Inventor · disambiguated record
Hsiao-Tzu Lu
Also filed as: LU HSIAO-TZU
13 granted patents·3 pending applications·40 citations·filing 2005–2014
89Inventor score
Top patents by PatentIndex Score
16 records- 0180US8893069B2Method of schematic driven layout creationSYNOPSYS TAIWAN CO LTD·Filed 2012·Granted Nov 18, 2014·7 cites·11 claims
- 0279US8707226B2Manipulating parameterized cell devices in a custom layout designLU HSIAO-TZU·Filed 2011·Granted Apr 22, 2014·8 cites·20 claims
- 0379US8394576B2Method for patterning a photosensitive layerLU HSIAO-TZU·Filed 2012·Granted Mar 12, 2013·2 cites·20 claims
- 0478US9852251B2Manipulating parameterized cell devices in a custom layout designSYNOPSYS INC·Filed 2014·Granted Dec 26, 2017·6 cites·21 claims
- 0576US8969922B2Field effect transistors and method of forming the sameLIU CHIA-CHU·Filed 2012·Granted Mar 3, 2015·5 cites·17 claims
- 0676US8124323B2Method for patterning a photosensitive layerLU HSIAO-TZU·Filed 2007·Granted Feb 28, 2012·4 cites·20 claims
- 0774US7479466B2Method of heating semiconductor wafer to improve wafer flatnessTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jan 20, 2009·4 cites·30 claims
- 0871US8119992B2System for overlay measurement in semiconductor manufacturingLU HSIAO-TZU·Filed 2009·Granted Feb 21, 2012·2 cites·22 claims
- 0969US7582538B2Method of overlay measurement for alignment of patterns in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Sep 1, 2009·2 cites·29 claims
- 1059US8815496B2Method for patterning a photosensitive layerTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Aug 26, 2014·0 cites·20 claims
- 1152US8236579B2Methods and systems for lithography alignmentLU HSIAO-TZU·Filed 2007·Granted Aug 7, 2012·0 cites·18 claims
- 1248US2012293782A1Methods and Systems for Lithography AlignmentLU HSIAO-TZU·Filed 2012·Application pending·0 cites
- 1344US7723014B2System and method for photolithography in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted May 25, 2010·0 cites·6 claims
- 1444US2008102648A1Method and System For Making Photo-Resist PatternsTAIWAN SEMICONDUCTOR MFG·Filed 2006·Application pending·0 cites
- 1540US2006157776A1System and method for contact module processingCHANG CHENG-HUNG·Filed 2005·Application pending·0 cites
- 1638US7601466B2System and method for photolithography in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Oct 13, 2009·0 cites·24 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →