Inventor · disambiguated record
Izumi Arai
Also filed as: ARAI IZUMI
24 granted patents·2 pending applications·3,715 citations·filing 1976–2019
97Inventor score
Top patents by PatentIndex Score
26 records- 0199US9640416B2Single-and dual-chamber module-attachable wafer-handling chamberASM IP HOLDING BV·Filed 2012·Granted May 2, 2017·485 cites·11 claims
- 0299US9343350B2Anti-slip end effector for transporting workpiece using van der waals forceASM IP HOLDING BV·Filed 2014·Granted May 17, 2016·472 cites·15 claims
- 0397US5382311AStage having electrostatic chuck and plasma processing apparatus using sameTOKYO ELECTRON LTD·Filed 1993·Granted Jan 17, 1995·1k cites·20 claims
- 0497US4931135AEtching method and etching apparatusTOKYO ELECTRON LTD·Filed 1988·Granted Jun 5, 1990·449 cites·21 claims
- 0596US9349620B2Apparatus and method for pre-baking substrate upstream of process chamberASM IP HOLDING BV·Filed 2014·Granted May 24, 2016·472 cites·20 claims
- 0695US6110287APlasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Aug 29, 2000·397 cites·2 claims
- 0787US10403523B2Substrate processing apparatusASM IP HOLDING BV·Filed 2016·Granted Sep 3, 2019·4 cites·13 claims
- 0885US4089507AMethod and apparatus for maintaining uniformity of mixed dust slurry stored in a basinSUMITOMO HEAVY INDUSTRIES·Filed 1976·Granted May 16, 1978·62 cites·3 claims
- 0984US8115234B2Semiconductor deviceNAKAJIMA AKISHIGE·Filed 2009·Granted Feb 14, 2012·17 cites·18 claims
- 1083US4963713ACooling of a plasma electrode system for an etching apparatusTOKYO ELECTRON LTD·Filed 1989·Granted Oct 16, 1990·55 cites·4 claims
- 1180US10679879B2Substrate processing apparatusASM IP HOLDING BV·Filed 2019·Granted Jun 9, 2020·2 cites·18 claims
- 1277US4978412APlasma processing deviceTOKYO ELECTRON LTD·Filed 1990·Granted Dec 18, 1990·61 cites·12 claims
- 1374US5203958AProcessing method and apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Apr 20, 1993·55 cites·24 claims
- 1473US5089083APlasma etching methodTOKYO ELECTRON LTD·Filed 1990·Granted Feb 18, 1992·53 cites·8 claims
- 1566US9753536B2Electronic deviceARAI IZUMI·Filed 2012·Granted Sep 5, 2017·3 cites·3 claims
- 1663US9340640B2Polyol for polyurethane preparation and polyurethane preparation method using sameHIRANO TOMOHISA·Filed 2011·Granted May 17, 2016·2 cites·2 claims
- 1763US8422214B2Mobile electronic apparatusFURUMATSU KOICHIRO·Filed 2008·Granted Apr 16, 2013·3 cites·18 claims
- 1863US4133756AMethod for dehydrating a mixed dust slurrySUMITOMO HEAVY INDUSTRIES·Filed 1977·Granted Jan 9, 1979·16 cites·6 claims
- 1962US8083856B2Ultrasonic cleaning apparatus and ultrasonic cleaning methodABE TATSUO·Filed 2009·Granted Dec 27, 2011·2 cites·6 claims
- 2056US5155331AMethod for cooling a plasma electrode system for an etching apparatusTOKYO ELECTRON LTD·Filed 1990·Granted Oct 13, 1992·23 cites·13 claims
- 2156US5144800AExhaust manifold system for a transverse v-type engineMITSUBISHI MOTORS CORP·Filed 1991·Granted Sep 8, 1992·29 cites·4 claims
- 2245US5164034AApparatus and method for processing substrateTOKYO ELECTRON LTD·Filed 1991·Granted Nov 17, 1992·15 cites·11 claims
- 2339US2002088467A1Mind personality transfer methodFiled 2002·Application pending·0 cites
- 2435US2007146088A1Oscillation circuit and a semiconductor circuit device having the oscillation circuitARAI IZUMI·Filed 2006·Application pending·0 cites
- 2531US5858258APlasma processing methodTOKYO ELECTRON LTD·Filed 1992·Granted Jan 12, 1999·4 cites·14 claims
- 2623US6330391B1VTR signal processing circuitVICTOR COMPANY OF JAPAN·Filed 1998·Granted Dec 11, 2001·3 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →