Inventor · disambiguated record
Jens Kugler
Also filed as: KUGLER JENS
62 granted patents·20 pending applications·171 citations·filing 2002–2025
98Inventor score
Top patents by PatentIndex Score
82 records- 0193US7738193B2Positioning unit and alignment device for an optical elementZEISS CARL SMT AG·Filed 2005·Granted Jun 15, 2010·11 cites·39 claims
- 0292US8760777B2Positioning unit and apparatus for adjustment of an optical elementZEISS CARL SMT GMBH·Filed 2013·Granted Jun 24, 2014·4 cites·21 claims
- 0392US8035903B2Positioning unit and alignment device for an optical elementZEISS CARL SMT GMBH·Filed 2010·Granted Oct 11, 2011·9 cites·13 claims
- 0489US7265917B2Replacement apparatus for an optical elementZEISS CARL SMT AG·Filed 2004·Granted Sep 4, 2007·20 cites·31 claims
- 0588US6879379B2Projection lens and microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2003·Granted Apr 12, 2005·27 cites·51 claims
- 0684US8416515B2Positioning unit and alignment device for an optical elementWEBER ULRICH·Filed 2011·Granted Apr 9, 2013·4 cites·23 claims
- 0784US7760327B2Reflecting optical element with eccentric optical passagewayZEISS CARL SMT AG·Filed 2006·Granted Jul 20, 2010·8 cites·55 claims
- 0883US9075174B2Positioning unit and apparatus for adjustment of an optical elementZEISS CARL SMT GMBH·Filed 2014·Granted Jul 7, 2015·3 cites·20 claims
- 0983US7061698B2Lens system, in particular a projection lens system for semiconductor lithographyZEISS CARL SMT AG·Filed 2002·Granted Jun 13, 2006·29 cites·46 claims
- 1082US9104016B2Optical projection systemZEISS CARL SMT GMBH·Filed 2012·Granted Aug 11, 2015·2 cites·24 claims
- 1182US8493674B2Positioning unit and alignment device for an optical elementZEISS CARL SMT GMBH·Filed 2013·Granted Jul 23, 2013·3 cites·8 claims
- 1278US9175948B2Optical module with a measuring deviceZEISS CARL SMT GMBH·Filed 2013·Granted Nov 3, 2015·4 cites·21 claims
- 1378US8902519B2Replacement apparatus for an optical elementZEISS CARL SMT GMBH·Filed 2013·Granted Dec 2, 2014·1 cites·20 claims
- 1478US8698999B2Protection module for EUV lithography apparatus, and EUV lithography apparatusEHM DIRK HEINRICH·Filed 2011·Granted Apr 15, 2014·3 cites·30 claims
- 1577US7995296B2Replacement apparatus for an optical elementZEISS CARL SMT GMBH·Filed 2010·Granted Aug 9, 2011·1 cites·27 claims
- 1676US10197925B2Optical module for a microlithography objective holding optical elements with supporting devices located in a non-equidistant mannerZEISS CARL SMT GMBH·Filed 2014·Granted Feb 5, 2019·2 cites·37 claims
- 1776US8488261B2Replacement apparatus for an optical elementKUGLER JENS·Filed 2011·Granted Jul 16, 2013·1 cites·35 claims
- 1876US8300210B2Optical projection systemRAU JOHANNES·Filed 2005·Granted Oct 30, 2012·3 cites·33 claims
- 1975US9436095B2Exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2012·Granted Sep 6, 2016·1 cites·22 claims
- 2074US10416570B2Optical imaging arrangement with a piezoelectric deviceZEISS CARL SMT GMBH·Filed 2018·Granted Sep 17, 2019·3 cites·20 claims
- 2173US9664873B2Positioning unit and apparatus for adjustment of an optical elementZEISS CARL SMT GMBH·Filed 2015·Granted May 30, 2017·1 cites·21 claims
- 2273US8902401B2Optical imaging device with thermal attenuationZEISS CARL SMT GMBH·Filed 2012·Granted Dec 2, 2014·1 cites·22 claims
- 2371US8363206B2Optical imaging device with thermal attenuationZEISS CARL SMT GMBH·Filed 2008·Granted Jan 29, 2013·2 cites·48 claims
- 2471US7768723B2Replacement apparatus for an optical elementZEISS CARL SMT AG·Filed 2009·Granted Aug 3, 2010·1 cites·19 claims
- 2570US12332576B2Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2022·Granted Jun 17, 2025·0 cites·22 claims
- 2670US10215948B2Optical element module with minimized parasitic loadsZEISS CARL SMT GMBH·Filed 2012·Granted Feb 26, 2019·1 cites·25 claims
- 2770US9557653B2Optical projection systemZEISS CARL SMT GMBH·Filed 2015·Granted Jan 31, 2017·1 cites·30 claims
- 2870US8330935B2Exposure apparatus and measuring device for a projection lensEHRMANN ALBRECHT·Filed 2010·Granted Dec 11, 2012·2 cites·24 claims
- 2970US8027023B2Optical imaging device and method for reducing dynamic fluctuations in pressure differenceZEISS CARL SMT GMBH·Filed 2007·Granted Sep 27, 2011·2 cites·22 claims
- 3068US8988654B2Support elements for an optical elementKUGLER JENS·Filed 2011·Granted Mar 24, 2015·2 cites·29 claims
- 3168US8351139B2Optical element module with minimized parasitic loadsZEISS CARL SMT GMBH·Filed 2010·Granted Jan 8, 2013·1 cites·20 claims
- 3267US9250417B2Optical arrangement in a microlithographic projection exposure apparatusSCHAFFER DIRK·Filed 2012·Granted Feb 2, 2016·2 cites·23 claims
- 3367US9081296B2Replacement apparatus for an optical elementZEISS CARL SMT GMBH·Filed 2014·Granted Jul 14, 2015·0 cites·29 claims
- 3467US2025216797A1Optical element for a projection exposure system, optical system comprising same and projection exposure system comprising the optical element and/or the optical systemZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 3565US8659745B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsZEISS CARL SMT GMBH·Filed 2013·Granted Feb 25, 2014·1 cites·32 claims
- 3663US10133021B2Positioning unit and apparatus for adjustment of an optical elementZEISS CARL SMT GMBH·Filed 2017·Granted Nov 20, 2018·0 cites·20 claims
- 3763US8711331B2Optical module for a microlithography objective including holding and supporting devicesKUGLER JENS·Filed 2005·Granted Apr 29, 2014·2 cites·27 claims
- 3863US2018259856A1Optical Projection SystemZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 3962US12287587B2Damping arrangement for vibration damping of an element in an optical systemZEISS CARL SMT GMBH·Filed 2022·Granted Apr 29, 2025·0 cites·22 claims
- 4062US9891535B2Optical projection systemZEISS CARL SMT GMBH·Filed 2017·Granted Feb 13, 2018·0 cites·20 claims
- 4161US10345710B2Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2016·Granted Jul 9, 2019·0 cites·22 claims
- 4261US9810996B2Optical imaging device with thermal attenuationZEISS CARL SMT GMBH·Filed 2014·Granted Nov 7, 2017·0 cites·41 claims
- 4361US2018373007A1Optical module for a microlithography objective holding optical elements with supporting device located in non-equidistant mannerZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 4460US11281114B2Projection exposure apparatus for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2020·Granted Mar 22, 2022·0 cites·29 claims
- 4560US2018181007A1Optical imaging device with thermal attenuationZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 4659US9977228B2Optical module for a microlithography objective holding optical elements with supporting device located in non-equidistant mannerZEISS CARL SMT GMBH·Filed 2014·Granted May 22, 2018·0 cites·31 claims
- 4759US7515363B2Replacement apparatus for an optical elementZEISS CARL SMT AG·Filed 2007·Granted Apr 7, 2009·0 cites·23 claims
- 4859US7515359B2Support device for positioning an optical elementZEISS CARL SMT AG·Filed 2004·Granted Apr 7, 2009·7 cites·21 claims
- 4959US2016041475A1Replacement apparatus for an optical elementZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 5058US10599051B2Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Mar 24, 2020·0 cites·19 claims
Showing the top 50 of 82 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →