Inventor · disambiguated record
James D. Carducci
Also filed as: CARDUCCI JAMES · CARDUCCI JAMES D · CARDUCCI JAMES DAVID
93 granted patents·35 pending applications·3,126 citations·filing 1996–2024
99Inventor score
Top patents by PatentIndex Score
128 records- 0199US6900596B2Capacitively coupled plasma reactor with uniform radial distribution of plasmaAPPLIED MATERIALS INC·Filed 2002·Granted May 31, 2005·224 cites·53 claims
- 0298US11814724B2Continuous liner for use in a processing chamberAPPLIED MATERIALS INC·Filed 2022·Granted Nov 14, 2023·2 cites·19 claims
- 0398US11587766B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2021·Granted Feb 21, 2023·4 cites·15 claims
- 0498US10580620B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Mar 3, 2020·38 cites·17 claims
- 0598US10546728B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 28, 2020·39 cites·11 claims
- 0698US10535502B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jan 14, 2020·35 cites·14 claims
- 0798US10453656B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2016·Granted Oct 22, 2019·36 cites·15 claims
- 0898US10312056B2Distributed electrode array for plasma processingAPPLIED MATERIALS INC·Filed 2018·Granted Jun 4, 2019·39 cites·20 claims
- 0998US9741546B2Symmetric plasma process chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 22, 2017·385 cites·17 claims
- 1098US9653267B2Temperature controlled chamber linerCARDUCCI JAMES D·Filed 2012·Granted May 16, 2017·319 cites·20 claims
- 1198US7196283B2Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surfaceAPPLIED MATERIALS INC·Filed 2005·Granted Mar 27, 2007·118 cites·48 claims
- 1297US11670489B2Modular microwave source with embedded ground surfaceAPPLIED MATERIALS INC·Filed 2021·Granted Jun 6, 2023·4 cites·10 claims
- 1397US6983892B2Gas distribution showerhead for semiconductor processingAPPLIED MATERIALS INC·Filed 2004·Granted Jan 10, 2006·190 cites·19 claims
- 1497US5891350AAdjusting DC bias voltage in plasma chambersAPPLIED MATERIALS INC·Filed 1996·Granted Apr 6, 1999·186 cites·21 claims
- 1596US10475626B2Ion-ion plasma atomic layer etch process and reactorAPPLIED MATERIALS INC·Filed 2015·Granted Nov 12, 2019·12 cites·14 claims
- 1696US10249495B2Diamond like carbon layer formed by an electron beam plasma processAPPLIED MATERIALS INC·Filed 2016·Granted Apr 2, 2019·17 cites·16 claims
- 1796US8118938B2Lower liner with integrated flow equalizer and improved conductanceCARDUCCI JAMES D·Filed 2011·Granted Feb 21, 2012·26 cites·10 claims
- 1896US7968469B2Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformityAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·46 cites·26 claims
- 1996US7780866B2Method of plasma confinement for enhancing magnetic control of plasma radial distributionAPPLIED MATERIALS INC·Filed 2007·Granted Aug 24, 2010·40 cites·20 claims
- 2096US6716302B2Dielectric etch chamber with expanded process windowAPPLIED MATERIALS INC·Filed 2002·Granted Apr 6, 2004·91 cites·18 claims
- 2195US11499223B2Continuous liner for use in a processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Nov 15, 2022·2 cites·13 claims
- 2295US11049694B2Modular microwave source with embedded ground surfaceAPPLIED MATERIALS INC·Filed 2019·Granted Jun 29, 2021·12 cites·20 claims
- 2395US8293016B2Apparatus for efficient removal of halogen residues from etched substratesBAHNG KENNETH J·Filed 2009·Granted Oct 23, 2012·555 cites·11 claims
- 2495US7987814B2Lower liner with integrated flow equalizer and improved conductanceAPPLIED MATERIALS INC·Filed 2008·Granted Aug 2, 2011·26 cites·14 claims
- 2595US6562189B1Plasma reactor with a tri-magnet plasma confinement apparatusAPPLIED MATERIALS INC·Filed 2000·Granted May 13, 2003·69 cites·64 claims
- 2694US9745663B2Symmetrical inductively coupled plasma source with symmetrical flow chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 29, 2017·8 cites·18 claims
- 2794US8282736B2Lower liner with integrated flow equalizer and improved conductanceCARDUCCI JAMES D·Filed 2012·Granted Oct 9, 2012·14 cites·10 claims
- 2894US6797639B2Dielectric etch chamber with expanded process windowAPPLIED MATERIALS INC·Filed 2002·Granted Sep 28, 2004·63 cites·30 claims
- 2993US11114284B2Plasma reactor with electrode array in ceilingAPPLIED MATERIALS INC·Filed 2017·Granted Sep 7, 2021·4 cites·18 claims
- 3092US6192827B1Double slit-valve doors for plasma processingAPPLIED MATERIALS INC·Filed 1998·Granted Feb 27, 2001·108 cites·16 claims
- 3191US11189502B2Showerhead with interlaced gas feed and removal and methods of useAPPLIED MATERIALS INC·Filed 2019·Granted Nov 30, 2021·5 cites·20 claims
- 3291US10418225B2Distributed electrode array for plasma processingAPPLIED MATERIALS INC·Filed 2018·Granted Sep 17, 2019·4 cites·20 claims
- 3391US10170279B2Multiple coil inductively coupled plasma source with offset frequencies and double-walled shieldingAPPLIED MATERIALS INC·Filed 2014·Granted Jan 1, 2019·11 cites·14 claims
- 3491US8313578B2Etching chamber having flow equalizer and lower linerCARDUCCI JAMES D·Filed 2009·Granted Nov 20, 2012·13 cites·13 claims
- 3591US7585384B2Apparatus and method to confine plasma and reduce flow resistance in a plasma reactorAPPLIED MATERIALS INC·Filed 2008·Granted Sep 8, 2009·10 cites·11 claims
- 3690US10249470B2Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shieldingAPPLIED MATERIALS INC·Filed 2013·Granted Apr 2, 2019·10 cites·13 claims
- 3790US8920597B2Symmetric VHF source for a plasma reactorRAMASWAMY KARTIK·Filed 2011·Granted Dec 30, 2014·9 cites·8 claims
- 3890US7879731B2Improving plasma process uniformity across a wafer by apportioning power among plural VHF sourcesAPPLIED MATERIALS INC·Filed 2007·Granted Feb 1, 2011·13 cites·28 claims
- 3990US6513452B2Adjusting DC bias voltage in plasma chamberAPPLIED MATERIALS INC·Filed 2001·Granted Feb 4, 2003·29 cites·20 claims
- 4089US12163218B2Continuous liner for use in a processing chamberAPPLIED MATERIALS INC·Filed 2023·Granted Dec 10, 2024·0 cites·20 claims
- 4189US10510515B2Processing tool with electrically switched electrode assemblyAPPLIED MATERIALS INC·Filed 2018·Granted Dec 17, 2019·5 cites·20 claims
- 4289US8440019B2Lower liner with integrated flow equalizer and improved conductanceCARDUCCI JAMES D·Filed 2012·Granted May 14, 2013·7 cites·15 claims
- 4388US11043361B2Symmetric VHF source for a plasma reactorAPPLIED MATERIALS INC·Filed 2017·Granted Jun 22, 2021·3 cites·20 claims
- 4488US10811226B2Symmetrical plural-coil plasma source with side RF feeds and RF distribution platesAPPLIED MATERIALS INC·Filed 2018·Granted Oct 20, 2020·4 cites·21 claims
- 4588US8076247B2Plasma process uniformity across a wafer by controlling RF phase between opposing electrodesCOLLINS KENNETH S·Filed 2007·Granted Dec 13, 2011·11 cites·20 claims
- 4688US7754997B2Apparatus and method to confine plasma and reduce flow resistance in a plasmaAPPLIED MATERIALS INC·Filed 2007·Granted Jul 13, 2010·8 cites·5 claims
- 4787US11043360B2Gas distribution plate assembly for high power plasma etch processesAPPLIED MATERIALS INC·Filed 2017·Granted Jun 22, 2021·4 cites·18 claims
- 4887US9540731B2Reconfigurable multi-zone gas delivery hardware for substrate processing showerheadsNOORBAKHSH HAMID·Filed 2010·Granted Jan 10, 2017·14 cites·16 claims
- 4986US10131994B2Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flowAPPLIED MATERIALS INC·Filed 2012·Granted Nov 20, 2018·4 cites·13 claims
- 5086US9928987B2Inductively coupled plasma source with symmetrical RF feedAPPLIED MATERIALS INC·Filed 2013·Granted Mar 27, 2018·5 cites·16 claims
Showing the top 50 of 128 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →