Inventor · disambiguated record
Jan Steven Christiaan Westerlaken
Also filed as: WESTERLAKEN JAN STEVEN CHRISTIAAN
28 granted patents·4 pending applications·47 citations·filing 2011–2025
94Inventor score
Top patents by PatentIndex Score
32 records- 0195US9507275B2Support apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Nov 29, 2016·10 cites·20 claims
- 0293US8988650B2Lithographic apparatus and device manufacturing methodWESTERLAKEN JAN STEVEN CHRISTIAAN·Filed 2011·Granted Mar 24, 2015·13 cites·20 claims
- 0391US11340532B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2019·Granted May 24, 2022·5 cites·29 claims
- 0489US9529277B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Dec 27, 2016·3 cites·20 claims
- 0586US10120292B2Support apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 6, 2018·2 cites·20 claims
- 0685US10191393B2Lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Jan 29, 2019·3 cites·22 claims
- 0784US11846887B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2022·Granted Dec 19, 2023·1 cites·25 claims
- 0880US10747125B2Support apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Aug 18, 2020·1 cites·20 claims
- 0977US11556067B2Contamination trapASML NETHERLANDS BV·Filed 2020·Granted Jan 17, 2023·1 cites·14 claims
- 1077US9513568B2Lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Dec 6, 2016·2 cites·20 claims
- 1174US10495985B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Dec 3, 2019·1 cites·23 claims
- 1272US9885964B2Lithographic apparatus and device manufacturing methodWESTERLAKEN JAN STEVEN CHRISTIAAN·Filed 2012·Granted Feb 6, 2018·3 cites·16 claims
- 1369US2024160109A1Prolonging optical element lifetime in an euv lithography systemASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1467US9753382B2Sensor, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Sep 5, 2017·1 cites·20 claims
- 1566US10620553B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Apr 14, 2020·0 cites·20 claims
- 1666US9891541B2Thermal conditioning unit, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Feb 13, 2018·1 cites·20 claims
- 1764US11982947B2Contamination trapASML NETHERLANDS BV·Filed 2022·Granted May 14, 2024·0 cites·19 claims
- 1864US10216102B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Feb 26, 2019·0 cites·20 claims
- 1961US9891542B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Feb 13, 2018·0 cites·20 claims
- 2060US2025021026A1Apparatus for supplying liquid target material to a radiation sourceASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2160US2025155820A1Radiation conduitASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 2257US10191395B2Thermal conditioning unit, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Jan 29, 2019·0 cites·20 claims
- 2355US9971254B2Sensor, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted May 15, 2018·0 cites·20 claims
- 2454US12235585B2Radiation conduitASML NETHERLANDS BV·Filed 2020·Granted Feb 25, 2025·0 cites·14 claims
- 2554US10788763B2Lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Sep 29, 2020·0 cites·20 claims
- 2649US10114295B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Oct 30, 2018·0 cites·21 claims
- 2747US9785060B2Stage system and lithographic apparatus comprising such stage systemASML NETHERLANDS BV·Filed 2013·Granted Oct 10, 2017·0 cites·19 claims
- 2843US10031428B2Gas flow optimization in reticle stage environmentASML NETHERLANDS BV·Filed 2014·Granted Jul 24, 2018·0 cites·38 claims
- 2940US2013077078A1Lithographic Apparatus and Substrate Handling MethodLAFARRE RAYMOND WILHELMUS LOUIS·Filed 2012·Application pending·0 cites
- 3037US10133197B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Nov 20, 2018·0 cites·20 claims
- 3134US10114298B2Conditioning system and lithographic apparatus comprising a conditioning systemASML NETHERLANDS BV·Filed 2015·Granted Oct 30, 2018·0 cites·20 claims
- 3231US10095130B2Lithographic apparatus and method in a lithographic processASML NETHERLANDS BV·Filed 2016·Granted Oct 9, 2018·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →