Inventor · disambiguated record
Hidehiro Yanai
Also filed as: YANAI HIDEHIRO
19 granted patents·9 pending applications·408 citations·filing 2005–2025
93Inventor score
Files withHITACHI INT ELECTRIC INC13KOKUSAI ELECTRIC CORP9SAKATA MASAKAZU2ABURATANI YUKINORI1SHIMADA TOSHIYA1
Top patents by PatentIndex Score
28 records- 0198US10287684B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2015·Granted May 14, 2019·338 cites·16 claims
- 0294US11101111B2Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2020·Granted Aug 24, 2021·3 cites·12 claims
- 0394US7648578B1Substrate processing apparatus, and method for manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2005·Granted Jan 19, 2010·30 cites·17 claims
- 0490US8986450B1Substrate processing apparatus and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2014·Granted Mar 24, 2015·8 cites·15 claims
- 0589US10763084B2Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2018·Granted Sep 1, 2020·4 cites·10 claims
- 0686US12505989B2Substrate processing apparatus, and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2024·Granted Dec 23, 2025·0 cites·14 claims
- 0786US8925562B1Substrate processing apparatus and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2014·Granted Jan 6, 2015·6 cites·13 claims
- 0880US9911580B2Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatusYANAI HIDEHIRO·Filed 2011·Granted Mar 6, 2018·5 cites·17 claims
- 0979US9508546B2Method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2014·Granted Nov 29, 2016·3 cites·1 claims
- 1079US8444363B2Substrate processing apparatusSAKATA MASAKAZU·Filed 2009·Granted May 21, 2013·7 cites·5 claims
- 1179US7579276B2Substrate processing apparatus and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2005·Granted Aug 25, 2009·3 cites·13 claims
- 1275US11948778B2Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2021·Granted Apr 2, 2024·0 cites·13 claims
- 1369US2023073084A1Substrate processing apparatus, substrate processing method and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 1468US9659767B2Substrate processing apparatus and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2014·Granted May 23, 2017·1 cites·14 claims
- 1564US2025343054A1Substrate processing apparatus, gas supply system, method of processing substrate, method of manufacturing semiconductor device, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 1661US11530481B2Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2020·Granted Dec 20, 2022·0 cites·13 claims
- 1758US2023416916A1Substrate processing apparatus, method of manufacturing semiconductor device, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2023·Application pending·0 cites
- 1851US7923380B2Substrate processing apparatus and substrate processing methodHITACHI INT ELECTRIC INC·Filed 2009·Granted Apr 12, 2011·0 cites·6 claims
- 1949US9378991B2Substrate processing apparatus and substrate processing methodTAKAHASHI AKIRA·Filed 2009·Granted Jun 28, 2016·0 cites·10 claims
- 2045US2021071297A1Substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2020·Application pending·0 cites
- 2142US2022189801A1Substrate processing apparatus, method of manufacturing semiconductor device, and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 2240US9082797B2Substrate processing apparatus and method of manufacturing semiconductor deviceABURATANI YUKINORI·Filed 2012·Granted Jul 14, 2015·0 cites·12 claims
- 2340US9076644B2Substrate processing apparatus, substrate supporter and method of manufacturing semiconductor deviceSAKATA MASAKAZU·Filed 2012·Granted Jul 7, 2015·0 cites·13 claims
- 2438US2012329290A1Substrate Placement Stage, Substrate Processing Apparatus and Method of Manufacturing Semiconductor DeviceSHIMADA TOSHIYA·Filed 2012·Application pending·0 cites
- 2535US2016024650A1Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2015·Application pending·0 cites
- 2635US2016379848A1Substrate Processing ApparatusHITACHI INT ELECTRIC INC·Filed 2016·Application pending·0 cites
- 2734US10403478B2Plasma processing apparatus and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2015·Granted Sep 3, 2019·0 cites·10 claims
- 2833US2016079101A1Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →