 claims
- 3165USD748226SRotary valveKITZ CORP·Filed 2014·Granted Jan 26, 2016·12 cites·1 claims
- 3264US10207349B2High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure containerTOKYO ELECTRON LTD·Filed 2013·Granted Feb 19, 2019·1 cites·14 claims
- 3363US10096462B2Substrate processing method and storage mediumTOSHIBA KK·Filed 2013·Granted Oct 9, 2018·1 cites·7 claims
- 3462US10199240B2Substrate processing method, substrate processing apparatus, and storage mediumHAYASHI HIDEKAZU·Filed 2012·Granted Feb 5, 2019·1 cites·7 claims
- 3551US7064079B2Method of removing polymer and apparatus for doing the sameNEC ELECTRONICS CORP·Filed 2003·Granted Jun 20, 2006·4 cites·27 claims
- 3648US6895979B2Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2003·Granted May 24, 2005·2 cites·11 claims
- 3748US5758289ATelephone system and bell sound detecting method thereofUNIDEN KK·Filed 1995·Granted May 26, 1998·17 cites·11 claims
- 3846US5732355ATelephone systemUNIDEN AMERICA CORP·Filed 1995·Granted Mar 24, 1998·15 cites·25 claims
- 3945US8137478B2Substrate processing method and substrate processing apparatusSEKIGUCHI KENJI·Filed 2010·Granted Mar 20, 2012·0 cites·14 claims
- 4045US7767006B2Ozone processing apparatus and ozone processing methodTOKYO ELECTRON LTD·Filed 2004·Granted Aug 3, 2010·1 cites·4 claims
- 4144US2007125405A1Substrate cleaning method and substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 4243US6118511AManufacturing method of liquid crystal display panel and cleaning apparatus for use thereinADVANCED DISPLAY KK·Filed 1999·Granted Sep 12, 2000·11 cites·6 claims
- 4343US2005136956A1Radio relay deviceFiled 2003·Application pending·0 cites
- 4442US2004094316A1Electromagnetic radiation exposure protection mechanismUNIDEN KK·Filed 2002·Application pending·0 cites
- 4541US2019096710A1Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 4640USD746411SValve element for rotary valveKITZ CORP·Filed 2014·Granted Dec 29, 2015·3 cites·1 claims
- 4740US2005026454A1Film forming method and film forming apparatusFiled 2004·Application pending·0 cites
- 4840US2009114583A1Ion exchange equipmentYONEDA TSUYOSHI·Filed 2006·Application pending·0 cites
- 4939US2017321814A1Rotary valve and quick exhaust valve for railway vehicleKITZ CORP·Filed 2015·Application pending·0 cites
- 5038US2019096711A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
Showing the top 50 of 58 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →